Forming self-aligned conductive lines for resistive random access memories

1. A method comprising: forming a stack, wherein the stack includes a plurality of conductive lines separated by a dielectric material, each conductive line of the plurality of conductive lines comprising: a metal; and a barrier layer surrounding the metal on three sides; using said metal as a hard mask, removing at least a portion of said stack to form a plurality of memory cells separated by a plurality of trenches.

2. The method of claim 1 , wherein forming the stack comprises:

forming a chalcogenide layer between a heater layer and an electrode layer.

3. The method of claim 1 , wherein the plurality of conductive lines are formed by a damascene process.

4. The method of claim 1 , further comprising:

forming a sealing layer over the plurality of memory cells, wherein the sealing layer is formed on sidewalls of each memory cell of the plurality of memory cells.

5. The method of claim 4 , further comprising:

removing at least a portion of the sealing layer from a top surface of each memory cell of the plurality of memory cells.

6. The method of claim 1 , wherein the plurality of conductive lines are separated by a dielectric material.

7. The method of claim 1 , wherein removing at least a portion of said stack comprises removing at least a portion of the barrier layer along sidewalls of the plurality of memory cells.

8. A method comprising:

forming a stack, the stack comprising:

a plurality of bottom electrodes;

a heater layer;

a chalcogenide layer; and

a cap layer;

forming a dielectric layer over the cap layer;

forming a plurality of barrier layers and conductive lines in the dielectric layer, the barrier layer surrounding the metal on three sides; and

using the metal as a mask, etching the stack to form a plurality of spaced trenches defining a plurality of memory cells.

9. The method of claim 8 , wherein etching the stack comprises performing a plasma etch using a CF4 etchant.

10. The method of claim 8 , wherein etching the stack removes at least a portion of the barrier layer along sidewalls of the plurality of memory cells.

11. The method of claim 8 , further comprising:

depositing a sealing material, wherein the sealing material covers at least a portion of sidewalls of the plurality of memory cells.

12. The method of claim 8 , wherein the each conductive line of the plurality of conductive lines is aligned with a corresponding bottom electrode of the plurality of bottom electrodes.

13. The method of claim 8 , wherein the bottom electrodes are separated by a second dielectric material.

14. The method of claim 13 , wherein the spaced trenches extend through the stack to the second dielectric.

15. An method comprising:

forming a stack, the stack comprising:

a plurality of bottom electrodes separated by a dielectric material;

a layer of resistive switching material; and

an upper electrode layer;

forming a plurality of conductive lines over the upper electrode layer and aligned with the plurality of bottom electrodes; and

using the plurality of conductive lines as a hard mask, etching a plurality of trenches in the stack, wherein the plurality of trenches extend through the stack to the dielectric material to form a plurality of memory elements.

16. The method of claim 15 , wherein the plurality of conductive lines are defined by a barrier layer.

17. The method of claim 16 , wherein at least a portion of the barrier layer is removed by etching the plurality of trenches.

18. The method of claim 15 , further comprising:

depositing a sealing material over the plurality of memory elements.

19. The method of claim 18 , wherein the sealing material only fills a portion of each trench of the plurality of trenches.

20. The method of claim 15 , wherein the plurality of trenches extend through the stack to at least the dielectric material.