System and method for planarizing a substrate
Techniques include providing selective or differential planarization such that different regions of a substrate can have different amounts of material removed. In general, methods herein use photo-reactive generator compounds to generate solubility-changing agents. A specific pattern of light is projected onto a substrate containing such photo-reactive generator compounds to create different concentrations of solubility-changing agent(s) at specific locations across a substrate. As generated solubility-changing agents are diffused into an underlying layer, these concentration differences then control an amount (height or depth) of material removed from a given film or layer at specific spatial locations on the substrate.
1. A method of planarizing a substrate, the method comprising:
receiving a substrate having micro-fabricated structures formed thereon, the micro-fabricated structures being positioned on an upper portion of the substrate, at least a portion of the micro-fabricated structures defining open spaces between each other;
depositing a filler layer of filler material on the substrate, the filler layer filling spaces between the micro-fabricated structures and covering at least a portion of the micro-fabricated structures, the filler layer resulting in a top surface that is non-planar in that top surface locations of the filler layer differ in z-height compared to each other by approximately 1-100 nanometers;
depositing a generator compound on the filler layer, the generator compound being a compound that generates a solubility-changing agent in response to receiving actinic radiation exposure;
projecting a pattern of actinic radiation onto the substrate, the pattern of actinic radiation being projected using a digital pixel-based projection system having an array of independently addressable projection points, the pattern of actinic radiation causing the generator compound to generate the solubility-changing agent such that a concentration of the solubility-changing agent generated at a given point location on the substrate is selectably controlled by an exposure intensity of actinic radiation at the given point location;
causing the solubility-changing agent to diffuse into at least a portion of the filler layer such that the solubility-changing agent changes a solubility of a top portion of the filler layer; and
removing soluble top portions of the filler layer using a developing agent,
wherein projecting the pattern of actinic radiation onto the substrate includes varying an amount of actinic radiation projected onto the substrate based on a z-height signature that spatially characterizes z-height values of the top surface of the filler layer across the substrate.
2. The method of claim 1 , further comprising generating the z-height signature based on a topology of the microfabricated structures on the substrate.
3. The method of claim 1 , wherein depositing the generator compound includes depositing a photo acid generator, and wherein projecting the pattern of actinic radiation causes the photo acid generator to generate a photo acid such that a concentration of the photo acid at a given spatial location on the substrate is based on the z-height signature.
4. The method of claim 1 , wherein projecting the pattern of actinic radiation onto the substrate includes projecting the pattern of actinic radiation based on a z-height signature that spatially characterizes z-height values of the top surface of the filler layer across the substrate such that an amount of solubility-changing agent generated at each projected pixel location on the substrate is based on an intensity of actinic radiation projected at each pixel location.
5. A method of planarizing a substrate, the method comprising:
receiving a substrate having micro-fabricated structures formed thereon, the micro-fabricated structures being positioned on an upper portion of the substrate, at least a portion of the micro-fabricated structures defining open spaces between each other;
depositing a filler layer of filler material on the substrate, the filler layer filling spaces between the micro-fabricated structures and covering at least a portion of the micro-fabricated structures, the filler layer resulting in a top surface that is non-planar in that top surface locations of the filler layer differ in z-height compared to each other by approximately 1-100 nanometers;
depositing a generator compound on the filler layer, the generator compound being a compound that generates a solubility-changing agent in response to receiving actinic radiation exposure;
projecting a pattern of actinic radiation onto the substrate, the pattern of actinic radiation being projected using a digital pixel-based projection system having an array of independently addressable projection points, the pattern of actinic radiation causing the generator compound to generate the solubility-changing agent such that a concentration of the solubility-changing agent generated at a given point location on the substrate is selectably controlled by an exposure intensity of actinic radiation at the given point location; and
causing the solubility-changing agent to diffuse into at least a portion of the filler layer such that the solubility-changing agent changes a solubility of a top portion of the filler layer,
wherein projecting the pattern of actinic radiation onto the substrate includes varying an amount of actinic radiation projected onto the substrate based on a z-height signature that spatially characterizes z-height values of the top surface of the filler layer across the substrate, and
wherein depositing the filler layer of filler material includes depositing a developable material in that the developable material has a solubility shift in response to presence of solubility-changing agents above a predetermined concentration threshold.
6. The method of claim 5 , wherein depositing the filler layer of filler material includes the filler material containing a hard mask material.
7. The method of claim 6 , further comprising using the filler layer as a mask to transfer a filler layer pattern into an underlying layer.
8. A method of planarizing a substrate, the method comprising:
receiving a substrate having micro-fabricated structures formed thereon, the micro-fabricated structures being positioned on an upper portion of the substrate, at least a portion of the micro-fabricated structures defining open spaces between each other;
depositing a filler layer of filler material on the substrate, the filler layer filling spaces between the micro-fabricated structures and covering at least a portion of the micro-fabricated structures, the filler layer resulting in a top surface that is non-planar in that top surface locations of the filler layer differ in z-height compared to each other by approximately 1-100 nanometers;
depositing a generator compound on the filler layer, the generator compound being a compound that generates a solubility-changing agent in response to receiving actinic radiation exposure;
projecting a pattern of actinic radiation onto the substrate, the pattern of actinic radiation being projected using a digital pixel-based projection system having an array of independently addressable projection points, the pattern of actinic radiation causing the generator compound to generate the solubility-changing agent such that a concentration of the solubility-changing agent generated at a given point location on the substrate is selectably controlled by an exposure intensity of actinic radiation at the given point location; and
causing the solubility-changing agent to diffuse into at least a portion of the filler layer such that the solubility-changing agent changes a solubility of a top portion of the filler layer,
wherein projecting the pattern of actinic radiation onto the substrate includes varying an amount of actinic radiation projected onto the substrate based on a z-height signature that spatially characterizes z-height values of the top surface of the filler layer across the substrate, and
wherein causing the solubility-changing agent to diffuse into at least a portion of the filler layer includes baking the substrate at a predetermined time and temperature to result in a predetermined acid diffusion distance into the filler layer.