IP Library Granted Patent US 10,062,835
Granted Patent B2
US 10,062,835 · App. 15/588,994 · Granted Aug 28, 2018

Magnetic tunnel junctions

Inventors: Wei Chen (Poets Villas, SG); Witold Kula (Gilroy, CA); Manzar Siddik (Ang Mo Kio, SG); Suresh Ramarajan (Seletaris, SG); Jonathan D. Harms (Boise, ID)
Assignee: Micron Technology, Inc.
H01L43/02H01L27/224H01L43/10
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Quick Facts
Patent No.
US 10,062,835
App. No.
15/588,994
Granted
Aug 28, 2018
Kind
B2
Abstract

A magnetic tunnel junction comprises a conductive first magnetic electrode comprising magnetic recording material, a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material, and a non-magnetic tunnel insulator material between the first and second electrodes. The magnetic reference material of the second electrode comprises a synthetic antiferromagnetic construction comprising two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other. The one magnetic region comprises a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50. The Co x Fe y B z is directly against the tunnel insulator. A non-magnetic region comprising an Os-containing material is between the two spaced magnetic regions. The other magnetic region comprises a magnetic Co-containing material. Other embodiments are disclosed.

Claims (63)

1. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes;

the first magnetic electrode comprising dielectric material, the magnetic recording material being between the dielectric material and the tunnel insulator, the first magnetic electrode comprising non-magnetic conductive material, the dielectric material being between the non-magnetic conductive material and the magnetic recording material, the first magnetic electrode being devoid of any magnetic polarizer region between the dielectric material and the non-magnetic conductive material; and

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a non-magnetic region comprising an Os-containing material between the two spaced magnetic regions, the Os-containing material being directly against the Co x Fe y B z ; and

the other spaced magnetic region comprising magnetic Co-containing material directly against the Os-containing material; and

non-magnetic Ni s Fe t Cr u directly against the magnetic Co-containing material, where “s” is from 50 to 100, “t” is from 0 to 30, and “u” is from 0 to 45; the Co-containing material being between the Os-containing material and the non-magnetic Ni s Fe t Cr u .

2. The magnetic tunnel junction of claim 1 wherein the Co-containing material is elemental Co.

3. The magnetic tunnel junction of claim 1 wherein the magnetic recording material comprises 3 Angstroms thick Fe directly against an alloy comprising Co, Fe, and B that is 10 Angstroms thick.

4. The magnetic tunnel junction of claim 1 wherein the one magnetic region comprises at least one of elemental W, elemental Mo, elemental Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50.

5. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes;

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a non-magnetic region comprising an Os-containing material between the two spaced magnetic regions;

the other magnetic region comprising a magnetic Co-containing material; and

the one magnetic region comprises at least one of elemental-form W, elemental-form Mo, elemental-form Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50; and

the magnetic recording material comprising at least two of the elemental-form W, elemental-form Mo, elemental-form Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z .

6. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes;

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a non-magnetic region comprising an Os-containing material between the two spaced magnetic regions;

the other magnetic region comprising a magnetic Co-containing material; and

the one magnetic region comprises at least one of elemental-form W, elemental-form Mo, elemental-form Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50; and

the magnetic recording material comprising elemental-form W, elemental-form Mo directly against the Co x Fe y B z .

7. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes;

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a non-magnetic region comprising an Os-containing material between the two spaced magnetic regions;

the other magnetic region comprising a magnetic Co-containing material; and

the one magnetic region comprises at least one of elemental-form W, elemental-form Mo, elemental-form Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50; and

the magnetic recording material comprising elemental-form Mo directly against the Co x Fe y B z .

8. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes;

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a non-magnetic region comprising an Os-containing material between the two spaced magnetic regions;

the other magnetic region comprising a magnetic Co-containing material; and

the one magnetic region comprises at least one of elemental-form W, elemental-form Mo, elemental-form Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50; and

the magnetic recording material comprising elemental-form Fe directly against the Co x Fe y B z .

9. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes;

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a non-magnetic region comprising an Os-containing material between the two spaced magnetic regions;

the other magnetic region comprising a magnetic Co-containing material; and

the one magnetic region comprises at least one of elemental-form W, elemental-form Mo, elemental-form Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50; and

the magnetic recording material comprising Co a Fe b Ta c directly against the Co x Fe y B z .

Assignments (6)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050700/0535 →
RELEASE OF SECURITY INTEREST Recorded Jul 20, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 046597/0393 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
SUPPLEMENT NO. 5 TO PATENT SECURITY AGREEMENT Recorded Aug 8, 2017
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 043482/0776 →
SUPPLEMENT NO. 5 TO PATENT SECURITY AGREEMENT Recorded Aug 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION
Reel/Frame 043483/0686 →
Continuity (2)
Division 15154033 · May 13, 2016
Related Publication 20170331032A1 · Nov 16, 2017