Semiconductor device
A change in electrical characteristics of a semiconductor device including an interlayer insulating film over a transistor including an oxide semiconductor as a semiconductor film is suppressed. The structure includes a first insulating film which includes a void portion in a step region formed by a source electrode and a drain electrode over the semiconductor film and contains silicon oxide as a component, and a second insulating film containing silicon nitride, which is provided in contact with the first insulating film to cover the void portion in the first insulating film. The structure can prevent the void portion generated in the first insulating film from expanding outward.
1. A semiconductor device comprising:
a gate electrode;
a gate insulating film over the gate electrode;
an oxide semiconductor film over the gate insulating film;
a source electrode and a drain electrode over the oxide semiconductor film;
an oxide insulating film over the source electrode, the drain electrode and the oxide semiconductor film; and
a nitride insulating film over the oxide insulating film,
wherein the oxide insulating film is in contact with the oxide semiconductor film,
wherein the oxide insulating film comprises void portions in regions covering side end surfaces of the source electrode and the drain electrode, and
wherein the nitride insulating film is in contact with the oxide insulating film and covers the void portions.
2. The semiconductor device according to claim 1 ,
wherein the nitride insulating film is denser than the oxide insulating film.
3. The semiconductor device according to claim 1 ,
wherein the oxide insulating film comprises a silicon oxide film, and
wherein the nitride insulating film comprises a silicon nitride film.
4. The semiconductor device according to claim 1 ,
wherein the oxide insulating film comprises a silicon oxynitride film, and
wherein the nitride insulating film comprises a silicon nitride film.
5. The semiconductor device according to claim 1 ,
wherein the oxide insulating film has a thickness larger than the nitride insulating film.
6. The semiconductor device according to claim 1 ,
wherein the oxide insulating film comprises a stack of layers.
7. The semiconductor device according to claim 1 ,
wherein the oxide insulating film has a density higher than or equal to 2.26 g/cm 3 and lower than or equal to 2.50 g/cm 3 .
8. The semiconductor device according to claim 1 ,
wherein the void portions are due to steps formed by the source electrode and the drain electrode.
9. A semiconductor device comprising:
a gate electrode;
a gate insulating film over the gate electrode;
an oxide semiconductor film over the gate insulating film;
a source electrode and a drain electrode over the oxide semiconductor film;
an oxide insulating film over the source electrode, the drain electrode and the oxide semiconductor film; and
a nitride insulating film over the oxide insulating film,
wherein the oxide insulating film is in contact with the oxide semiconductor film,
wherein the oxide insulating film comprises void portions in regions covering side end surfaces of the source electrode and the drain electrode,
wherein the nitride insulating film is in contact with the oxide insulating film, and
wherein the void portions are closed by the nitride insulating film.
10. The semiconductor device according to claim 9 ,
wherein the nitride insulating film is denser than the oxide insulating film.
11. The semiconductor device according to claim 9 ,
wherein the oxide insulating film comprises a silicon oxide film, and
wherein the nitride insulating film comprises a silicon nitride film.
12. The semiconductor device according to claim 9 ,
wherein the oxide insulating film comprises a silicon oxynitride film, and
wherein the nitride insulating film comprises a silicon nitride film.
13. The semiconductor device according to claim 9 ,
wherein the oxide insulating film has a thickness larger than the nitride insulating film.
14. The semiconductor device according to claim 9 ,
wherein the oxide insulating film comprises a stack of layers.
15. The semiconductor device according to claim 9 ,
wherein the oxide insulating film has a density higher than or equal to 2.26 g/cm 3 and lower than or equal to 2.50 g/cm 3 .
16. The semiconductor device according to claim 9 ,
wherein the void portions are due to steps formed by the source electrode and the drain electrode.