Well plate
The present invention includes an apparatus for preparing samples for measurement by x-ray fluorescence spectrometry. The apparatus comprises a plate having one or more holes passing through the plate. The holes are covered by a film on one side of the plate. The holes are less than 500 micrometers across in one dimension where the film covers the holes. The film is translucent to x-rays. The present invention also includes an apparatus for preparing samples for measurement by x-ray fluorescence spectrometry. The apparatus comprises a plate having one or more holes passing through the plate. The holes are covered on one side of the plate by a detachable cover forming a water-tight seal against the plate. The cover is substantially free of the elements osmium, yttrium, iridium, phosphorus, zirconium, platinum, gold, niobium, mercury, thallium, molybdenum, sulfur, lead, bismuth, technetium, ruthenium, chlorine, rhodium, palladium, argon, silver, and thorium. The holes are less than about 500 micrometers across in one dimension where the cover covers the holes. The present invention also includes a method for preparing samples for measurement by x-ray fluorescence spectrometry. The method comprises providing a solution of with less than 10 micromolar solute and a volume of between about 2 microliters and about 2 milliliters. The solution is concentrated and analyzed using x-ray fluorescence spectrometry.
1. An apparatus for preparing one or more samples for measurement by X-ray fluorescence spectrometry, the apparatus comprising:
a plate having at least one hole passing through an entire thickness of the plate, wherein the hole is configured to receive at least one sample having a volume of between 2 microliters and 2 milliliter and to be prepared for measurement by X-ray fluorescence spectrometry; and
a film covering one side of the hole such that the film is configured to receive the sample deposited into the hole, wherein the film allows less than 5% of the x-rays that are normal to the firm and have an energy of 2,300 eV to pass therethrough, and the firm is removable from the plate for analysis of the sample deposited therein by X-ray fluorescence spectrometry.
2. The apparatus of claim 1 , wherein the plate is chemically inert under conditions of use.
3. The apparatus of claim 1 , wherein the hole is shaped so that a length of a contact line diminishes for at least a portion of a time in which the volume of a solution in the hole is reduced, and wherein the contact line is defined as an interface between the solution and a solid surface of the hole.
4. The apparatus of claim 1 , wherein the hole is configured to receive the sample having a volume of between 10 microliters and 250 microliters to be prepared for measurement by X-ray fluorescence spectrometry.
5. The apparatus of claim 1 , wherein a diameter of the hole at the location where the hole adjoins the film is within a factor of 100 times greater or 100 times smaller than an area of an X-ray excitation beam as it illuminates the sample.
6. The apparatus of claim 1 , further comprising an x-ray fluorescence spectrometer capable of producing an x-ray excitation beam, wherein the x-ray excitation beam has a beam cross sectional area containing at least 80% of the x-ray flux of the x-ray excitation beam at a location where the x-ray excitation beam is incident on the sample, and wherein the beam cross sectional area at the location is within a factor of 100 of an area of the sample.
7. An apparatus for measurement by X-ray fluorescence spectrometry, the apparatus comprising:
a plate having at least one hole passing through an entire thickness of the plate, wherein the at least one hole comprises at least one sample;
a film covering the hole oriented normal to the film, wherein the film is removable from the plate and a thickness of the film is at least 5 times smaller than a thickness of the plate, and wherein the film allows less than 5% of the x-rays that are normal to the firm and have an energy of 2,300 eV to pass therethrough; and
an x-ray fluorescence spectrometer being capable of producing an x-ray excitation beam, the x-ray excitation beam having a size that is matched to a size of the sample.
8. The apparatus of claim 7 , wherein the x-ray excitation beam has a beam cross sectional area containing at least 80% of the x-ray flux of the x-ray excitation beam at a location where the x-ray excitation beam is incident on the sample, and wherein the beam cross sectional area at the location is within a factor of 100 of an area of the sample.
9. The apparatus of claim 8 , wherein the area of the x-ray excitation beam, as the x-ray excitation beam illuminates the sample, is within a factor of 100 times greater or smaller than the diameter of the sample.
10. The apparatus of claim 7 , wherein the hole is configured to receive a volume of a solution between 2 microliters and 2 milliliters to be prepared for measurement by X-ray fluorescence.
11. The apparatus of claim 7 , wherein the hole is configured to receive a volume of a solution between 10 microliters and 250 microliters to be prepared for measurement by X-ray fluorescence.
12. The apparatus of claim 7 , wherein a diameter of the hole at a location where the hole adjoins is covered by the film is within a factor of 100 times greater or 100 times smaller than an area of an X-ray excitation beam as the x-ray excitation beam illuminates the sample.
13. A system for preparing one or more samples for measurement by X-ray fluorescence spectrometry, the apparatus comprising:
a plate having at least one hole passing through the plate, wherein the hole is configured to receive a sample having a volume of between 2 microliters and 2 milliliters and to be prepared for measurement by X-ray fluorescence spectrometry;
a film covering the hole and being configured to receive at least a portion of the sample deposited into the hole, wherein the film allows less than 5% of the x-rays that are normal to the firm and have an energy of 2,300 eV to pass therethrough; and
an x-ray fluorescence spectrometer capable of producing an x-ray excitation beam, wherein the x-ray excitation beam has a beam cross sectional area containing at least 80% of the x-ray flux of the x-ray excitation beam at a location where the x-ray excitation beam is incident on the sample, and wherein the beam cross sectional area at the location is within a factor of 100 of an area of the sample.