IP Library Granted Patent US 9,947,506
Granted Patent B2
US 9,947,506 · App. 15/467,126 · Granted Apr 17, 2018

Sample holder and focused ion beam apparatus

Inventors: Toshiyuki Iwahori (Tokyo, JP); Tsuyoshi Oonishi (Tokyo, JP)
Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
H01J37/20H01J37/26H01J2237/08H01J2237/206H01J2237/31745H01J2237/31749
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,947,506
App. No.
15/467,126
Granted
Apr 17, 2018
Kind
B2
Abstract

Shaft members which respectively protrude toward at least one beam member and the other beam member in a z-axis direction are formed in a mesh support member. A through hole for penetrating a space between a shaft end surface and an opening portion in the z-axis direction and introducing a focused ion beam toward a fine sample piece is formed in at least one shaft member.

Claims (25)

1. A sample holder, which is a side-entry type sample holder insertable and removable to and from a sample chamber of a focused ion beam apparatus, and which enables holding of a fine sample piece at a tip end side, the sample holder comprising:

a main body portion having a substantially bar shape and extending along an x-axis direction; and

a sample holding portion formed at one end portion of the main body portion in the x-axis direction, the sample holding portion comprising:

a first beam member and a second beam member, which are disposed to be separated in a z-axis direction orthogonal to an x axis, and which extend in the x-axis direction;

a mesh support member, which is disposed between the first beam member and the second beam member, and which has an opening portion enabling support of a mesh member, the mesh member being configured to hold the fine sample piece;

shaft members formed in the mesh support member, each of the shaft members respectively protruding toward the first beam member and the second beam member in the z-axis direction; and

a through hole formed in the mesh support member and at least one of the shaft members, the through hole penetrating a space between the opening portion and a shaft end surface of the at least one of the shaft members in the z-axis direction for introducing a focused ion beam toward the fine sample piece.

2. The sample holder according to claim 1 , wherein the sample holding portion further comprises:

a spring member configured to bias the mesh support member in one rotation direction around the z axis; and

a rotation control member configured to control rotation of the mesh support member at a predetermined position.

3. The sample holder according to claim 1 ,

wherein the shaft end surface of the one of the shaft members is provided on an inside of the first beam member, and

wherein a hole portion for exposing the shaft end surface to an outside is formed in at least one of the first beam member and the second beam member.

4. The sample holder according to claim 1 , wherein an opening diameter of the through hole is gradually increased from the opening portion to the shaft end surface of the one shaft member.

5. The sample holder according to claim 1 , wherein an engagement protrusion is formed on a tip end side of the sample holding portion, the engagement protrusion being for rotating the sample holding portion around the x axis.

6. A focused ion beam apparatus comprising:

the sample holder according to claim 1 ;

a sample stage on which a sample is placed;

a focused ion beam column configured to irradiate the sample with a focused ion beam so as to form a fine sample piece;

a sample chamber that accommodates the sample stage and the focused ion beam column; and

a sample-piece moving unit configured to move the fine sample piece between the sample stage and the sample holder.

7. The focused ion beam apparatus according to claim 6 , further comprising:

a load lock mechanism provided to the sample chamber, the load lock mechanism being configured to cause the sample holder to be insertable and removable to and from the sample chamber while maintaining airtight in the sample chamber.

8. The focused ion beam apparatus according to claim 6 , further comprising:

a transmission electron detector provided to the sample chamber, the transmission electron detector being configured to observe a transmission electron image of the fine sample piece held by the sample holder.

Assignments (3)
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0555 →
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0648 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 23, 2017
From: IWAHORI, TOSHIYUKI; OONISHI, TSUYOSHI
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 041700/0012 →
Priority Claims (1)
JP 2016-064337 · Mar 28, 2016 · national
Continuity (1)
Related Publication 20170278667A1 · Sep 28, 2017