Semiconductor device
Provided is a semiconductor device which has low power consumption and can operate at high speed. The semiconductor device includes a memory element including a first transistor including crystalline silicon in a channel formation region, a capacitor for storing data of the memory element, and a second transistor which is a switching element for controlling supply, storage, and release of charge in the capacitor. The second transistor is provided over an insulating film covering the first transistor. The first and second transistors have a source electrode or a drain electrode in common.
1. A semiconductor device comprising:
a substrate;
a first transistor over the substrate, the first transistor comprising:
a first semiconductor body comprising silicon having crystallinity or germanium having crystallinity;
a first gate electrode overlapping the first semiconductor body;
a first gate insulating film between the first semiconductor body and the first gate electrode; and
a first source electrode and a first drain electrode electrically connected to the first semiconductor body;
a first insulating film over the first semiconductor body, the first gate electrode, and the first gate insulating film; and
a second transistor comprising:
a back gate electrode over the first insulating film;
an oxide semiconductor film over the back gate electrode;
a second gate electrode overlapping the oxide semiconductor film;
a second gate insulating layer between the oxide semiconductor film and the second gate electrode;
a second source electrode and a second drain electrode each in electric contact with the oxide semiconductor film; and
a side wall in direct contact with the second gate electrode,
wherein the oxide semiconductor film overlaps with the back gate electrode and the second gate electrode.
2. The semiconductor device according to claim 1 , further comprising:
a fourth insulating film comprising a projection, a top surface of the projection being in direct contact with a bottom surface of the oxide semiconductor film; and
a fifth insulating film on the fourth insulating film and around the projection,
wherein the back gate electrode is under the fourth insulating film.
3. The semiconductor device according to claim 2 ,
wherein the fifth insulating film covers a side edge of the oxide semiconductor film.
4. The semiconductor device according to claim 1 , further comprising:
a third insulating film covering the oxide semiconductor film, the second gate electrode, and the second gate insulating layer,
wherein the first insulating film and the third insulating film each comprise aluminum and oxygen.
5. The semiconductor device according to claim 1 ,
wherein the first semiconductor body is a semiconductor film.
6. A semiconductor device comprising:
a substrate;
a first transistor over the substrate, the first transistor comprising:
a first semiconductor body comprising silicon having crystallinity or germanium having crystallinity;
a first gate electrode overlapping the first semiconductor body;
a first gate insulating film between the first semiconductor body and the first gate electrode; and
a first source electrode and a first drain electrode electrically connected to the first semiconductor body;
a first insulating film over the first semiconductor body, the first gate electrode, and the first gate insulating film; and
a second transistor comprising:
a back gate electrode over the first insulating film;
an oxide semiconductor film over the back gate electrode;
a second gate electrode overlapping the oxide semiconductor film;
a second gate insulating layer between the oxide semiconductor film and the second gate electrode;
a second source electrode and a second drain electrode each in electric contact with the oxide semiconductor film; and
a side wall in direct contact with the second gate electrode,
wherein the oxide semiconductor film overlaps with the back gate electrode and the second gate electrode,
wherein the back gate electrode is in direct contact with the first insulating film, and
wherein the first insulating film comprises aluminum and oxygen.
7. The semiconductor device according to claim 6 , further comprising:
a fourth insulating film comprising a projection, a top surface of the projection being in direct contact with a bottom surface of the oxide semiconductor film; and
a fifth insulating film on the fourth insulating film and around the projection,
wherein the back gate electrode is under the fourth insulating film.
8. The semiconductor device according to claim 7 ,
wherein the fifth insulating film covers a side edge of the oxide semiconductor film.
9. The semiconductor device according to claim 6 , further comprising:
a third insulating film covering the oxide semiconductor film, the second gate electrode, and the second gate insulating layer,
wherein the first insulating film and the third insulating film each comprise aluminum and oxygen.
10. The semiconductor device according to claim 6 ,
wherein the first semiconductor body is a semiconductor film.
11. A semiconductor device comprising:
a substrate;
a first transistor over the substrate, the first transistor comprising:
a first semiconductor body comprising silicon having crystallinity or germanium having crystallinity;
a first gate electrode overlapping the first semiconductor body;
a first gate insulating film between the first semiconductor body and the first gate electrode; and
a first source electrode and a first drain electrode electrically connected to the first semiconductor body;
a first insulating film over the first semiconductor body, the first gate electrode, and the first gate insulating film;
a second transistor comprising:
an oxide semiconductor film over the first insulating film;
a second gate electrode overlapping the oxide semiconductor film;
a second gate insulating layer between the oxide semiconductor film and the second gate electrode;
a second source electrode and a second drain electrode each in electric contact with the oxide semiconductor film; and
a side wall in direct contact with the second gate electrode; and
a third insulating film on and in contact with the second gate electrode,
a fourth insulating film comprising a projection, a top surface of the projection being in direct contact with a bottom surface of the oxide semiconductor film; and
a fifth insulating film on the fourth insulating film and around the projection,
wherein the third insulating film comprises aluminum and oxygen.
12. The semiconductor device according to claim 11 ,
wherein the fifth insulating film covers a side edge of the oxide semiconductor film.
13. The semiconductor device according to claim 11 ,
wherein the first semiconductor body is a semiconductor film.