Special construct for continuous non-uniform RX FinFET standard cells
Methods for abutting two cells with different sized diffusion regions and the resulting devices are provided. Embodiments include abutting a first cell having first drain and source diffusion regions and a second cell having second drain and source diffusion regions, larger than the first diffusion regions, by: forming a dummy gate at a boundary between the two cells; forming a continuous drain diffusion region having an upper portion crossing the dummy gate and encompassing the entire first drain diffusion region and part of the second drain diffusion region and having a lower portion beginning over the dummy gate and encompassing a remainder of the second drain diffusion region; forming a continuous source diffusion region that is the mirror image of the continuous drain diffusion region; and forming a poly-cut mask over the dummy gate between, but separated from, the continuous drain and source diffusion regions.
1. A device, comprising:
a first cell and a second cell adjacent the first cell;
a dummy gate at a boundary between the first and second cells;
a continuous drain diffusion region having an upper portion crossing the dummy gate and encompassing an entire drain diffusion region for the first cell and part of a drain diffusion region for the second cell and having a lower portion beginning over the dummy gate and encompassing a remainder of a drain diffusion region for the second cell;
a continuous source diffusion region having a lower portion crossing the dummy gate and encompassing an entire source diffusion region for the first cell and part of a source diffusion region for the second cell and having an upper portion beginning over the dummy gate and encompassing a remainder of the source diffusion region for the second cell; and
a poly-cut mask over the dummy gate between, but separated from, the continuous drain diffusion region and the continuous source diffusion region.
2. The device according to claim 1 , wherein the lower portion of the continuous drain diffusion region and the upper portion of the continuous source diffusion region begin at an edge of the dummy gate and across the dummy gate.
3. The device according to claim 2 , further comprising:
a first set of continuous fins across the upper portion of the continuous drain diffusion region;
a second set of continuous fins across the lower portion of the continuous source diffusion region,
a third set of fins across the lower portion of the continuous drain diffusion region; and
a fourth set of fins across the upper portion of the continuous source diffusion region.
4. The device according to claim 3 , wherein the third and fourth sets are cut at the edge of the dummy gate.
5. The device according to claim 4 , further comprising:
a first gate contact over the dummy gate connecting a first source power line interconnect from the first cell to a first source power line interconnect from the second cell; and
a second gate contact over the dummy gate connecting a second source power line interconnect from the first cell to a second source power line interconnect from the second cell.
6. The device according to claim 1 , wherein the lower portion of the continuous drain diffusion region and the upper portion of the continuous source diffusion region begin in the middle of the dummy gate and continue across the dummy gate.
7. The device according to claim 6 , further comprising:
a first set of continuous fins across the upper portion of the continuous drain diffusion region;
a second set of continuous fins across the lower portion of the continuous source diffusion region;
a third set of fins across the lower portion of the continuous drain diffusion region; and
a fourth set of fins across the upper portion of the continuous source diffusion region.
8. The device according to claim 7 , wherein the third and fourth sets are cut at the middle of the dummy gate.
9. The device according to claim 8 , further comprising:
a first gate contact over the dummy gate connecting a first source power line interconnect from the first cell to a first source power line interconnect from the second cell; and
a second gate contact over the dummy gate connecting a second source power line interconnect from the first cell to a second source power line interconnect from the second cell.
10. The device according to claim 1 , wherein the first cell and the second cell are at the same potential.
11. A device comprising:
a first cell having a first drain diffusion region and a first source diffusion region and a second cell having a second drain diffusion region and a second source diffusion region, the first diffusion regions being smaller than the second diffusion regions;
a first dummy gate at a boundary between the first and second cells;
a second dummy gate at an opposite edge of the first cell and a third dummy gate at an opposite edge of the second cell;
a continuous drain diffusion region having an upper portion over the second and third dummy gates and therebetween, crossing the first dummy gate and encompassing the entire first drain diffusion region and part of the second drain diffusion region, and having a lower portion beginning over the first dummy gate and encompassing a remainder of the second drain diffusion region;
a continuous source diffusion region having a lower portion over the second and third dummy gates and therebetween, crossing the first dummy gate and encompassing the entire first source diffusion region and part of the second source diffusion region, and having an upper portion beginning over the first dummy gate and encompassing a remainder of the second source diffusion region; and
a poly-cut mask over the first dummy gate between, but separated from, the continuous drain diffusion region and the continuous source diffusion region,
wherein the first cell and the second cell are at the same potential,
wherein the lower portion of the continuous drain diffusion region and the upper portion of the continuous source diffusion region begin at an edge of the first dummy gate and across the first dummy gate or in the middle of the first dummy gate and continue across the first dummy gate.