Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them
The present invention provides a chemical mechanical (CMP) polishing pad for polishing, for example, a semiconductor substrate, having one or more endpoint detection windows (windows) which at a thickness of 2 mm would have a UV cut-off at a wavelength of 325 nm or lower which are the product of a reaction mixture of (A) from 30 to 56 wt. % of one or more cycloaliphatic diisocyanates or polyisocyanates with (B) from 43 to 69.9999 a polyol mixture of (i) a polymeric diol having an average molecular weight of from 500 to 1,500, such as a polycarbonate diol for hard windows and a polyether polyol for soft windows and (ii) a triol having an average molecular weight of from 120 to 320 in a weight ratio of (B)(i) polymeric diol to (B)(ii) triol ranging from 1.6:1 to 5.2:1, and a catalyst, preferably a secondary or tertiary amine, all weight percent's based on the total solids weight of the reaction mixture.
1. A chemical mechanical (CMP) polishing pad for polishing a substrate chosen from at least one of a magnetic substrate, an optical substrate and a semiconductor substrate, the CMP polishing pad comprising one or more endpoint detection windows, the one or more endpoint detection windows being a polyurethane, the polyurethane has a UV cut-off at a wavelength of 325 nm or lower, and is a product of a reaction mixture of (A) from 30 to 56 wt. % of one or more cycloaliphatic diisocyanates or polyisocyanates with (B) from 43 to 69.9999 wt. % of a polyol mixture of (i) a polymeric diol having an average molecular weight of from 500 to 1,500 and (ii) a triol having an average molecular weight of from 120 to 320 in a weight ratio of (B)(i) polymeric diol to (B)(ii) triol ranging from 1.6:1 to 5.2:1, and (C) a catalyst chosen from a tin containing catalyst in the amount of from 0.00001 to 0.1 wt. % or an aliphatic amine catalyst in the amount of from 0.01 to 1 wt. %, all weight percent's based on the total solids weight of the reaction mixture, for reacting the reaction mixture of (A) and (B).
2. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the polyurethane is the reaction product of (B) from 43 to 57.4999 wt. % of the polyol mixture and (A) from 42.5 to 55 wt. % of a cycloaliphatic diisocyanate.
3. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the one or more endpoint detection windows has a Shore D hardness ASTM D2240-15 (2015) of from 40 to 90, the (B)(i) polymeric diol is chosen from a polycarbonate diol, and the (B)(ii) triol is trimethylol propane (TMP) or a propoxylated trimethylolpropane having from 1 to 4 propoxy groups.
4. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the one or more endpoint detection windows has a Shore D hardness ASTM D2240-15 (2015) of from 60 to 90, and the weight ratio of (B)(i) polymeric diol to (B)(ii) triol ranges from 1.6:1 to 3.5:1.
5. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the one or more endpoint detection windows has a Shore D hardness ASTM D2240-15 (2015) of from 60 to 100, and a glass transition temperature (Tg) given by tan delta peak of from 73 to 95° C.
6. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the polyurethane is the reaction product of (B) from 55 to 69.9999 wt. % of the polyol mixture and (A) from 30 to 45 wt. % wt. % of a cycloaliphatic diisocyanate.
7. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the one or more endpoint detection windows has a Shore A hardness ASTM D2240-15 (2015) of from 40 to 80, the (B)(i) polymeric diol is chosen from a polyether diol, and the triol (B)(ii) is a propoxylated triol.
8. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the weight ratio of (B)(i) polymeric diol to (B)(ii) triol ranges from 3.5:1 to 5.2:1.
9. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the one or more endpoint detection windows has a Shore A hardness ASTM D2240-15 (2015) of from 40 to 85, and a glass transition temperature (Tg) given by a tan delta peak from 17 to 32° C.
10. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the polyurethane is the product of a reaction mixture wherein the mole ratio of the number of moles of isocyanate groups in (A) the cycloaliphatic diisocyanate or polyisocyanate to the number of moles of hydroxyl groups in the (B) polyol mixture ranges from 0.9:1 to 1.10:1.
11. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the polyurethane is the product of a reaction mixture that is substantially free of amine curatives, and the catalyst is an aliphatic tertiary amine catalyst.
12. The chemical mechanical (CMP) polishing pad as claimed in claim 1 , wherein the polyurethane is the product of a reaction mixture that is substantially free of amine curatives, and the catalyst is a tin containing catalyst.