X-ray techniques using structured illumination
This invention discloses a method and apparatus for x-ray techniques using structured x-ray illumination for examining material properties of an object. In particular, an object with one or more regions of interest (ROIs) having a particular shape, size, and pattern may be illuminated with an x-ray beam whose cross sectional beam profile corresponds to the shape, size and pattern of the ROIs, so that the x-rays of the beam primarily interact only with the ROIs. This allows a greater x-ray flux to be used, enhancing the signal from the ROI itself, while reducing unwanted signals from regions not in the ROI, improving signal-to-noise ratios and/or measurement throughput. This may be used with a number of x-ray measurement techniques, including x-ray fluorescence (XRF), x-ray diffraction (XRD), small angle x-ray scattering (SAXS), x-ray absorption fine-structure spectroscopy (XAFS), x-ray near edge absorption spectroscopy, and x-ray emission spectroscopy.
1. A method for examining an object, comprising:
creating a structured x-ray illumination beam by bombarding an anode target with electrons to generate x-rays and propagating at least some of the x-rays through an x-ray optical system, said structured x-ray illumination beam propagating along a predetermined direction and having a predetermined intensity profile in a plane perpendicular to the direction at a position of the object, the object comprising one or more regions of interest (ROIs) to be examined, the ROIs comprising one or more features with one or more spatial properties in the plane perpendicular to the direction, the intensity profile of the structured x-ray illumination beam corresponding to at least a portion of the one or more spatial properties of the features of said ROIs;
positioning at least a portion of said ROIs relative to the structured x-ray illumination beam; and
detecting x-rays resulting from the interaction of the structured x-ray illumination beam and said ROIs within the object.
2. The method of claim 1 , further comprising analyzing the detected x-rays to determine one or more material properties of the object, in which said one or more material properties are selected from the group consisting of: composition, crystallographic structure, chemical state of one or more at least one element, particle size, or particle size distribution.
3. The method of claim 1 , in which
the x-rays resulting from the interaction of the structured x-ray illumination beam and said ROIs within the object arise from one or more phenomena selected from the group consisting of: small angle x-ray scattering, x-ray fluorescence, x-ray reflectivity, x-ray absorption, x-ray refraction, and x-ray diffraction.
4. The method of claim 1 , in which bombarding the anode target with electrons produces a structured source and the x-ray optical system forms an image of the structured source at the object with a predetermined magnification.
5. The method of claim 4 , in which the predetermined magnification is selected such that at least a portion of the structured x-ray illumination beam incident on the object has a spatial distribution that matches at least a portion of the ROIs.
6. The method of claim 1 , in which positioning at least a portion of the ROIs relative to the structured x-ray illumination beam is carried out using an electro-mechanical system.
7. The method of claim 1 , in which the anode target comprises a plurality of discrete x-ray generating structures arranged in a pattern corresponding to the ROIs of the object, and creating the structured x-ray illumination beam comprises forming an image of the anode target on the object comprising ROIs using the x-ray optical system.
8. The method of claim 1 , in which creating the structured x-ray illumination beam comprises:
bombarding the anode target with electrons in a pattern corresponding to the ROIs of the object; and
forming an image of the anode target on the object comprising ROIs using the x-ray optical system.
9. The method of claim 1 , in which creating the structured x-ray illumination beam comprises:
using one or more apertures arranged in a pattern to selectively block x-rays emitted from the anode target, the pattern of the one or more apertures corresponding to the ROIs of the object; and
forming an image of the one or more apertures on the object comprising ROIs using the x-ray optical system.
10. An apparatus for examining an object, comprising:
a structured x-ray illumination beam generating system configured to produce a structured x-ray illumination beam having an axis, a predetermined intensity profile in a cross-sectional plane normal to said axis, and propagating towards the object containing one or more regions of interest (ROIs) to be examined, the ROIs comprising one or more features with one or more spatial properties in a plane perpendicular to the direction, the intensity profile of the structured x-ray illumination beam corresponding to at least a portion of the one or more spatial properties of the features of the ROIs, the structured x-ray illumination beam generating system comprising:
an x-ray source; and
an x-ray imaging optical system configured to receive x-rays from the x-ray source and to produce the structured x-ray illumination beam, the structured x-ray illumination beam incident on the object;
at least one x-ray detector for detecting x-rays resulting from the interaction of said structured x-ray illumination beam with said object, and for producing at least one signal corresponding to said detected x-rays; and
a data collection and analysis system to analyze said at least one signal.
