Debris-removal groove for CMP polishing pad

1. A polishing pad suitable for polishing or planarizing at least one of semiconductor, optical and magnetic substrates with a polishing fluid and relative motion between the polishing pad and the at least one of semiconductor, optical and magnetic substrates, the polishing pad comprising the following:

a polishing layer having a polymeric matrix and a thickness, the polishing layer including a center, a perimeter, a radius extending from the center to the perimeter and a polishing track that surrounds the center and intersects the radius, the polishing track representing a working region of the polishing layer for polishing or planarizing the at least one of semiconductor, optical and magnetic substrates;

a plurality of feeder grooves (δ) intersecting the radius, the feeder grooves (δ) having land areas between the feeder grooves (δ) for polishing or planarizing of the at least one of semiconductor, optical or magnetic substrates with the polishing pad and the polishing fluid, the plurality of feeder grooves (δ) having an average cross-sectional feeder area (δ a ) calculated as width multiplied by depth, the average cross-sectional feeder area (δ a ) being total cross-sectional area of each feeder groove divided by total number of feeder grooves (δ);

at least one radial drainage groove (ρ) in the polishing layer intersecting with the plurality of feeder grooves (δ) for allowing the polishing fluid to flow from the plurality of feeder grooves (δ) to the at least one radial drainage groove (ρ) and the at least one radial drainage groove (ρ) having an average drainage cross-sectional area (ρ a ) calculated as width multiplied by depth, the average drainage cross-sectional area of the at least one radial drainage groove (ρ a ) being greater than the average cross-sectional feeder(δ a ) area as follows:

2*δ a ≤ρ a ≤8*δ a

wherein (n r ) represents the number of radial drainage grooves and (n f ) represents the number of feeder grooves, the number of feeder grooves being a total summation from each side of the radial drainage grooves (n f =2*feeder groove number) and

(0.15) n f *δ a ≤n r *ρ a ≤(0.35) n f *δ a

wherein n r equals a number of 1 to 16

and the at least one radial drainage groove (ρ) extending through the polishing track for facilitating polishing debris removal through the polishing track and underneath the at least one of semiconductor, optical and magnetic substrates and then beyond the polishing track toward the perimeter of the polishing pad during rotation of the polishing pad.

2. The polishing pad of claim 1 wherein 2*δ a ≤ρ a ≤6*δ a .

3. The polishing pad of claim 1 wherein the at least one radial drainage groove terminates into a circumferential perimeter groove and a perimeter land area surrounds the circumferential perimeter groove.

4. The polishing pad of claim 1 wherein the feeder grooves are concentric arcs.

5. The polishing pad of claim 1 wherein the at least one radial drainage groove has a depth greater than the feeder grooves.

6. A polishing pad suitable for polishing or planarizing at least one of semiconductor, optical and magnetic substrates with a polishing fluid and relative motion between the polishing pad and the at least one of semiconductor, optical and magnetic substrates, the polishing pad comprising the following:

a polishing layer having a polymeric matrix and a thickness, the polishing layer including a center, a perimeter, a radius extending from the center to the perimeter and a polishing track that surrounds the center and intersects the radius, the polishing track representing a working region of the polishing layer for polishing or planarizing the at least one of semiconductor, optical and magnetic substrates;

a plurality of feeder grooves (δ) intersecting the radius, the feeder grooves (δ) having land areas between the feeder grooves (δ) for polishing or planarizing of the at least one of semiconductor, optical or magnetic substrates with the polishing pad and the polishing fluid, the plurality of feeder grooves (δ) having an average cross-sectional feeder area (δ a ) calculated as width multiplied by depth, the average cross-sectional feeder area (δ a ) being total cross-sectional area of each feeder groove divided by total number of feeder grooves (δ);

radial drainage grooves (ρ) in the polishing layer intersecting with the plurality of feeder grooves (δ) for allowing the polishing fluid to flow from the plurality of feeder grooves (δ) to the radial drainage grooves (ρ) and the radial drainage grooves (ρ) having an average drainage cross-sectional area (ρ a ) calculated as width multiplied by depth, the average drainage cross-sectional area of the radial drainage grooves (ρ a ) being greater than the average cross-sectional feeder (δ a ) area as follows:

2*δ a ≤ρ a ≤8*δ a

wherein (n r ) represents the number of radial drainage grooves and (n f ) represents the number of feeder grooves, the number of feeder grooves being a total summation from each side of the radial drainage grooves (n f =2*feeder groove number) and

(0.15) n f *δ a ≤n r *ρ a ≤(0.35) n f *δ a

wherein n r equals a number of 2 to 12

and the radial drainage grooves (ρ) extend through the polishing track for facilitating polishing debris removal through the polishing track and underneath the at least one of semiconductor, optical and magnetic substrates and then beyond the polishing track toward the perimeter of the polishing pad during rotation of the polishing pad.

7. The polishing pad of claim 6 wherein 2*δ a ≤ρ a ≤6*δ a .

8. The polishing pad of claim 6 wherein the radial drainage grooves terminate into a circumferential perimeter groove and a perimeter land area surrounds the circumferential perimeter groove.

9. The polishing pad of claim 6 wherein the feeder grooves are concentric arcs.

10. The polishing pad of claim 6 wherein the radial drainage grooves have a depth greater than the feeder grooves.