Trench isolation interfaces

1. A semiconductor structure, comprising:

a semiconductor substrate having a shallow trench isolation (STI) structure with a trench formed therein; and

a material in the trench that forms a charged interface by interaction with the semiconductor substrate of the STI structure; and

wherein the formed charged interface raises a parasitic threshold of the STI structure.

2. The semiconductor structure of claim 1 , further comprising:

a memory device positioned interior to the trench of the STI structure and adjacent the trench; and

wherein the formed charged interface reduces an edge fringing field intensity for the memory device.

3. The semiconductor structure of claim 2 , wherein the formed charged interface further reduces a rate of charge loss for the memory device.

4. The semiconductor structure of claim 2 , wherein the memory device is a field effect transistor (FET).

5. The semiconductor structure of claim 1 , wherein:

the material in the trench is an aluminum oxide (Al 2 O 3 ) dielectric; and

the semiconductor substrate of the STI structure is polycrystalline silicon formed outside the trench relative to a memory device formed interior to the trench; and

wherein the charged interface is an aluminosilicate (AlSiO x ) formed at an interface between the polycrystalline silicon of the STI structure and the Al 2 O 3 dielectric.

6. The semiconductor structure of claim 5 , wherein the AlSiO x has a fixed negative charge with an electron density in a range of from around 1×10 11 to around 5×10 12 extra electrons per square centimeter at a uni-potential interface.

7. A semiconductor structure, comprising:

a polycrystalline silicon (polysilicon) substrate having a shallow trench isolation (STI) structure with a trench formed therein;

an aluminum oxide (Al 2 O 3 ) dielectric in the trench formed on a surface of the STI structure; and

a memory device with a portion positioned interior to the trench of the STI structure and adjacent the trench.

8. The semiconductor structure of claim 7 , wherein the Al 2 O 3 dielectric forms an interface with a fixed negative charge by interaction with the polysilicon substrate.

9. The semiconductor structure of claim 7 , further comprising:

a silicon oxide (SiO 2 ) dielectric in the trench formed on the surface of the STI structure; and

the Al 2 O 3 dielectric formed on the SiO 2 dielectric to form an interface with a fixed negative charge by interaction of the SiO 2 dielectric with the Al 2 O 3 dielectric.

10. The semiconductor structure of claim 7 , wherein the memory device is a NAND or NOR non-volatile memory device.

11. The semiconductor structure of claim 7 , wherein the memory device is a nitride read-only memory (NROM) non-volatile memory device.

12. The semiconductor structure of claim 7 , further comprising:

the memory device having a polysilicon gate formed above the STI structure and wider than opposite walls of the trench; and

an extension layer of the Al 2 O 3 dielectric layer of the trench formed between the STI structure and the polysilicon gate formed wider than the opposite walls of the trench.

13. The semiconductor structure of claim 12 , further comprising a high dielectric constant (k) dielectric layer formed between the polysilicon gate and the Al 2 O 3 dielectric layer of the extension layer.

14. The semiconductor structure of claim 13 , wherein the high k dielectric layer has a dielectric constant above 6.0.

15. The semiconductor structure of claim 12 , further comprising:

a floating gate of the memory device formed under the high k dielectric layer and between opposite walls of the trench formed from the Al 2 O 3 dielectric; and

a tunnel layer formed under the floating gate and between the opposite walls of the trench formed from the Al 2 O 3 dielectric.

16. The semiconductor structure of claim 12 , further comprising a high dielectric constant (k) dielectric layer formed under the polysilicon gate and between opposite walls of the trench formed from the Al 2 O 3 dielectric.

17. The semiconductor structure of claim 16 , further comprising a solid nitride layer formed under the high k dielectric layer and between opposite walls of the trench formed from the Al 2 O 3 dielectric.

18. The semiconductor structure of claim 16 , further comprising:

a floating plate formed from an injector silicon-rich nitride, wherein the floating plate is formed under the high k dielectric layer and between opposite walls of the trench formed from the Al 2 O 3 dielectric; and

a tunnel layer formed under the floating plate and between the opposite walls of the trench formed from the Al 2 O 3 dielectric, wherein the tunnel layer is formed between the floating plate and the polysilicon substrate.

