IP Library Granted Patent US 10,674,612
Granted Patent B2
US 10,674,612 · App. 15/527,644 · Granted Jun 2, 2020

Semiconductor device and manufacturing method therefor, and resin composition for forming flexible resin layer

Inventors: Tomoaki Shibata (Tokyo, JP); Hanako Yori (Tokyo, JP); Tomonori Minegishi (Tokyo, JP); Hidenori Abe (Tokyo, JP); Takashi Masuko (Tokyo, JP); Shunsuke Otake (Tokyo, JP)
Assignee: HITACHI CHEMICAL COMPANY, LTD.
H05K3/284G01P1/127H01L21/56H05K1/0393H05K3/28H01L21/561H01L23/3121H01L25/18H01L2924/0002H01L2924/12041H01L2924/1421H01L2924/1434H05K1/189H05K3/0052H05K2201/0108H05K2201/0129H05K2201/0133H05K2201/0154H05K2201/0158H05K2201/0162H05K2201/10098H05K2201/10151
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Quick Facts
Patent No.
US 10,674,612
App. No.
15/527,644
Granted
Jun 2, 2020
Kind
B2
Abstract

Disclosed is a method for producing a semiconductor device including a circuit board having a flexible resin layer that encapsulates a circuit component. The method may include a step of immersing a flexible substrate in an encapsulant, drying the encapsulant, and thereby encapsulating the circuit component with the encapsulant; and a step of curing the encapsulant, and thereby forming a flexible resin layer.

Claims (29)

1. A resin composition for forming a flexible resin layer, the resin composition comprising:

(A) an elastomer including a styrene-based elastomer and a non-polymerizable thermoplastic polyurethane;

(B) a polymerizable compound; and

(C) a polymerization initiator,

wherein the content of the (A) elastomer is 60% to 85% by mass with respect to the total amount of the (A) elastomer and the (B) polymerizable compound,

the content of the (B) polymerizable compound is 15% to 40% by mass with respect to the total amount of the (A) elastomer and the (B) polymerizable compound, and

a flexible resin layer formed by curing the resin composition has a total light transmittance of 80% or higher.

2. The resin composition for forming a flexible resin layer according to claim 1 , wherein the (B) polymerizable compound contains an ethylenically unsaturated group.

3. The resin composition for forming a flexible resin layer according to claim 1 , wherein the (C) polymerization initiator is a photoradical polymerization initiator.

4. The resin composition for forming a flexible resin layer according to claim 1 ,

wherein

the content of the (C) polymerization initiator is 0.1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the (A) elastomer and the (B) polymerizable compound.

5. The resin composition for forming a flexible resin layer according to claim 1 , wherein the resin composition is an encapsulant.

6. A resin film comprising the resin composition for forming a flexible resin layer according to claim 1 .

7. A semiconductor device, comprising a circuit board having a flexible substrate, a circuit component mounted on the flexible substrate, and a flexible resin layer encapsulating the circuit components,

wherein the flexible resin layer is a layer obtained by curing a resin composition for forming a flexible resin layer, the resin composition comprising:

(A) an elastomer including a non-polymerizable thermoplastic polyurethane;

(B) a polymerizable compound; and

(C) a polymerization initiator,

wherein the content of the (A) elastomer is 60% to 85% by mass with respect to the total amount of the (A) elastomer and the (B) polymerizable compound,

the content of the (B) polymerizable compound is 15% to 40% by mass with respect to the total amount of the (A) elastomer and the (B) polymerizable compound, and

the flexible resin layer obtained by curing the resin composition has a total light transmittance of 80% or higher.

8. A resin composition for forming a flexible resin layer, the resin composition comprising:

(A) an elastomer including a non-polymerizable thermoplastic polyurethane, wherein the non-polymerizable thermoplastic polyurethane comprises a non-yellowing thermoplastic polyurethane obtained from reaction of hexamethylene diisocyanate with a polycarbonate diol;

(B) a polymerizable compound; and

(C) a polymerization initiator,

wherein the content of the (A) elastomer is 60% to 85% by mass with respect to the total amount of the (A) elastomer and the (B) polymerizable compound,

the content of the (B) polymerizable compound is 15% to 40% by mass with respect to the total amount of the (A) elastomer and the (B) polymerizable compound, and

a flexible resin layer formed by curing the resin composition has a total light transmittance of 80% or higher.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
CHANGE OF NAME Recorded Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 6, 2019
From: SHIBATA, TOMOAKI; YORI, HANAKO; MINEGISHI, TOMONORI; ABE, HIDENORI; MASUKO, TAKASHI; OTAKE, SHUNSUKE
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 049980/0886 →