Capacitive coupled plasma source for sputtering and resputtering
An ionized physical vapor deposition (I-PVD) source includes an electrically and magnetically enhanced radio frequency (RF) diode, which has magnetic field lines directed substantially perpendicular to a cathode that terminate on an electrode positioned between an anode around the cathode. The anode forms a gap and the electrode is positioned behind the gap. An RF power supply connected to the cathode generates RF discharge. The cathode is inductively grounded to prevent forming a constant voltage bias during RF discharge. The electrons drift between the cathode and the gap, thereby producing ionization and forming high density plasma. The electrons drift and energy are controlled by applying different voltage potentials to the electrode. The I-PVD source is positioned in a vacuum chamber to form an I-PVD apparatus that generates ions from sputtered target material atoms and deposition. During sputtering, the substrate is biased. The I-PVD source performs chemically enhanced ionized physical vapor deposition (CE-IPVD).
1. A method of ionized physical vapor deposition (I-PVD) sputtering of a layer on a substrate, the method comprising:
positioning a cathode, an anode, and a cathode magnet assembly in a vacuum chamber;
providing a gap inside the anode around the cathode, a cusp magnetic field being provided in the gap, at least a portion of magnetic field lines associated with the cusp magnetic field passing through the gap and terminating on the cathode magnet assembly;
positioning an electrode in the gap;
providing a noble gas selected to sputter target material;
applying radio frequency (RF) power to the cathode, thereby generating plasma discharge that ionizes sputtered target material;
applying voltage to the electrode; and
applying a negative bias voltage to the substrate, thereby attracting positively charged sputtered material ions to the substrate.
2. The method, as defined by claim 1 , wherein a value of the negative bias voltage on the substrate is in a range of about 10 to 100 V.
3. The method, as defined by claim 1 , wherein a value of the cusp magnetic field is in a range of about 300 to 10000 G.
4. The method, as defined by claim 1 , wherein the feed gas is a mixture of the noble gas and a gas that comprises target material atoms.
5. The method, as defined by claim 1 , wherein the feed gas comprises a mixture of the noble gas and a reactive gas.
6. The method, as defined by claim 1 , wherein the cathode magnet assembly rotates at a speed in the range of 1 to 100 revolutions per minute.
7. The method, as defined by claim 1 , wherein the substrate is a semiconductor wafer with a diameter in a range of 100 mm to 450 mm.
8. The method, as defined by claim 1 , wherein a voltage on the electrode is a negative pulsed voltage.
9. An apparatus that ionized physical vapor deposition (I-PVD) sputters a layer on a substrate, the apparatus comprising:
a cathode, an anode, and a cathode magnet assembly positioned in a vacuum chamber;
a gap provided inside the anode around the cathode, a cusp magnetic field being provided in the gap, at least a portion of magnetic field lines associated with the cusp magnetic field passing through the gap and terminating on the cathode magnet assembly;
an electrode positioned in the gap, the electrode providing a voltage;
a noble feed gas selected to sputter target material;
a circuit connecting the cathode to radio frequency (RF) power, thereby generating plasma discharge that ionizes sputtered target material; and
a bias power supply providing negative bias voltage to the substrate, thereby attracting positively charged ions from the sputtered target material to the substrate surface.
10. The apparatus, as defined by claim 9 , wherein the electrode comprises a floating electrical potential.
11. The apparatus, as defined by claim 9 , wherein the electrode is connected to a power supply.
12. The apparatus, as defined by claim 9 , wherein the cathode is connected to a direct current (DC) power supply.
13. The apparatus, as defined by claim 9 , wherein a width of the gap is in a range of 1-10 mm.
14. A method of generating high density plasma, the method comprising:
positioning a cathode, an anode, and a cathode magnet assembly in a vacuum chamber;
providing a gap inside the anode around the cathode, a cusp magnetic field being provided in the gap, at least a portion of magnetic field lines associated with the cusp magnetic field passing through the gap and terminating on the cathode magnet assembly;
positioning an electrode in the gap;
providing a feed gas selected to generate high density plasma;
applying voltage to the electrode; and
applying radio frequency (RF) power to the cathode, thereby generating plasma discharge that generates high density plasma.
15. The method, as defined by claim 14 , wherein a value of the cusp magnetic field in the gap is in a range of about 300 to 10000 G.
16. The method, as defined by claim 14 , wherein the feed gas comprises a mixture of a noble gas and a reactive gas.
17. The method, as defined by claim 14 , wherein the cathode magnet assembly rotates at a speed in a range of 1 to 100 revolutions per minute.
18. The method, as defined by claim 14 , wherein the substrate is a semiconductor wafer with a diameter in a range of 100 to 450 mm.
19. The method, as defined by claim 14 , wherein the voltage on the electrode is a negative pulsed voltage.
20. The method, as defined by claim 14 , wherein the cathode is connected to a ground electrical potential through a circuit comprising an inductor.