19. A semiconductor structure, comprising:

a semiconductor substrate having a shallow trench isolation (STI) structure with a trench formed therein;

an Al 2 O 3 dielectric layer in the trench; and

an injector silicon-rich nitride (IN-SRN) layer formed on a surface of the trench opposite from the semiconductor substrate of the STI structure and adjacent the Al 2 O 3 dielectric layer; and

wherein a composite of the Al 2 O 3 dielectric layer and the IN-SRN layer forms a charged interface that raises a parasitic threshold of the STI structure.

20. The semiconductor structure of claim 19 , wherein the Al 2 O 3 dielectric layer contributes to formation of a charged interface with a fixed negative charge by interaction with the polysilicon substrate.

21. The semiconductor structure of claim 19 , further comprising:

a silicon oxide (SiO 2 ) dielectric layer in the trench formed on a surface of the STI structure; and

the Al 2 O 3 dielectric layer formed upon the SiO 2 dielectric layer; and

wherein a composite of the SiO 2 dielectric layer and the Al 2 O 3 dielectric layer contributes to formation of a charged interface with a fixed negative charge.

22. The semiconductor structure of claim 19 , further comprising:

a memory device positioned interior to the trench of the STI structure and adjacent the IN-SRN layer; and

wherein the composite of the Al 2 O 3 dielectric layer and the IN-SRN layer reduces an edge fringing field intensity for the memory device.

23. The semiconductor structure of claim 19 , further comprising:

a memory device positioned interior to the trench of the STI structure and adjacent the IN-SRN layer; and

a channel of the memory device positioned interior to the IN-SRN layer, the channel having a width and a length perpendicular to the IN-SRN layer formed on the surface of the trench; and

wherein the length and width of the channel is in a range of from around twenty nanometers (nm) to around five nm.

24. A semiconductor structure, comprising:

a polycrystalline silicon (polysilicon) substrate having a shallow trench isolation (STI) structure with a trench formed therein;

an aluminum oxide (Al 2 O 3 ) dielectric layer in the trench formed on a surface of the STI structure that forms an interface with a fixed negative charge by interaction with the polysilicon of the STI structure;

an injector silicon-rich nitride (IN-SRN) layer formed on a surface of the Al 2 O 3 dielectric layer opposite from the interface with the fixed negative charge;

a memory device with a portion positioned interior to the trench of the STI structure and adjacent the IN-SRN layer; and

a metal gate of the memory device formed above the STI structure.

25. The semiconductor structure of claim 24 , further comprising:

the metal gate formed wider than opposite walls of the trench; and

an extension layer of the Al 2 O 3 dielectric layer of the trench formed between the STI structure and the metal gate formed wider than the opposite walls of the trench.

26. The semiconductor structure of claim 24 , further comprising a tantalum nitride (TaN) layer formed between the metal gate and opposite walls of the trench having the IN-SRN layer formed on the Al 2 O 3 dielectric layer.

27. The semiconductor structure of claim 26 , further comprising a high dielectric constant (k) dielectric layer formed between the TaN layer and the opposite walls of the trench having the IN-SRN layer formed thereon and across a channel for the memory device between the opposite walls.

28. The semiconductor structure of claim 27 , further comprising another IN-SRN layer formed between the TaN layer and the high k dielectric layer.

29. The semiconductor structure of claim 24 , further comprising:

a floating gate of the memory device formed under a high dielectric constant (k) dielectric layer and between opposite walls of the trench having the IN-SRN layer formed thereon and across a channel for the memory device between the opposite walls; and

a tunnel layer formed under the floating gate and between the opposite walls of the trench having the IN-SRN layer formed thereon, wherein the tunnel layer is formed between the floating gate and the polysilicon substrate.

30. The semiconductor structure of claim 26 , further comprising a high dielectric constant (k) dielectric layer formed under the TaN layer and between the opposite walls of a portion of the trench not having the IN-SRN layer formed thereon and across a channel for the memory device between the opposite walls.

31. The semiconductor structure of claim 30 , further comprising:

a floating plate formed from an injector silicon-rich nitride, wherein the floating plate is formed under the high k dielectric layer and between opposite walls of the portion of the trench not having the IN-SRN layer formed thereon; and

a tunnel layer formed under the floating plate and between the opposite walls of a portion of the trench having the IN-SRN layer formed thereon, wherein the tunnel layer is formed between the floating plate and the polysilicon substrate.