IP Library Granted Patent US 10,204,761
Granted Patent B2
US 10,204,761 · App. 15/514,539 · Granted Feb 12, 2019

Charged particle beam device, electron microscope and sample observation method

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Quick Facts
Patent No.
US 10,204,761
App. No.
15/514,539
Granted
Feb 12, 2019
Kind
B2
Abstract

Provided is an electron microscope with which a sample can be observed stably and with high accuracy. The electron microscope comprises: a sample stage; an electron optical system that scans an electron beam over a sample; a vacuum system that maintains the sample stage and the electron optical system in a vacuum; a secondary electron detector that detects secondary electrons emitted from the sample; transmitted electron detectors that detect transmitted electrons that have transmitted through the sample; and a control device that obtains a secondary electron image and a transmitted electron image on the basis of the secondary electrons and the transmitted electrons detected by the secondary electron detector and the transmitted electron detectors and stores the secondary electron image and the transmitted electron image. The sample stage is provided with cooling means for cooling the sample. The vacuum system is provided with a cold trap that sucks moisture from around the sample and a vacuum gauge that measures the degree of vacuum of the vacuum system.

Claims (58)

1. A charged particle beam device comprising:

a sample stage for supporting a sample that becomes an observation target;

an optical system that irradiates the sample with a charged particle beam and scans the charged particle beam on the sample;

a vacuum system that maintains the sample stage and the optical system in a vacuum;

a secondary electron detector that detects a secondary electron emitted from the sample by irradiation with the charged particle beam;

a transmitted electron detector, disposed on an opposite side of the sample from the optical system, that detects a transmitted electron transmitted through the sample by the irradiation with the charged particle beam; and

a control device that obtains a secondary electron image and a transmitted electron image based on the secondary electron and the transmitted electron detected by the secondary electron detector and the transmitted electron detector and stores the secondary electron image and the transmitted electron image,

wherein the sample stage includes cooling means for cooling the sample,

the vacuum system includes a cold trap that sucks moisture in a vicinity of the sample, and

a vacuum gauge that measures a degree of vacuum of the vacuum system;

wherein the cold trap includes a movement mechanism that moves a tip position of the cold trap based on a state of frost attached to the sample.

2. The charged particle beam device according to claim 1 ,

wherein the sample stage further includes sample inclining means capable of changing an irradiated surface of the charged particle beam with respect to the sample.

3. The charged particle beam device according to claim 1 ,

wherein the transmitted electron detector is a bright field signal detector that detects a non-scattered electron and an inelastic scattered electron among transmitted electrons generated by scattering of the charged particle beam in the sample.

4. The charged particle beam device according to claim 1 ,

wherein the transmitted electron detector is a dark field signal detector that detects an inelastic scattered electron among transmitted electrons generated by scattering of the charged particle beam in the sample.

5. The charged particle beam device according to claim 1 ,

wherein the control device includes determination means that determines a cooling state of the sample based on the obtained secondary electron image and the transmitted electron image.

6. An electron microscope comprising:

a sample stage for supporting a sample that becomes an observation target;

an electron optical system that irradiates the sample with an electron beam and scans the electron beam on the sample;

a vacuum system that maintains the sample stage and the electron optical system in a vacuum;

a secondary electron detector that detects a secondary electron emitted from the sample by irradiation with the electron beam;

a transmitted electron detector, disposed on an opposite side of the sample from the electron optical system, that detects a transmitted electron transmitted through the sample by the irradiation with the electron beam; and

a control device that obtains a secondary electron image and a transmitted electron image based on the secondary electron and the transmitted electron detected by the secondary electron detector and the transmitted electron detector and stores the secondary electron image and the transmitted electron image,

wherein the sample stage includes cooling means for cooling the sample,

the vacuum system includes a cold trap that sucks moisture in a vicinity of the sample, and

a vacuum gauge that measures a degree of vacuum of the vacuum system;

wherein the cold trap includes a movement mechanism that moves a tip position of the cold trap based on a state of frost attached to the sample.

7. The electron microscope according to claim 6 ,

wherein the sample stage further includes sample inclining means capable of changing an irradiated surface of the electron beam with respect to the sample.

8. The electron microscope according to claim 6 ,

wherein the transmitted electron detector is a bright field signal detector that detects a non-scattered electron and an inelastic scattered electron among transmitted electrons generated by scattering of the electron beam in the sample.

9. The electron microscope according to claim 6 ,

wherein the transmitted electron detector is a dark field signal detector that detects an inelastic scattered electron among transmitted electrons generated by scattering of the electron beam in the sample.

10. The electron microscope according to claim 6 ,

wherein the control device includes determination means that determines a cooling state of the sample based on the obtained secondary electron image and the transmitted electron image.

11. The electron microscope according to claim 6 ,

wherein the cold trap includes a movement mechanism that can move a tip position of the cold trap to an arbitrary position in the vicinity of the sample.

12. A sample observation method comprising:

detecting a secondary electron emitted from a cooled sample;

detecting a transmitted electron transmitted through the cooled sample to a transmitted electron detector on an opposite side of the cooled sample;

obtaining a secondary electron image and a transmitted electron image of a cooled sample based on the secondary electron and the transmitted electron;

observing the cooled sample based on the obtained secondary electron image and the transmitted electron image;

observing changes of a surface state and an internal state of the cooled sample based on the obtained secondary electron image and the transmitted electron image;

sucking moisture from a vicinity of the cooled sample with a cold trap; and

moving a tip position of the cold trap based on a state of frost attached to the cooled sample.

13. The sample observation method according to claim 12 ,

wherein the transmitted electron image is a bright field image.

14. The sample observation method according to claim 13 , further comprising:

determining a state of the sample based on gradation of the obtained bright field image.

15. The sample observation method according to claim 12 ,

wherein the transmitted electron image is a dark field image.

16. The sample observation method according to claim 12 , further comprising:

determining a cooling state of the sample based on the obtained secondary electron image and the transmitted electron image;

continuing to obtain the secondary electron image and the transmitted electron image in a case where it is determined that the cooling state of the sample is favorable; and

changing an obtainment condition of the secondary electron image and the transmitted electron image in a case where it is determined that the cooling state of the sample is not favorable.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 27, 2017
From: SUNAOSHI, TAKESHI; NAGAKUBO, YASUHIRA; NIMURA, KAZUTAKA
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 041749/0923 →