Via formation for cross-point memory
View Patent ↗Embodiments disclosed herein may relate to electrically conductive vias in cross-point memory array devices. In an embodiment, the vias may be formed using a lithographic operation also utilized to form electrically conductive lines in a first electrode layer of the cross-point memory array device.
1. A memory device, comprising:
a first plurality of electrically conductive lines oriented in a first direction on a first level;
a second plurality of electrically conductive lines oriented in a second direction on a second level;
a first memory material configurable to store information and positioned between the first plurality of electrically conductive lines and the second plurality of electrically conductive lines; and
a plurality of electrically conductive vias in contact with the first memory material and with the second plurality of electrically conductive lines, wherein each electrically conductive via is configured to carry signals between the second plurality of electrically conductive lines and circuitry below the first level.
2. The memory device of claim 1 , wherein the first memory material comprises a plurality of etched areas, and wherein each etched area of the plurality comprises a trench.
3. The memory device of claim 1 , wherein the first memory material comprises an array of memory cells positioned between the first plurality of electrically conductive lines and the second plurality of electrically conductive lines.
4. The memory device of claim 3 , wherein the array of memory cells comprises an array of selector devices positioned between the array of memory cells and the second plurality of electrically conductive lines.
5. The memory device of claim 3 , wherein the first plurality of electrically conductive lines comprise word-lines operatively coupled to the array of memory cells.
6. The memory device of claim 3 , wherein the second plurality of electrically conductive lines comprise bit-lines operatively coupled to the array of memory cells.
7. A memory device, comprising:
a first plurality of electrically conductive lines oriented in a first direction on a first level;
a second plurality of electrically conductive lines oriented in a second direction on a second level; and
a first memory material configurable to store information positioned between the first plurality of electrically conductive lines and the second plurality of electrically conductive lines; and
a plurality of electrically conductive vias in contact with the first memory material and with the second plurality of electrically conductive lines, wherein each electrically conductive via is configured to carry signals between the second plurality of electrically conductive lines and circuitry below the first level, and wherein at least one via of the plurality of electrically conductive vias is located within a trench of one etched area of a plurality of etched areas filled with an electrically conductive material.
8. A system, comprising:
a non-volatile memory device, comprising:
a first plurality of electrically conductive lines oriented in a first direction on a first level;
a second plurality of electrically conductive lines oriented in a second direction on a second level;
a first memory material configurable to store information and positioned between the first plurality of electrically conductive lines and the second plurality of electrically conductive lines;
a plurality of electrically conductive vias in contact with the first memory material and with the second plurality of electrically conductive lines, wherein each electrically conductive via is configured to carry signals between the second plurality of electrically conductive lines and circuitry below the first level; and
a control unit to access an array of memory cells in response to receiving a memory access command; and
a processor to transmit the memory access command to the non-volatile memory device, the processor further to execute one or more applications stored in the array of memory cells.
9. The system of claim 8 , wherein the array of memory cells comprises an array of phase change memory cells in a cross-point array.
10. The system of claim 9 , wherein the cross-point array comprises a layer of selector devices positioned above the array of phase change memory cells and below the second plurality of electrically conductive lines.
11. The system of claim 8 , wherein each of the plurality of electrically conductive vias is positioned at a location where one of the second plurality of electrically conductive lines overlaps with one of the first plurality of electrically conductive lines.
12. A memory device, comprising:
a first plurality of electrically conductive electrode lines oriented in a first direction on a first level; and
a first memory material configurable to store information and positioned over the first plurality of electrically conductive electrode lines, the first memory material configurable to store information and including a plurality of electrically conductive vias in contact with the first memory material and with a second plurality of electrically conductive lines oriented in a second direction on a second level, wherein each electrically conductive via of the plurality of electrically conductive vias is configured to carry signals between the second plurality of electrically conductive lines and circuitry below the first level.
13. The memory device of claim 12 , wherein the plurality of electrically conductive vias extend from the first plurality of electrically conductive electrode lines to the second plurality of electrically conductive electrode lines to operatively couple the first plurality of electrically conductive electrode lines and the second plurality of electrically conductive electrode lines.
14. The memory device of claim 12 , further comprising of the memory material over the second plurality of electrically conductive electrode lines, the memory device comprising multiple stacks of cross-point memory arrays.
15. The memory device of claim 12 , further comprising a selector material between the first plurality of electrically conductive electrode lines and the second plurality of electrically conductive electrode lines.
16. The memory device of claim 15 , wherein each of the plurality of electrically conductive vias is in contact with the selector material.
17. The memory device of claim 15 , wherein the selector material comprises a plurality of patterned line segments, wherein each of the plurality of patterned line segments is oriented orthogonal to the first plurality of electrically conductive electrode lines, wherein each of the plurality of electrically conductive vias is located within one of the plurality of patterned line segments.
18. The memory device of claim 12 , wherein a sidewall of each of the plurality of electrically conductive vias is defined by a sidewall of the first memory material.
19. The memory device of claim 12 , wherein a sidewall of each of the plurality of electrically conductive vias is aligned with a sidewall of one of the first plurality of electrically conductive electrode lines.