Gate tie-down enablement with inner spacer
A method for forming a gate tie-down includes opening up a cap layer and recessing gate spacers on a gate structure to expose a gate conductor; forming inner spacers on the gate spacers; etching contact openings adjacent to sides of the gate structure down to a substrate below the gate structures; and forming trench contacts on sides of the gate structure. An interlevel dielectric (ILD) is deposited on the gate conductor and the trench contacts and over the gate structure. The ILD is opened up to expose the trench contact on one side of the gate structure and the gate conductor. A second conductive material provides a self-aligned contact down to the trench contact on the one side and to form a gate contact down to the gate conductor and a horizontal connection within the ILD over an active area between the gate conductor and the self-aligned contact.
1. A method for forming a gate tie-down, comprising:
forming inner spacers on gate spacers of a gate structure;
forming trench contacts on sides of the gate structure including opening up an interlevel dielectric (ILD) by performing an extreme ultraviolet (EUV) lithography using a same color lithography to form patterns for the gate contact and the self-aligned contact before etching; and
forming a conductive material in an opening through the ILD to provide a self-aligned contact down to the trench contact on one side of the gate structure and to form a gate contact down to a gate conductor and a horizontal connection within the ILD between the gate conductor and the self-aligned contact.
2. The method as recited in claim 1 , wherein the gate spacers and the inner spacers permit contact between the self-aligned contact and the gate contact and prevent contact between the trench contact on one side of the gate structure and the gate conductor.
3. The method as recited in claim 1 , wherein the forming the conductive material further includes forming the ILD on the gate conductor and the trench contacts and over other gate structures.
4. The method as recited in claim 3 , wherein the forming the conductive material further includes opening up the ILD to expose the trench contact on the one side of the gate structure and the gate conductor.
5. The method as recited in claim 4 , wherein opening up the ILD includes performing a lithography, etch, lithography, etch (LELE) procedure wherein one lithography and etch forms a contact hole for the self-aligned contact and the other lithography and etch forms a contact hole for the gate contact.
6. The method as recited in claim 4 , wherein opening up the ILD includes performing a lithography, freeze, lithography, etch (LFLE) procedure wherein one lithography forms a contact hole pattern for the self-aligned contact, which is frozen, and the other lithography forms a contact hole pattern for the gate contact before etching.
7. The method as recited in claim 1 , wherein the gate contact is self-aligned to the trench contact on one side of the gate structure.
8. The method as recited in claim 1 , further comprising opening up a cap layer to expose the gate conductor.
9. The method as recited in claim 8 , wherein the ILD includes a thickness above the cap layer of gate structures and the horizontal connection is formed within the thickness of the ILD.
10. A method for forming a gate tie-down, comprising:
recessing gate spacers on a gate structure to expose a gate conductor;
forming a conductive material in an opening through an interlevel dielectric (ILD) to form a self-aligned contact down to a trench contact on one side of the gate structure and to form a gate contact down to the gate conductor, the opening being formed by performing an extreme ultraviolet (EUV) lithography using a same color lithography to form patterns for the gate contact and the self-aligned contact before etching; and
planarizing the conductive material and the ILD to form a horizontal connection within the ILD over an active area between the gate conductor and the self-aligned contact.
11. The method as recited in claim 10 , wherein the gate spacers and inner spacers formed on the gate spacers permit contact between the self-aligned contact and the gate contact and prevent contact between the trench contact on one side of the gate structure and the gate conductor.
12. The method as recited in claim 10 , wherein the forming the conductive material further includes depositing the ILD on the gate conductor and over the gate structure.
13. The method as recited in claim 12 , wherein the forming the conductive material further includes opening the ILD to expose the trench contact on the one side of the gate structure and the gate conductor.
14. The method as recited in claim 13 , wherein opening up the ILD includes performing a lithography, etch, lithography, etch (LELE) procedure wherein one lithography and etch forms a contact hole for the self-aligned contact and the other lithography and etch forms a contact hole for the gate contact.
15. The method as recited in claim 13 , wherein opening up the ILD includes performing a lithography, freeze, lithography, etch (LFLE) procedure wherein one lithography forms a contact hole pattern for the self-aligned contact, which is frozen, and the other lithography forms a contact hole pattern for the gate contact before etching.
16. The method as recited in claim 13 , wherein the gate contact is self-aligned to the trench contact on one side of the gate structure.
17. The method as recited in claim 10 , further comprising opening up a cap layer to expose the gate conductor.
18. The method as recited in claim 17 , wherein the ILD includes a thickness above the cap layer of the gate structure and the horizontal connection is formed within the thickness of the ILD.