Debris removal from high aspect structures
A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
1. A method for determining a composition of a particle using a scanning probe microscopy (SPM) tip, the method comprising:
picking up and transferring the particle to the SPM tip, wherein the SPM tip is configured to facilitate the particle pick-up;
irradiating the particle on the SPM tip with a first incident irradiation from an irradiation source;
detecting a first sample irradiation from the particle caused by the first incident irradiation with an irradiation detector;
identifying one or more material attributes from the detection to determine the composition of the particle; and
effecting relative motion between the SPM tip and at least one of the irradiation source and the irradiation detector based on a first signal from the irradiation detector in response to the first sample irradiation.
2. The method of claim 1 , further comprising:
generating a first frequency domain spectrum of the first sample irradiation based on the first signal, and
generating a second frequency domain spectrum by subtracting a background frequency domain spectrum from the first frequency domain spectrum, and
effecting relative motion between the SPM tip and at least one of the irradiation source and the irradiation detector based on the second frequency domain spectrum.
3. The method of claim 2 , further comprising generating the background frequency domain spectrum based on a response of the irradiation detector to irradiation of the SPM tip when the SPM tip is substantially free from contamination.
4. The method of claim 1 , further comprising:
irradiating the SPM tip with a second incident irradiation from the irradiation source;
detecting a second sample irradiation caused by the second incident irradiation with the irradiation detector; and
effecting relative motion between the SPM tip and at least one of the irradiation source and the irradiation detector based on a second signal from the irradiation detector in response to the second sample irradiation.
5. The method of claim 4 , further comprising effecting relative motion between the SPM tip and at least one of the irradiation source and the irradiation detector based on a difference between the second signal and the first signal.
6. The method of claim 1 , wherein the first incident irradiation from the irradiation source is at least one of an x-ray, visible light, infrared light, ultraviolet light, an electron beam, and a laser.
7. The method of claim 4 , wherein the second incident irradiation from the irradiation source is at least one of an x-ray, visible light, infrared light, ultraviolet light, an electron beam, and a laser.
8. The method of claim 7 , wherein the second incident irradiation is a different type of irradiation than the first incident irradiation.
9. The method of claim 1 , wherein the first sample irradiation is generated by the first incident irradiation interacting with the SPM tip.
10. The method of claim 1 , wherein the first sample irradiation is generated by the first incident irradiation interacting with debris disposed on the SPM tip.
11. The method of claim 1 , further comprising adjusting an intensity or frequency of the first incident irradiation from the irradiation source.
12. The method of claim 4 , further comprising adjusting an intensity or frequency of the second incident irradiation from the irradiation source.
13. The method of claim 1 , wherein the irradiation is carried out on the particle on the SPM tip in the SPM with a first incident irradiation from an irradiation source.