IP Library Granted Patent US 10,106,512
Granted Patent B2
US 10,106,512 · App. 15/559,542 · Granted Oct 23, 2018

Metal plating compositions

Inventors: Lingli Duan (Shanghai, CN); Chen Chen (Shanghai, CN); Shaoguang Feng (Shanghai, CN); Zukhra I. Niazimbetova (Westborough, MA); Maria Anna Rzeznik (Shrewsbury, MA)
Assignees: Dow Global Technologies LLC; Rohm and Haas Electronic Materials LLC
C07D265/33C07D241/04C07D413/12C08G73/028C08G73/0293C08G73/10C09D179/08C25D3/32C25D3/38C25D7/00C25D7/123
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Quick Facts
Patent No.
US 10,106,512
App. No.
15/559,542
Granted
Oct 23, 2018
Kind
B2
Abstract

Reaction products of primary and secondary diamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.

Claims (12)

1. A composition comprising one or more sources of metal ions chosen from copper salts and tin salts, an electrolyte, and a reaction product of one or more diamines and one or more compounds having formula:

wherein the one or more diamines have a formula:

R 13 and R 14 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 12 )alkyl, alkyleneoxy or substituted or unsubstituted (C 6 -C 18 )aryl, and R′ comprises the following moieties:

a substituted or unsubstituted (C 6 -C 18 )aryl, R 15 -R 22 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 5 )alkyl, linear or branched hydroxy(C 1 -C 5 )alkyl or linear or branched (C 1 -C 5 )alkoxy, and Z is a carbon atom or nitrogen atom, and p and s may be the same or different and are independently integers of one or greater, e is an integer of 0 to 3, and a, b, c and d may be the same or different and are numbers from 1 or greater, R 23 and R 24 may be the same or different and are hydrogen or amino(C 1 -C 10 )alkyl, and R comprises moieties having the following formula:

R 1 , R 2 , R 3 and R 4 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 4 )alkyl, hydroxyl, hydroxy(C 1 -C 3 )alkyl, carboxyl, carboxy(C 1 -C 3 )alkyl or (C 1 -C 3 )alkoxy, R 5 and R 6 may be the same or different and comprise hydrogen, carboxyl and carboxy(C 1 -C 3 )alkyl, R 7 , R 8 , R 9 and R 10 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 5 )alkyl, linear or branched hydroxy(C 1 -C 5 )alkyl, carboxy(C 1 -C 3 )alkyl, linear or branched (C 1 -C 5 )alkoxy, R 11 and R 12 may be the same or different and comprise hydrogen or linear or branched (C 1 -C 5 )alkyl, Ar is an aryl group having 5 to 6 carbon atoms, n and m may be the same or different and are integers of 1 to 15, and q, r and t may be the same or different and are integers of 1 to 10.

2. The composition of claim 1 , wherein the diamine has a formula:

wherein R 13 and R 14 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 12 )alkyl, alkyleneoxy or substituted or unsubstituted (C 6 -C 18 )aryl, and R′ comprises the following moieties:

R 15 -R 22 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 5 )alkyl, linear or branched hydroxy(C 1 -C 5 )alkyl or linear or branched (C 1 -C 5 )alkoxy, and p and s may be the same or different and are independently integers of one or greater, e is an integer of 0 to 3, and a, b, c and d may be the same or different and are numbers from 1 or greater.

3. The composition of claim 1 , wherein R is the moiety:

R 1 and R 2 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 4 )alkyl, hydroxyl, hydroxy(C 1 -C 3 )alkyl, carboxyl, carboxy(C 1 -C 3 )alkyl or (C 1 -C 3 )alkoxy, and m is an integer of 1 to 15.

4. The composition of claim 1 , wherein the one or more sources of metal ions are chosen from copper salts.

5. The composition of claim 1 , further comprising one or more of acids, sources of halide ions, accelerators and suppressors.

Assignments (7)
SECURITY INTEREST Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 073517/0298 →
SECURITY INTEREST Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073515/0243 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 17, 2024
From: THE DOW CHEMICAL COMPANY
To: DDP SPECIALTY ELECTRONIC MATERIALS US, INC
Reel/Frame 068971/0362 →
CHANGE OF LEGAL ENTITY Recorded Sep 17, 2024
From: DDP SPECIALTY ELECTRONIC MATERIALS US, INC
To: DDP SPECIALTY ELECTRONIC MATERIALS US, LLC
Reel/Frame 068972/0210 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 17, 2024
From: DOW GLOBAL TECHNOLOGIES LLC
To: THE DOW CHEMICAL COMPANY
Reel/Frame 068971/0226 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 7, 2019
From: NIAZIMBETOVA, ZUHRA I.; RZEZNIK, MARIA ANNA
To: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Reel/Frame 047922/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 16, 2018
From: CHEN, CHEN; FENG, SHAOGUANG; DUAN, LINGLI
To: DOW GLOBAL TECHNOLOGIES LLC
Reel/Frame 047523/0093 →
Continuity (1)
Related Publication 20180093957A1 · Apr 5, 2018