11. The apparatus of claim 10 , in which the x-ray source comprises:
a vacuum chamber;
an emitter for an electron beam; and
an anode target comprising a substrate comprising a first material and, embedded in the substrate, a plurality of discrete structures comprising a second material configured to generate x-rays in response to bombardment by electrons.
12. The apparatus of claim 11 , in which the first material is selected from the group consisting of: beryllium, diamond, graphite, silicon, boron nitride, silicon carbide, sapphire, and diamond-like carbon; and the second material is selected from the group consisting of: iron, cobalt, nickel, copper, gallium, zinc, yttrium, zirconium, molybdenum, niobium, ruthenium, rhodium, palladium, silver, tin, iridium, tantalum, tungsten, indium, cesium, barium, germanium, gold, platinum, lead, and combinations and alloys thereof.
13. The apparatus of claim 10 , in which the x-ray source comprises:
a vacuum chamber;
an emitter for an electron beam;
an anode target comprising a substrate comprising a first material and, coated onto the substrate, a second material configured to generate x-rays in response to bombardment by electrons; and
an electron beam control system comprising electron optics that directs electron bombardment of said anode target to occur only in specific predetermined positions.
14. The apparatus of claim 13 , in which the specific predetermined positions for electron bombardment are positioned to correspond to shapes, sizes, and patterns of the one or more features within the ROIs in the object to be examined.
15. The apparatus of claim 10 , in which the x-ray source comprises:
a vacuum chamber;
an emitter for an electron beam;
an anode target comprising a substrate comprising a first material and, coated onto the substrate, a second material configured to generate x-rays in response to bombardment by electrons; and
the structured x-ray illumination beam generating system comprises a screen comprising apertures, in which the apertures are positioned to transmit x-rays generated by the anode target in positions corresponding to shapes, sizes, and patterns of the one or more features within the ROIs in the object to be examined.
16. The apparatus of claim 10 , in which the x-ray imaging optical system comprises an optical element selected from the group consisting of: a zone plate, Wolter optics, a reflective optical element, and a compound refractive lens.
17. The apparatus of claim 16 , in which a reflecting surface of the Wolter optics comprises multilayers of pairs of materials, said pairs of materials selected from the group of material pairs consisting of: tungsten/carbon (W/C), tungsten/silicon (W/Si), tungsten/tungsten silicide (W/WSi 2 ), molybdenum/silicon (Mo/Si), nickel/carbon (Ni/C), chromium/scandium (Cr/Sc), lanthanum/boron carbide (La/B 4 C), and tantalum/silicon (Ta/Si).
18. The apparatus of claim 10 , in which the x-ray imaging optical system comprises an axially symmetric hollow tube with an inner surface.
19. The apparatus of claim 18 , in which
at least a portion of the inner surface of the axially symmetric hollow tube is shaped in the form of a portion of a quadric surface.
20. The apparatus of claim 10 , in which
the structured x-ray illumination beam generating system comprises:
a phase grating to generate Talbot interference fringes.
21. The method of claim 6 , in which positioning at least a portion of said ROIs relative to the structured x-ray illumination beam is carried out multiple times using a predetermined positioning sequence.
22. The method of claim 21 , in which
the predetermined positioning sequence corresponds to a raster scan.
23. The method of claim 21 , additionally comprising generating of a map of material properties corresponding to the ROIs sampled according to said predetermined positioning sequence.
24. The method of claim 1 , in which the one or more features within the ROIs comprise periodic patterns; and at least a portion of the intensity profile of the structured x-ray illumination beam is periodic and corresponds to the one or more features.
25. The method of claim 24 , in which the periodic intensity profile is formed using a phase grating to generate Talbot interference fringes.
26. The apparatus of claim 10 , further comprising one or more electro-mechanical systems configured to align the x-ray beam, the object with ROIs, and the detector.
27. The apparatus of claim 26 , further comprising a system configured to detect the intensity of x-rays emerging from the object, and to adjust alignment of said ROIs with said structured x-ray illumination beam to optimize the detected x-ray intensity.
28. The apparatus of claim 26 , in which the x-rays resulting from the interaction of the structured x-ray illumination beam with the object are produced by a phenomenon selected from the group consisting of: x-ray absorption, x-ray reflection, x-ray refraction, x-ray scattering, x-ray diffraction, and x-ray fluorescence.
29. The method of claim 1 , further comprising:
determining the one or more ROIs within the object to be examined;
determining shapes, sizes, and patterns for the one or more features within the
ROIs relative to the predetermined direction;
selecting one or more x-ray techniques to examine the object;
designating the position for the object; and
configuring the detector to detect x-rays emerging from the positioned object appropriate to the selected x-ray techniques.