Semiconductor device and method of manufacturing the same

1. A method of manufacturing a semiconductor device comprising a variable resistance element in a multilevel wiring layer structure on a semiconductor substrate,

wherein the variable resistance element comprises a variable resistance element film disposed between a top electrode and a bottom electrode;

wherein the multilevel wiring layer structure comprises at least a wiring electrically connected to the bottom electrode and a plug electrically connected to the top electrode;

wherein the wiring is made of a metal and also serves as the bottom electrode;

wherein the variable resistance element film is a film whose resistance changes depending on ion conduction or diffusion of the metal of the wiring; and

wherein an insulating barrier film is in contact with the bottom electrode and the variable resistance element film in a portion arranged between the bottom electrode and the variable resistance element film;

the method comprising:

forming the insulating barrier film having an opening extending to the bottom electrode on the bottom electrode;

forming the variable resistance element film and the top electrode in this order on the insulating barrier film and the bottom electrode exposed in the opening; and

forming the plug on the top electrode,

wherein the forming the variable resistance element film comprises:

forming the insulating barrier film on the bottom electrode;

forming a hard mask having an opening pattern on the insulating barrier film;

using the hard mask as a mask and carrying out reactive dry etching on the insulating barrier film exposed in the opening pattern to form the opening in the insulating barrier film, the opening extending to the bottom electrode, having a tapered wall surface, and having a wider diameter at a portion farther from the bottom electrode; and

using an inactive gas and carrying RF etching to adjust the tapered surface of the opening to a desired angle, and

wherein, in the forming the variable resistance element film and the top electrode, the variable resistance element film is formed also on the tapered surface.

2. The method of manufacturing the semiconductor device according to claim 1 , wherein the hard mask has a laminate structure in which SiN and SiO 2 are stacked in this order on the insulating barrier film.

3. The method of manufacturing the semiconductor device according to claim 1 , wherein a gas containing fluorocarbon is used as etching gas in the reactive dry etching.

4. The method of manufacturing the semiconductor device according to claim 1 , wherein the inactive gas is He or Ar.

5. The method of manufacturing the semiconductor device according to claim 1 , the method comprising a process of emitting SiH 4 gas to the bottom electrode, prior to the forming the variable resistance element film and the top electrode.

6. The method of manufacturing the semiconductor device according to claim 1 , wherein a plasma treatment is carried out on the bottom electrode by using NH 3 or N 2 gas, prior to the forming the variable resistance element film and the top electrode.

7. The method of manufacturing the semiconductor device according to claim 1 ,

wherein, in the forming the variable resistance element film and the top electrode, a second bottom electrode, the variable resistance element film, a second variable resistance element film, and the top electrode are formed in this order on a bottom electrode;

wherein the second bottom electrode has diffusion barrier properties for a metal of the bottom electrode; and

wherein the second variable resistance element film is made of a metal oxide having a larger absolute value in oxidation free energy than that of a metal component of the variable resistance element film.

8. The method of manufacturing the semiconductor device according to claim 1 ,

wherein, in the forming the variable resistance element film and the top electrode, the variable resistance element film, the top electrode, and a hard mask film are formed in this order on the bottom electrode in the opening;

wherein the method comprises, after the forming the variable resistance element film and the top electrode and before the forming the plug, forming a protective insulating film on the insulating barrier film including a laminate body of the hard mask film, the top electrode and the variable resistance element film and forming a prepared hole extending to the top electrode in the protective insulating film, and the hard mask film; and

wherein a second hard mask film is made of a material different from the hard mask film.

9. The method of manufacturing the semiconductor device according to claim 1 ,

wherein, the forming the variable resistance element film and the top electrode, the variable resistance element film, the top electrode, a hard mask film, and a second hard mask film are formed in this order on the bottom electrode in the opening;

wherein the method comprises, after the forming the variable resistance element film and the top electrode and before the forming a barrier metal, the forming a protective insulating film on the insulating barrier film including a laminate body of the second hard mask film, the hard mask film, the top electrode, and the variable resistance element film and forming a prepared hole extending to the top electrode in the protective insulating film, the second hard mask film and the hard mask film; and

wherein the second hard mask film is made of a material different from that of the hard mask film.

10. The method of manufacturing the semiconductor device according to claim 1 ,

wherein, in the forming the variable resistance element film and the top electrode, the variable resistance element film, the top electrode, a hard mask film, and a second hard mask film are formed in this order on the bottom electrode in the opening;

wherein the method comprises, after the forming the variable resistance element film and the top electrode and before the forming a barrier metal, forming a protective insulating film on the insulating barrier film including a laminate body of the second hard mask film, the hard mask film, the top electrode, and the variable resistance element film, polishing the protective insulating film and the second hard mask film for planarization until the second hard mask film assumes a predetermined thickness, and forming a prepared hole extending to the top electrode in the second hard mask film and the hard mask film; and

wherein the second hard mask film is made of a material different from that of the hard mask film.

11. The method of manufacturing the semiconductor device according to claim 9 , wherein the protective insulating film is made of a material identical to that of the hard mask film and the insulating barrier film.

12. The method of manufacturing the semiconductor device according to claim 1 ,

wherein, in the forming the bottom electrode, other wirings that do not serve as the bottom electrode of the variable resistance element film are simultaneously formed; and

wherein, in the forming the plug, other plugs are formed on the other wirings.