IP Library Granted Patent US 10,358,580
Granted Patent B2
US 10,358,580 · App. 15/115,010 · Granted Jul 23, 2019

Adhesive composition, resin cured product obtained from adhesive composition, method for manufacturing semiconductor device using adhesive composition, and solid-state imaging element

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Quick Facts
Patent No.
US 10,358,580
App. No.
15/115,010
Granted
Jul 23, 2019
Kind
B2
Abstract

An adhesive composition comprising (a) a compound having at least two ethylenically unsaturated groups, (b) a thermal polymerization initiator, (c) a hindered phenolic compound, (d) a thioether compound and (e) a compound having a thiol group.

Claims (36)

1. An adhesive composition comprising:

(a) a compound having at least two ethylenically unsaturated groups,

(b) a thermal polymerization initiator,

(c) a hindered phenolic compound,

(d) a thioether compound,

(e) a compound having a thiol group, and

(f) an acrylic polymer having a weight-average molecular weight of 100000 or more,

wherein the acrylic polymer having a weight-average molecular weight of 100000 or more contains a structural unit having an epoxy group.

2. The adhesive composition according to claim 1 , for use in optical parts.

3. A cured-resin product obtained from the adhesive composition according to claim 2 .

4. A method for manufacturing a semiconductor device comprising:

a step of forming an adhesive layer of the adhesive composition according to claim 2 on a semiconductor substrate,

a step of sandwiching the adhesive layer between the semiconductor substrate and a transparent substrate, and applying pressure onto the semiconductor substrate and the transparent substrate for bonding, and

a step of curing the adhesive layer.

5. The adhesive composition according to claim 2 , wherein the compound having at least two ethylenically unsaturated groups includes a urethane-based compound having (meth) acryloyl groups.

6. A cured-resin product obtained from the adhesive composition according to claim 5 .

7. A method for manufacturing a semiconductor device comprising:

a step of forming an adhesive layer of the adhesive composition according to claim 5 on a semiconductor substrate,

a step of sandwiching the adhesive layer between the semiconductor substrate and a transparent substrate, and applying pressure onto the semiconductor substrate and the transparent substrate for bonding, and

a step of curing the adhesive layer.

8. The adhesive composition according to claim 1 , wherein the compound having at least two ethylenically unsaturated groups includes a urethane-based compound having (meth) acryloyl groups.

9. A cured-resin product obtained from the adhesive composition according to claim 8 .

10. A method for manufacturing a semiconductor device comprising:

a step of forming an adhesive layer of the adhesive composition according to claim 8 on a semiconductor substrate,

a step of sandwiching the adhesive layer between the semiconductor substrate and a transparent substrate, and applying pressure onto the semiconductor substrate and the transparent substrate for bonding, and

a step of curing the adhesive layer.

11. A cured-resin product obtained from the adhesive composition according to claim 1 .

12. A solid-state imaging element comprising:

a semiconductor substrate having a light receiving section provided on the upper surface,

an adhesive layer provided on the semiconductor substrate so as to cover the light receiving section, and

a transparent substrate bonded to the semiconductor substrate by the adhesive layer, wherein

the adhesive layer is the cured-resin product according to claim 11 .

13. A method for manufacturing a semiconductor device comprising:

a step of forming an adhesive layer of the adhesive composition according to claim 1 on a semiconductor substrate,

a step of sandwiching the adhesive layer between the semiconductor substrate and a transparent substrate, and applying pressure onto the semiconductor substrate and the transparent substrate for bonding, and

a step of curing the adhesive layer.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
CHANGE OF NAME Recorded Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 26, 2017
From: IKEDA, AYA; FUJII, SHINJIRO; KATOU, SADAAKI; HASHIMOTO, SHU
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 042813/0254 →