IP Library Granted Patent US 10,269,536
Granted Patent B2
US 10,269,536 · App. 15/554,812 · Granted Apr 23, 2019

Electron microscope

Inventors: Satoshi Takada (Tokyo, JP); Naomasa Suzuki (Tokyo, JP); Kazuo Aoki (Tokyo, JP); Takehiko Konno (Tokyo, JP); Takayuki Hoshino (Tokyo, JP)
Assignee: Hitachi High-Technologies Corporation
H01J37/244G01N23/2252H01J37/14H01J37/28G01N2223/076G01N2223/079H01J2237/2445H01J2237/24485
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Quick Facts
Patent No.
US 10,269,536
App. No.
15/554,812
Granted
Apr 23, 2019
Kind
B2
Abstract

The objective of the present invention is to simultaneously achieve image observations at a high resolution using an electron microscope, and X-ray analysis at a high energy-resolution using a microcalorimeter. An X-ray detector is disposed at a position where the intensity of the magnetic field from an objective lens is weaker than the critical magnetic field of a material used in a thermal insulation shield for a superconducting transition-edge sensor or a microcalorimeter. In addition, an optical system for transmitting X-rays to the detector is inserted between a sample and the detector. Alternatively, a magnetic field shield for shielding the X-ray detector is used.

Claims (45)

1. An electron microscope comprising:

an electron source that generates an electron beam;

an objective lens that focuses the electron beam on a sample;

an X-ray detector that detects X-rays generated from the sample and performs energy spectroscopy; and

an X-ray optical system that transmits X-rays generated from the sample to the X-ray detector such that the X-rays are transmitted far away from a tip of a magnetic path of the objective lens,

wherein the X-ray detector is disposed in a space where the intensity of a magnetic field formed from the objective lens is weaker than a predetermined intensity of the magnetic field.

2. The electron microscope according to claim 1 ,

wherein the x-ray detector includes a superconducting transition-edge sensor.

3. The electron microscope according to claim 2 ,

wherein the predetermined intensity of the magnetic field is the intensity of the critical magnetic field in which a superconducting state of the superconducting transition-edge sensor is destroyed.

4. The electron microscope according to claim 2 ,

wherein the X-ray detector has a thermal insulation shield made of a superconducting material, and

wherein the predetermined intensity of the magnetic field is the intensity of the critical magnetic field in which a superconducting state of the thermal insulation shield is destroyed.

5. The electron microscope according to claim 1 ,

wherein the X-ray detector is a microcalorimeter.

6. The electron microscope according to claim 1 ,

wherein the X-ray optical system is a poly-capillary lens.

7. The electron microscope according to claim 1 ,

wherein the X-ray optical system is disposed between an upper magnetic path and a lower magnetic path of the objective lens.

8. The electron microscope according to claim 1 ,

wherein the X-ray optical system is disposed on the electron source side from the upper magnetic path of the objective lens in a magnetic field formed by the upper magnetic path.

9. The electron microscope according to claim 1 ,

wherein the X-ray optical system is disposed on the sample side from the lower magnetic path of the objective lens in a magnetic field formed by the lower magnetic path.

10. The electron microscope according to claim 1 ,

wherein a lower magnetic path of the objective lens is disposed to be parallel to the sample.

11. An electron microscope comprising:

an electron source that generates an electron beam;

an objective lens that focuses the electron beam on a sample;

an X-ray detector that detects X-rays generated from the sample and performs energy spectroscopy; and

a magnetic field shield that shields the X-ray detector from a magnetic field formed from the objective lens,

wherein the X-ray detector is disposed in a space where the intensity of a magnetic field formed from the objective lens due to the magnetic field shield is weaker than a predetermined intensity of the magnetic field; and

wherein at least a part of the X-ray detector is disposed between an upper magnetic path and a lower magnetic path of the objective lens.

12. The electron microscope according to claim 11 ,

wherein the x-ray detector includes a superconducting transition-edge sensor.

13. The electron microscope according to claim 12 ,

wherein the predetermined intensity of the magnetic field is the intensity of the critical magnetic field in which a superconducting state of the superconducting transition-edge sensor is destroyed.

14. An electron microscope comprising:

an electron source that generates an electron beam;

an objective lens that focuses the electron beam on a sample;

an X-ray detector that detects X-rays generated from the sample and performs energy spectroscopy; and

a magnetic field shield that shields the X-ray detector from a magnetic field formed from the objective lens,

wherein the X-ray detector is disposed in a space where the intensity of a magnetic field formed from the objective lens due to the magnetic field shield is weaker than a predetermined intensity of the magnetic field;

wherein the x-ray detector includes a superconducting transition-edge sensor; and

wherein the X-ray detector has a thermal insulation shield made of a superconducting material, and

wherein the predetermined intensity of the magnetic field is the intensity of the critical magnetic field in which a superconducting state of the thermal insulation shield is destroyed.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 31, 2017
From: TAKADA, SATOSHI; SUZUKI, NAOMASA; AOKI, KAZUO; KONNO, TAKEHIKO; HOSHINO, TAKAYUKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 043463/0721 →
Continuity (1)
Related Publication 20180240643A1 · Aug 23, 2018
Cited By (1)
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