Memory device including mixed non-volatile memory cell types
View Patent ↗Some embodiments include apparatuses, and methods of forming and operating the apparatuses. Some of the apparatuses include a conductive line, non-volatile memory cells of a first memory cell type, the non-volatile memory cells coupled in series among each other, and an additional non-volatile memory cell of a second memory cell type coupled to the conductive line and coupled in series with the non-volatile memory cells of the first memory cell type. The second memory cell type is different from the first memory cell type.
1. An apparatus comprising:
a conductive line;
non-volatile memory cells of a first memory cell type, the non-volatile memory cells coupled in series among each other;
an additional non-volatile memory cell of a second memory cell type coupled to the conductive line and coupled in series with the non-volatile memory cells of the first memory cell type, the second memory cell type being different from the first memory cell type; and
a select gate coupled in series with the additional non-volatile memory cell and the non-volatile memory cells, the select gate being between the additional memory cell and the non-volatile memory cells.
2. The apparatus of claim 1 , wherein the first memory cell type includes a floating-gate memory cell type.
3. The apparatus of claim 1 , wherein the first memory cell type includes a charge-trap memory cell type.
4. The apparatus of claim 1 , wherein the second memory cell type includes a ferroelectric memory cell type.
5. The apparatus of claim 1 , wherein each of the non-volatile memory cells of the first memory cell type is configured to store more bits of information than the additional non-volatile memory cell.
6. The apparatus of claim 1 , wherein the conductive line is part of a data line.
7. An apparatus comprising:
a pillar extending between a conductive material region and a source;
a memory cell string located along the pillar, the memory cell string including memory cells, each of the memory cells including a first structure configured to store information; and
an additional memory cell located along the pillar, the additional memory cell being between the conductive material region and the memory cell string, the additional memory cell including a second structure configured to store information, wherein the first and second structures include different materials.
8. The apparatus of claim 7 , further comprising a select gate located along the pillar, the selected gate being between the conductive material region and the memory cell string.
9. An apparatus comprising:
a pillar extending between a conductive material region and a source;
a memory cell string located along the pillar, the memory cell string including memory cells, each of the memory cells including a first structure configured to store information;
an additional memory cell located along the pillar, the additional memory cell being between the conductive material region and the memory cell string, the additional memory cell including a second structure configured to store information, wherein the first and second structures include different materials; and
a select gate located along the pillar, the selected gate being between the conductive material region and the memory cell string, wherein the select gate is between the additional memory cell and the memory cell string.
10. The apparatus of claim 7 , wherein the second structure includes a ferroelectric material.
11. The apparatus of claim 10 , wherein the first structure includes doped polycrystalline silicon.
12. The apparatus of claim 10 , wherein the first structure includes silicon nitride.
13. The apparatus of claim 7 , where the pillar is located over a semiconductor substrate, and the semiconductor substrate includes circuitry under the pillar.