IP Library Granted Patent US 11,222,868
Granted Patent B2
US 11,222,868 · App. 15/203,692 · Granted Jan 11, 2022

Thermal transfer structures for semiconductor die assemblies

Inventor: Ed A. Schrock (Boise, ID)
Assignee: Micron Technology, Inc.
H01L25/0657H01L21/4803H01L21/4817H01L21/563H01L21/565H01L23/053H01L23/08H01L23/10H01L23/24H01L23/3142H01L23/367H01L23/3675H01L23/4334H01L23/3736H01L24/13H01L24/16H01L24/29H01L24/48H01L24/73H01L24/81H01L25/18H01L2224/1329H01L2224/13111H01L2224/13147H01L2224/13155H01L2224/16145H01L2224/16225H01L2224/16227H01L2224/2929H01L2224/29301H01L2224/29393H01L2224/48227H01L2224/73253H01L2224/81815H01L2225/06513H01L2225/06517H01L2225/06555H01L2225/06589H01L2924/1436H01L2924/1437H01L2924/1616H01L2924/16195H01L2924/16235H01L2924/16251H01L2924/173H01L2924/1715H01L2924/19041H01L2924/19105
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Quick Facts
Patent No.
US 11,222,868
App. No.
15/203,692
Granted
Jan 11, 2022
Kind
B2
Abstract

Several embodiments of the present technology are described with reference to a semiconductor die assembly and processes for manufacturing the assembly. In some embodiments of the present technology, a semiconductor die assembly includes a stack of semiconductor dies attached to a thermal transfer structure (also known as a “heat spreader,” “lid,” or “thermal lid”). The thermal transfer structure conducts heat away from the stack of semiconductor dies. Additionally, the assembly can include molded walls fabricated with molding material to support the thermal transfer structure.

Claims (28)

1. A semiconductor die assembly, comprising:

a support substrate;

a first semiconductor die on the support substrate;

a plurality of second semiconductor dies arranged in a stack on the first semiconductor die;

a molded wall made from a molded material, wherein the molded wall has parallel vertical surfaces on opposing sides of the stack of second semiconductor dies which at least partially define a cavity spaced apart from the stack of second semiconductor dies, and wherein (1) a portion of the molded wall is on the support substrate spaced laterally apart from the first semiconductor die and (2) the molded wall extends upward from the support substrate; and

a thermal transfer structure (TTS) over and directly attached to a top portion of the molded wall, wherein the TTS at least partially defines an upper boundary for the cavity and is configured to dissipate heat away from the first semiconductor die and the plurality of second semiconductor dies, wherein

the TTS further comprises a first portion extending in a first direction and a second portion extending in a second direction,

the first and second directions are different, and

the second portion is directly coupled to the first semiconductor die via an adhesive.

2. The semiconductor die assembly of claim 1 , further comprising a plurality of capacitors on the support substrate, wherein the plurality of capacitors are operatively coupled to the stack, and wherein the molded wall has a recessed surface molded around the capacitor.

3. The semiconductor die assembly of claim 1 wherein the TTS comprises at least one of copper, nickel, or both.

4. The semiconductor die assembly of claim 1 , further comprising an underfill material disposed between the molded wall and the stack and between the plurality of second semiconductor dies arranged in the stack.

5. The semiconductor die assembly of claim 1 wherein the first semiconductor die is a logic die that extends at least partially beyond other semiconductor dies and is attached to the support substrate and operatively coupled to a capacitor.

6. A semiconductor die assembly, comprising:

a support substrate;

a first semiconductor die on the support substrate;

a stack of second semiconductor dies on the first semiconductor die, wherein the second semiconductor dies have different functionality than the first semiconductor die;

a molded material formed on the substrate and having parallel vertical surfaces on opposing sides of the stack of second semiconductor dies which at least partially define a cavity, wherein (1) the stack of second semiconductor dies is received in the cavity and spaced apart from the molded material and (2) the molded material extends upward from the support substrate;

a thermal transfer lid having a first portion over and directly attached to a top portion of the molded material and a second portion extending from the first portion, wherein

the second portion of the thermal transfer lid is attached to the first semiconductor die and the thermal transfer lid at least partially defines an upper boundary for the cavity,

the second portion of the thermal transfer lid is attached to a peripheral region of the first die located on the bottom of the stack, and

the peripheral region extends beyond the second semiconductor dies in the stack.

7. The semiconductor die assembly of claim 6 wherein the molded wall covers an electronic component operatively coupled to the first semiconductor die in the stack.

8. The semiconductor die assembly of claim 6 wherein the molded wall further comprises at least one of an organic resin, nonorganic resin, epoxy, or a combination thereof.

9. The semiconductor die assembly of claim 6 wherein the thermal transfer lid comprises at least one of copper, nickel, or a combination thereof.

10. The semiconductor die assembly of claim 6 wherein the stack includes a logic die that extends at least partially beyond other semiconductor dies and is attached to the support substrate and operatively coupled to a capacitor, wherein the capacitor is operatively coupled to the support substrate.

11. The semiconductor die assembly of claim 6 wherein the thermal transfer lid has a plurality of passages.

12. The semiconductor die assembly of claim 6 wherein the stack comprises at least eight dies.

Assignments (7)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050676/0782 →
RELEASE OF SECURITY INTEREST Recorded Jul 20, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 046635/0634 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
SUPPLEMENT NO. 1 TO PATENT SECURITY AGREEMENT Recorded Aug 26, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 039841/0207 →
SUPPLEMENT NO. 1 TO PATENT SECURITY AGREEMENT Recorded Aug 25, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 039824/0681 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 12, 2016
From: SCHROCK, ED A.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 039137/0641 →
Continuity (1)
Related Publication 20180012865A1 · Jan 11, 2018