IP Library Granted Patent US 9,680,089
Granted Patent B1
US 9,680,089 · App. 15/154,033 · Granted Jun 13, 2017

Magnetic tunnel junctions

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Quick Facts
Patent No.
US 9,680,089
App. No.
15/154,033
Granted
Jun 13, 2017
Kind
B1
Abstract

A magnetic tunnel junction comprises a conductive first magnetic electrode comprising magnetic recording material, a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material, and a non-magnetic tunnel insulator material between the first and second electrodes. The magnetic reference material of the second electrode comprises a synthetic antiferromagnetic construction comprising two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other. The one magnetic region comprises a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50. The Co x Fe y B z is directly against the tunnel insulator. A non-magnetic region comprising an Os-containing material is between the two spaced magnetic regions. The other magnetic region comprises a magnetic Co-containing material. Other embodiments are disclosed.

Claims (47)

1. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes; and

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising:

a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50; and

magnetic Co g Fe h B i directly against the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c , where “g” is from 0 to 100, “h” is from 0 to 90, and “i” is from 0 to 50, with at least one of “g” and “h” being greater than zero;

a non-magnetic region comprising at least one of Ir-containing material, Ru-containing material, Rh-containing material, and Os-containing material between the two spaced magnetic regions; and

the other magnetic region comprising a magnetic Co-containing material directly against the at least one of Ir-containing material, Ru-containing material, Rh-containing material, and Os-containing material.

2. The magnetic tunnel junction of claim 1 comprising at least one of non-magnetic elemental Ir, non-magnetic elemental Pt, and non-magnetic elemental Ru directly against the magnetic Co-containing material; the Co-containing material being between a) the at least one of Ir-containing material, Ru-containing material, Rh-containing material, and Os-containing material and b) the at least one of nonmagnetic elemental Ir, non-magnetic elemental Pt, and non-magnetic elemental Ru.

3. The magnetic tunnel junction of claim 2 comprising non-magnetic Ni s Fe t Cr u directly against the at least one of non-magnetic elemental Ir, non-magnetic elemental Pt, and non-magnetic elemental Ru, where “s” is from 50 to 100, “t” is from 0 to 30, and “u” is from 0 to 45; the at least one of non-magnetic elemental Ir, non-magnetic elemental Pt, and non-magnetic elemental Ru being between the magnetic Co-containing material and the non-magnetic Ni s Fe t Cr u .

4. The magnetic tunnel junction of claim 1 wherein the first magnetic electrode comprises dielectric material, the magnetic recording material being between the dielectric material and the tunnel insulator, the first magnetic electrode comprising non-magnetic conductive material, the dielectric material being between the non-magnetic conductive material and the magnetic recording material, the first magnetic electrode being devoid of any magnetic polarizer region between the dielectric material and the non-magnetic conductive material.

5. The magnetic tunnel junction of claim 4 wherein the dielectric material and the tunnel insulator are the same composition.

6. The magnetic tunnel junction of claim 5 wherein the composition is MgO.

7. The magnetic tunnel junction of claim 4 wherein the dielectric material has a smaller thickness than that of the tunnel insulator.

8. The magnetic tunnel junction of claim 1 wherein “x” is zero.

9. The magnetic tunnel junction of claim 1 wherein “x” is greater than zero.

10. The magnetic tunnel junction of claim 1 wherein the “a” is zero and the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises at least one of Fe b W c , Fe b Mo c , and Fe b Ta c .

11. The magnetic tunnel junction of claim 1 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises at least one of Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c where “a” is greater than zero.

12. The magnetic tunnel junction of claim 1 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises elemental W.

13. The magnetic tunnel junction of claim 1 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises elemental Mo.

14. The magnetic tunnel junction of claim 1 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises elemental Fe.

15. The magnetic tunnel junction of claim 1 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises Co a Fe b W c where “a” is greater than zero.

16. The magnetic tunnel junction of claim 1 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises Co a Fe b Mo c where “a” is greater than zero.

17. The magnetic tunnel junction of claim 1 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises Co a Fe b Ta c where “a” is greater than zero.

18. The magnetic tunnel junction of claim 1 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises a mixture or alloy of at least two of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c .

19. The magnetic tunnel junction of claim 18 wherein the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c comprises a mixture or alloy of at least three of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c .

20. The magnetic tunnel junction of claim 1 wherein the at least one of Ir-containing material, Ru-containing material, Rh-containing material, and Os-containing material comprises a mixture or alloy of at least two of elemental Ir, elemental Ru, elemental Rh, and elemental Os.

21. The magnetic tunnel junction of claim 20 wherein the at least one of Ir-containing material, Ru-containing material, Rh-containing material, and Os-containing material comprises a mixture or alloy of at least three of elemental Ir, elemental Ru, elemental Rh, and elemental Os.

22. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material comprising 3 Angstroms thick Fe directly against an alloy comprising Co, Fe, and B that is 10 Angstroms thick;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes; and

the first magnetic electrode comprising dielectric material directly against the Fe; the alloy comprising Co, Fe, and B being directly against the tunnel insulator, the first magnetic electrode comprising non-magnetic conductive material directly against the dielectric material, the first magnetic electrode being devoid of any magnetic polarizer region between the dielectric material and the non-magnetic conductive material;

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising:

a 7 Angstroms thick polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a 2 Angstroms thick region of at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50; and

7 Angstroms of magnetic Co g Fe h B i directly against the at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c , where “g” is from 0 to 100, “h” is from 0 to 90, and “i” is from 0 to 50 with at least one of “g” and “h” being greater than zero;

a 7 Angstroms thick non-magnetic region comprising at least one of Ir-containing material, Ru-containing material, Rh-containing material, and Os-containing material between the two spaced magnetic regions; the at least one of Ir-containing material, Ru-containing material, Rh-containing material, and Os-containing material being directly against the 7 Angstroms thick magnetic Co g Fe h B i ; and

the other magnetic region comprising 14 Angstroms thick elemental Co directly against the at least one of Ir-containing material, Ru-containing material, Rh-containing material, and Os-containing material;

at least one of non-magnetic elemental Ir, non-magnetic elemental Pt, and non-magnetic elemental Ru directly against the 14 Angstroms thick elemental Co; and

non-magnetic Ni s Fe t Cr u directly against the at least one of non-magnetic elemental Ir, non-magnetic elemental Pt, and non-magnetic elemental Ru, where “s” is from 50 to 100, “t” is from 0 to 30, and “u” is from 0 to 45; the at least one of non-magnetic elemental Ir, non-magnetic elemental Pt, and non-magnetic elemental Ru being between the magnetic Co-containing material and the non-magnetic Ni s Fe t Cr u .

23. The method magnetic tunnel junction of claim 22 wherein the non-magnetic Ni s Fe t Cr u is 30 Angstroms thick.

24. The magnetic tunnel junction of claim 1 wherein the Co-containing material is elemental Co.

Assignments (7)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050676/0782 →
RELEASE OF SECURITY INTEREST Recorded Jul 20, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 046635/0634 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
SUPPLEMENT NO. 1 TO PATENT SECURITY AGREEMENT Recorded Aug 26, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 039841/0207 →
SUPPLEMENT NO. 1 TO PATENT SECURITY AGREEMENT Recorded Aug 25, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 039824/0681 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 13, 2016
From: CHEN, WEI; KULA, WITOLD; SIDDIK, MANZAR; RAMARAJAN, SURESH; HARMS, JONATHAN D.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 038583/0694 →