Cobalt CVD
A cobalt deposition process, including: volatilizing a cobalt precursor selected from among CCTBA, CCTMSA, and CCBTMSA, to form a precursor vapor; and contacting the precursor vapor with a substrate under vapor deposition conditions effective for depositing on the substrate (i) high purity, low resistivity cobalt or (ii) cobalt that is annealable by thermal annealing to form high purity, low resistivity cobalt. Such cobalt deposition process can be used to manufacture product articles in which the deposited cobalt forms an electrode, capping layer, encapsulating layer, diffusion layer, or seed for electroplating of metal thereon, e.g., a semiconductor device, flat-panel display, or solar panel.
1. A cobalt deposition process, comprising:
volatilizing a cobalt precursor selected from among CCTMSA, and CCBTMSA, to form a precursor vapor; and
contacting the precursor vapor with a substrate under vapor deposition conditions effective for depositing on the substrate (i) high purity, low resistivity cobalt or (ii) cobalt that is annealable by thermal annealing to form high purity, low resistivity cobalt.
2. The process of claim 1 , wherein:
the deposited cobalt forms an electrode, or
the deposited cobalt forms an electrode and the substrate comprises a high k gate or capacitor structure; or
the deposited cobalt forms a capping layer, or
the deposited cobalt forms a capping layer and the capping layer overlies a copper structure or via, or
the deposited cobalt forms an encapsulating layer, or
the deposited cobalt forms an encapsulating layer and the encapsulating layer covers a copper interconnect element, or
the deposited cobalt forms a diffusion barrier, or
deposited cobalt forms a seed for electroplating of metal thereon.
3. The process of claim 1 , wherein said vapor deposition conditions comprise a deposition temperature in a range of from 25° C. to 400° C.
4. The process of claim 1 , wherein the cobalt precursor is volatilized by vaporization of a solvent solution thereof, the solvent solution comprising organic solvent.
5. The process of claim 4 , wherein the solvent comprises octane.
6. The process of claim 1 , wherein the precursor vapor is transported in a carrier gas for the contacting thereof with the substrate, the carrier gas comprising gas selected from the group consisting of argon, neon, xenon, krypton, helium, and hydrogen.
7. The process of claim 1 , wherein the cobalt precursor comprises CCTMSA.
8. The process of claim 1 , wherein the cobalt after being deposited on the substrate is annealed by thermal annealing.
9. The process of claim 8 , wherein the thermal annealing is conducted at temperature in a range of from 200° C. to 600° C.
10. The process of claim 8 , wherein the thermal annealing is conducted for a period of time sufficient to reduce resistivity of the deposited cobalt, by an amount in a range of from 25% to 90% of the as-deposited resistivity of the cobalt film.
11. The process of claim 1 , wherein said contacting of the precursor vapor with the substrate is carried out for a period of time sufficient to deposit cobalt on the substrate at a thickness in a range of from 2 nm to 1000 nm.
12. The process of claim 1 , wherein the cobalt deposited on the substrate has a resistivity in a range of from 2 to 48 μΩ-cm.
13. The process of claim 1 , wherein the cobalt deposited on the substrate has a resistivity in a range of from 10 to 40 μΩ-cm.
14. The process of claim 1 , wherein the cobalt deposited on the substrate has a current density in a range of from 10 −1 to 10 −6 Amperes/cm 2 at an applied voltage of 0.5V.