High-purity tungsten hexacarbonyl for solid source delivery
A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.
1. A solid source material for forming a tungsten-containing film by vapor deposition, which is a sintered tungsten hexacarbonyl consolidated from particulate tungsten hexacarbonyl at a temperature below 100° C., wherein the solid source material has a content of molybdenum that is less than 1000 ppm.
2. The solid source material of claim 1 , wherein the content of molybdenum is less than 300 ppm.
3. The solid source material of claim 1 , wherein the content of molybdenum is less than 10 ppm.
4. The solid source material of claim 1 , wherein the particulate tungsten hexacarbonyl is a particulate of particles of size less than 5 mm.
5. The solid source material of claim 4 , wherein particles of size greater than 1.4 mm are less than 15% of the particles.
6. The solid source material of claim 4 , wherein particles of size 0.25 mm to 1.4 mm are at least 50% of the particles.
7. The solid source material of claim 4 , wherein particles of size 0.25 mm to 1.4 mm are at least 70% of the particles.
8. The solid source material of claim 4 , wherein at least 80% of the particles are particles of size below 0.25 mm.
9. A process for forming a solid source material for forming a tungsten-containing film by vapor deposition, comprising:
providing particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm; and
sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material for forming a tungsten-containing film by vapor deposition, as a sintered solid.
10. The process of claim 9 , wherein the sintering comprises cold sintering.
11. The process of claim 9 , wherein content of molybdenum in the particulate tungsten hexacarbonyl raw material is less than 300 ppm.
12. The process of claim 9 , wherein content of molybdenum in the particulate tungsten hexacarbonyl raw material is less than 10 ppm.
13. The process of claim 9 , wherein particles of size 0.25 mm to 1.4 mm are at least 50% of the particles.
14. The process of claim 9 , wherein particles of size 0.25 mm to 1.4 mm are at least 70% of the particles.
15. A method of forming a tungsten-containing film on a substrate, comprising volatilizing a solid source material as claimed in claim 1 , to form a tungsten solid source material vapor, and contacting the tungsten solid source material vapor with a substrate under vapor deposition conditions, to form the tungsten-containing film on the substrate.
16. The method of claim 15 , wherein the contacting is carried out at temperature below 200° C.
17. The method of claim 15 , wherein the contacting is carried out at temperature below 100° C.
18. A tungsten solid source material supply package, comprising a vessel containing a solid source material as claimed in claim 1 .