Light-emitting semiconductor chip
A semiconductor chip includes a semiconductor body with a semiconductor layer sequence. An active region intended for generating radiation is arranged between an n-conductive multilayer structure and a p-conductive semiconductor layer. A doping profile is formed in the n-conductive multilayer structure which includes at least one doping peak.
1. A semiconductor chip comprising:
a semiconductor body with a semiconductor layer sequence, the semiconductor layer sequence comprising an n-conductive multilayer structure, a p-conductive semiconductor layer, and an active region provided for generating radiation; and
a contact layer;
wherein the n-conductive multilayer structure has a doping profile comprising at least one doping peak;
wherein the semiconductor body has a recess that extends through the p-conductive semiconductor layer and the active region into the n-conductive multilayer structure;
wherein the recess penetrates the at least one doping peak; and
wherein the contact layer is disposed in the recess and electrically contacts the n-conductive multilayer structure.
2. The semiconductor chip according to claim 1 , wherein a doping concentration in the at least one doping peak is at least five times as high as a doping concentration in a region of low n-conductive doping of the n-conductive multilayer structure.
3. The semiconductor chip according to claim 2 , wherein the doping concentration in the at least one doping peak is at least 4*10 18 cm −3 and wherein the doping concentration in the region of low n-conductive doping is at most 8*10 17 cm −3 .
4. The semiconductor chip according to claim 1 , wherein the at least one doping peak has a vertical extent that is between 1 nm and 30 nm, inclusive.
5. The semiconductor chip according to claim 4 , wherein the at least one doping peak has a vertical extent that is between 5 nm and 20 nm, inclusive.
6. The semiconductor chip according to claim 1 , wherein the at least one doping peak has a distance from the active region that is between 2 nm and 20 nm, inclusive.
7. The semiconductor chip according to claim 1 , wherein the n-conductive multilayer structure comprises a quantum structure with a first plurality of quantum layers.
8. The semiconductor chip according to claim 7 , wherein the active region comprises a second plurality of quantum layers, wherein the at least doping peak is arranged between a first quantum layer of the first plurality of quantum layers of the n-conductive multilayer structure that is closest to the active region and a second quantum layer of the second plurality of quantum layers of the active region that is closest to the n-conductive multilayer structure.
9. The semiconductor chip according to claim 8 , wherein a band gap of at least one quantum layer of the first plurality of quantum layers of the n-conductive multilayer structure is at least as large as a band gap of at least one quantum layer of the second plurality of quantum layers of the active region.
10. The semiconductor chip according to claim 7 , wherein the doping profile comprises a first doping peak and a second doping peak, wherein at least one quantum layer of the first plurality of quantum layers of the n-conductive multilayer structure is arranged between the first doping peak and the second doping peak.
11. The semiconductor chip according to claim 10 , wherein a sub-region of the quantum structure of the n-conductive multilayer structure comprises a high doping concentration by way of the second doping peak.
12. The semiconductor chip according to claim 1 , wherein the n-conductive multilayer structure comprises a plurality of quantum layers; and
wherein the recess penetrates the plurality of quantum layers of the n-conductive multilayer structure.
13. The semiconductor chip according to claim 1 , wherein the active region is based on a nitride compound semiconductor material.
14. The semiconductor chip according to claim 1 , wherein a crystal structure of the n-conductive multilayer structure comprises V-shaped indentations.
15. The semiconductor chip according to claim 1 , wherein a growth substrate for the semiconductor layer sequence is removed from the semiconductor body.
16. A semiconductor chip comprising:
a semiconductor body with a semiconductor layer sequence, the semiconductor layer sequence comprising an n-conductive multilayer structure; and
a contact layer;
wherein the n-conductive multilayer structure has a doping profile comprising at least one doping peak;
wherein the semiconductor body has a recess that penetrates the doping peak; and
wherein the contact layer in the recess electrically contacts the n-conductive multilayer structure.
17. The semiconductor chip according to claim 16 , wherein the semiconductor layer sequence further comprises a p-conductive semiconductor layer and an active region provided for generating radiation, the recess extending through the p-conductive semiconductor layer and the active region.
18. A semiconductor chip comprising:
a semiconductor body with a semiconductor layer sequence, the semiconductor layer sequence comprising an n-conductive multilayer structure and an active region provided for generating radiation;
a carrier, the semiconductor body being arranged on the carrier; and
a contact layer;
wherein the n-conductive multilayer structure has a doping profile comprising at least one doping peak;
wherein the n-conductive multilayer structure is arranged on a side of the active region remote from the carrier;
wherein the semiconductor body has a recess that penetrates the doping peak; and
wherein the contact layer is arranged in regions between the carrier and the semiconductor body and electrically contacts the n-conductive multilayer structure.