Acid generator compounds and photoresists comprising same
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.
1. An acid generator comprising a structure of the following Formula (I):
wherein:
M + is a counter ion;
Z 1 and Z 2 each independently represent a hydrogen or non-hydrogen substituent, where at least one of Z 1 or Z 2 is fluorine or fluoroalkyl;
L 1 is a linker group;
W 1 is an optionally substituted carbon alicyclic group or optionally substituted heteroalicyclic group;
R 1 is —(C═O)O(—(CXY)CX′Y′O) n R where n is a positive integer, R is optionally substituted non-cyclic alkyl or, hydrogen and each X, Y, X′ and Y′ is a hydrogen or non-hydrogen substituent;
comprises one or more ether linkages; and
m is a positive integer.
2. The acid generator of claim 1 wherein R 1 is —(C═O)O(—CH 2 CH 2 O) n R where n is a positive integer and R is non-cyclic alkyl or hydrogen.
3. The acid generator of claim 1 wherein W 1 is an optionally substituted heteroalicyclic group.
4. The acid generator of claim 1 wherein W 1 is an optionally substituted lactone.
5. The acid generator of claim 1 wherein W 1 is an optionally substituted carbon alicyclic group.
6. The acid generator of claim 1 wherein n is 1 or 2 and/or m is 1 or 2.
7. The acid generator of claim 1 wherein both Z 1 and Z 2 are fluorine or fluoroalkyl.
8. A photoresist composition comprising a resin and an acid generator of claim 1 .
9. A method for providing a photoresist relief image comprising:
a) applying a coating layer of a photoresist of claim 8 on a substrate; and
b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.
10. A photoresist composition comprising a resin and an acid generator of claim 2 .
11. A photoresist composition comprising a resin and an acid generator of claim 3 .
12. A photoresist composition comprising a resin and an acid generator of claim 4 .
13. A photoresist composition comprising a resin and an acid generator of claim 5 .
14. A photoresist composition comprising a resin and an acid generator of claim 6 .
15. A photoresist composition comprising a resin and an acid generator of claim 7 .
16. An acid generator of claim 1 wherein R is methyl or hydrogen.
17. An acid generator selected from the group consisting of:
18. A photoresist composition comprising a resin and an acid generator of claim 17 .