IP Library › Granted Patent US 10,127,956
Granted Patent B2
US 10,127,956 · App. 15/655,212 · Granted Nov 13, 2018

Spin orbit torque magnetic memory device

Inventors: Kyung Jin Lee (Seoul, KR); Hyun Woo Lee (Gyeongsangbuk-do, KR); Byong Guk Park (Daejeon, KR)
Assignee: Korea University Research and Business Foundation
G11C11/02G11C11/1675G11C11/18H01L43/02H01L43/08H01L43/10
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Quick Facts
Patent No.
US 10,127,956
App. No.
15/655,212
Granted
Nov 13, 2018
Kind
B2
Abstract

A magnetic memory device may include tunnel junction unit cells, each including a pinned magnetic layer, an insulating layer, and a free magnetic layer which are sequentially stacked, a conductive line structure configured to supply an in-plane current to the unit cells and to include an antiferromagnetic layer, which is provided adjacent to the free magnetic layer, and a ferromagnetic layer, which is provided adjacent to the antiferromagnetic layer and has an in-plane magnetic anisotropy, and a voltage applying unit configured to independently apply a selection voltage to each of the tunnel junction unit cells. Each of the tunnel junction unit cells may have a magnetization direction that is selectively changed by the in-plane current and the selection voltage.

Claims (14)

1. A magnetic memory device, comprising:

tunnel junction unit cells, each including a pinned magnetic layer, an insulating layer, and a free magnetic layer which are sequentially stacked;

a conductive line structure configured to supply an in-plane current and connected to the unit cells, the conductive line structure comprising an antiferromagnetic layer, which is provided adjacent to the free magnetic layer, and a ferromagnetic layer, which is provided adjacent to the antiferromagnetic layer and has an in-plane magnetic anisotropy; and

a voltage applying unit configured to independently apply a selection voltage to each of the tunnel junction unit cells, wherein each of the tunnel junction unit cells has a magnetization direction that is selectively changed by the in-plane current and the selection voltage;

wherein the in-plane current flows through both the antiferromagnetic layer of the conductive line structure and the ferromagnetic layer of conductive line structure;

wherein the antiferromagnetic layer of the conductive line structure and the ferromagnetic layer of conductive line structure are elongated to the conductive line structure; and

wherein the conductive line structure is configured to induce a horizontal exchange bias field in the free magnetic layer, and the in-plane current flowing through the conductive line structure produces a spin-orbit spin torque.

2. The magnetic memory device of claim 1 , wherein the pinned magnetic layer and the free magnetic layer are formed of at least one ferromagnetic materials selected from a group consisting of Fe, Co, Ni, B, Si, Zr, Pt, Tb, Pd, Cu, and W.

3. The magnetic memory device of claim 1 , wherein the insulating layer is formed of a material selected from AlOx, MgO, TaOx, ZrOx, and mixtures thereof.

4. The magnetic memory device of claim 1 , wherein each of the antiferromagnetic and ferromagnetic layers included in the conductive line structure is formed of at least one of metallic materials selected from a group consisting of Co, Fe, Ni, Cu, Ta, Pt, W, Hf, Ir, Rh, Pd, Gd, Bi, Ir, and Mn.

5. The magnetic memory device of claim 1 , wherein the antiferromagnetic layer is formed of a material having a ferrimagnetic property and is provided to be in surface contact with the free magnetic layer.

6. The magnetic memory device of claim 1 , wherein the free magnetic layer has perpendicular magnetic anisotropy (PMA).

7. The magnetic memory device of claim 1 , wherein the antiferromagnetic layer and the ferromagnetic layer are provided to be in surface contact with each other.

8. The magnetic memory device of claim 1 , wherein the ferromagnetic layer is configured to induce a horizontal exchange bias in the antiferromagnetic layer, through a thermal annealing process under a horizontal magnetic field.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 22, 2019
From: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 049818/0938 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 29, 2017
From: LEE, KYUNG JIN; LEE, HYUN WOO; PARK, BYONG GUK
To: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
Reel/Frame 043431/0653 →
Priority Claims (1)
KR 10 2015 0066853 · May 13, 2015 · national
Continuity (2)
Continuation PCTKR2016004964 · May 12, 2016
Related Publication 20170316813A1 · Nov 2, 2017
Cited By (4)
US 12,334,238 US 12,439,828 US 12,482,506 US 12,514,135