SOI FinFET fins with recessed fins and epitaxy in source drain region
Fabrication method for a semiconductor device and structure are provided, which includes: providing an isolation layer at least partially disposed adjacent to at least one sidewall of a fin structure extended above a substrate structure, the fin structure including a channel region; recessing an exposed portion of the fin structure to define a residual stress to be induced into the channel region of the fin structure, wherein upper surfaces of a recessed fin portion and the isolation layer are coplanar with each other; and epitaxially growing a semiconductor material from the recessed exposed portion of the fin structure to form at least one of a source region and a drain region of the semiconductor device.
1. A method for forming a semiconductor device, the method comprising:
providing an isolation layer at least partially disposed adjacent to at least one sidewall of a fin extended above a substrate structure, the fin comprising a channel region;
recessing an exposed portion of the fin to provide a recessed fin portion having a stress to be induced into the channel region of the fin, wherein upper surfaces of the recessed fin portion and the isolation layer are coplanar with each other; and
epitaxially growing a semiconductor material from the recessed fin portion to form at least one of a source region and a drain region of the semiconductor device, wherein a lower surface of the at least one of the source region and the drain region extends onto, and directly contacts, an upper surface of the isolation layer.
2. The method of claim 1 , wherein the epitaxially growing comprises epitaxially growing the semiconductor material to extend laterally out from the recessed fin portion to define a lower surface of the at least one of the source region and the drain region, the lower surface extending, at least in part, in spaced opposing relation to the at least one sidewall of the recessed fin portion.
3. The method of claim 2 , wherein the lower surface of the at least one of the source region and the drain region extends symmetrically and laterally out from the recessed fin portion.
4. The method of claim 1 , wherein the semiconductor material comprises a stressor material, and the epitaxially growing of the semiconductor material over the recessed fin portion exerts an asymmetric stress across the channel region of the fin.
5. The method of claim 1 , wherein the stress is dependent on a height of the recessed fin portion.
6. The method of claim 1 , wherein the fin comprises opposite first and second sidewalls, the isolation layer being disposed adjacent to the first sidewall and the second sidewall on opposite sides of the fin, and wherein the recessing comprises mechanically stabilizing the exposed portion of the fin with the isolation layer during the recessing thereof.
7. The method of claim 6 , further comprising a gate structure extending at least partially over the fin and over the isolation layer, wherein the recessing comprises recessing the exposed portion of the fin, along with the isolation layer, and terminating, at least in part, at a lower surface of the gate structure.
8. The method of claim 7 , further comprising etching the isolation layer, subsequent to the epitaxially growing, to undercut the semiconductor material disposed over the recessed fin portion, while leaving, at least in part, the isolation layer disposed below the gate structure.
9. The method of claim 6 , wherein the epitaxially growing comprises epitaxially growing an additional semiconductor material over the semiconductor material to increase a width of the at least one of the source region and the drain region.
10. The method of claim 9 , wherein the additional semiconductor material encapsulates the semiconductor material, along with the recessed fin portion, the additional semiconductor material provides an asymmetric stress across the channel region of the fin.
11. The method of claim 9 , wherein the semiconductor material comprises a first silicon germanium material having a first germanium content, and the additional semiconductor material comprises a second silicon germanium material having a second germanium content, the first germanium content being different from the second germanium content.
12. The method of claim 1 , wherein a bottommost surface of the recessed fin portion is coplanar with a bottommost surface of the non-recessed fin that is present beneath a gate structure.
13. The method of claim 12 , wherein a bottommost surface of the isolation layer is coplanar with the bottommost surface of the recessed fin portion.
14. A method for forming a semiconductor device, the method comprising:
providing an isolation layer at least partially disposed adjacent to at least one sidewall of a fin extended above a substrate structure, the fin comprising a channel region;
recessing an exposed portion of the fin to provide a recessed fin portion having a stress to be induced into the channel region of the fin, wherein upper surfaces of the recessed fin portion and the isolation layer are coplanar with each other; and
epitaxially growing a semiconductor material from the recessed fin portion to form at least one of a source region and a drain region of the semiconductor device, wherein the epitaxially growing comprises epitaxially growing an additional semiconductor material over the semiconductor material to increase a width of the at least one of the source region and the drain region, wherein the additional semiconductor material encapsulates the semiconductor material, along with the recessed fin portion, the additional semiconductor material provides an asymmetric stress across the channel region of the fin, and wherein the semiconductor material comprises a first silicon germanium material having a first germanium content, and the additional semiconductor material comprises a second silicon germanium material having a second germanium content, the first germanium content being different from the second germanium content.