Graphene pellicle for extreme ultraviolet lithography

1. A method, comprising:

depositing a first material layer over a substrate;

depositing a graphene layer over the first material layer, thereby forming a first assembly having the substrate, the first material layer, and the graphene layer;

attaching a carrier to the graphene layer;

removing the substrate from the first assembly; and

removing the first material layer from the first assembly.

2. The method of claim 1 , after the removing of the first material layer, further comprising:

mounting a pellicle frame to the first assembly and opposite the carrier; and

detaching the carrier from the first assembly, resulting in a second assembly having the graphene layer and the pellicle frame.

3. The method of claim 2 , further comprising:

attaching a protective cover to the pellicle frame.

4. The method of claim 2 , wherein the pellicle frame comprises aluminum alloy.

5. The method of claim 2 , further comprising:

trimming a portion of the graphene layer that extends beyond the pellicle frame.

6. The method of claim 2 , where the pellicle frame is mounted to the first assembly with a pressure-sensitive adhesive.

7. The method of claim 1 , wherein the substrate comprises silicon and the first material layer comprises nickel.

8. The method of claim 1 , wherein the depositing of the first material layer includes sputtering deposition of a layer of nickel to a thickness ranging from 50 to 500 nanometers (nm).

9. The method of claim 1 , wherein the depositing of the graphene layer includes chemical vapor deposition and the graphene layer is deposited to a thickness ranging from 5 to 50 nm.

10. The method of claim 1 , wherein the carrier is attached to the graphene layer by electrostatic charges.

11. The method of claim 1 , wherein the removing of the substrate and the first material layer include a dry etching process.

12. A method, comprising:

depositing a nickel layer over a substrate;

depositing a graphene layer over the nickel layer, thereby forming a first assembly having the substrate, the nickel layer, and the graphene layer;

attaching a carrier to the first assembly and over the graphene layer;

removing the substrate from the first assembly; and

removing the nickel layer from the first assembly, thereby exposing the graphene layer.

13. The method of claim 12 , further comprising:

mounting a pellicle frame to the graphene layer and opposite the carrier.

14. The method of claim 13 , wherein the pellicle frame comprises aluminum alloy.

15. The method of claim 13 , wherein the pellicle frame is a rectangular enclosure with four solid sides and two open sides opposite to each other, wherein one of the two open sides is mounted to the graphene layer.

16. The method of claim 13 , wherein the mounting of the pellicle frame to the graphene layer includes applying a pressure-sensitive adhesive between the pellicle frame and the graphene layer.

17. The method of claim 12 , wherein the carrier is attached to the first assembly by electrostatic charges.

18. A method, comprising:

depositing a nickel layer over a silicon substrate;

depositing a graphene layer over the nickel layer, thereby forming a first assembly having the silicon substrate, the nickel layer, and the graphene layer;

attaching a carrier to the first assembly and over the graphene layer;

removing the silicon substrate from the first assembly;

removing the nickel layer from the first assembly, thereby exposing the graphene layer; and

mounting a pellicle frame to the graphene layer and opposite the carrier.

19. The method of claim 18 , wherein the pellicle frame forms a rectangular enclosure with four solid sides and two opposite open sides, wherein one of the two opposite open sides is mounted to the graphene layer with a pressure-sensitive adhesive.

20. The method of claim 18 , further comprising:

trimming a portion of the graphene layer that extends beyond the pellicle frame.