Illumination source for an inspection apparatus, inspection apparatus and inspection method
Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
1. An inspection apparatus for measuring a target structure on a substrate, comprising:
an illumination source configured to generate measurement radiation;
one or more optical elements configured to focus the measurement radiation onto the target structure, the one or more optical elements comprising at least one optical element configured to receive the measurement radiation at a grazing incidence; and
a compensatory optical device configured to spatially modulate a wavefront of the measurement radiation to compensate for a non-uniform manufacturing defect in the one or more optical elements,
wherein the illumination source is a high harmonic generation source comprising a high harmonic generation medium and a pump radiation source that emits pump radiation for exciting the high harmonic generation medium, and
wherein the compensatory optical device is configured to spatially modulate a wavefront of the pump radiation prior to it exciting the high harmonic generation medium, such that the spatial modulation of the wavefront of the pump radiation causes the spatial modulation of the wavefront of the measurement radiation.
2. The inspection apparatus of claim 1 , wherein the non-uniform manufacturing defect in the one or more optical elements comprises a slope error due to manufacturing imperfections of at least one of the one or more optical elements.
3. The inspection apparatus of claim 1 , wherein the compensatory optical device comprises a spatial light modulation device.
4. The inspection apparatus of claim 3 , wherein the spatial light modulation device comprises one of a deformable mirror, a digital micromirror device, or a microelectromechanical system.
5. The inspection apparatus of claim 1 , comprising a measuring device at the substrate location configured to measure a size of a measurement spot resultant from the focusing of the measurement radiation.
6. The inspection apparatus of claim 5 , configured to perform an initial calibration step to configure the compensatory optical device to minimize the size of the measurement spot.
7. The inspection apparatus of claim 1 , wherein the measurement radiation comprises soft X-ray or Extreme Ultraviolet radiation.
8. The inspection apparatus of claim 1 , wherein the compensatory optical device is located in a beam of the measurement radiation, so as to directly spatially modulate the wavefront of the beam of the measurement radiation.
9. The inspection apparatus of claim 8 , wherein the compensatory optical device is located in a parallel propagating portion of the beam of measurement radiation, between the illumination source and the substrate.
10. The inspection apparatus of claim 9 , wherein the compensatory optical device is located in a pupil plane of the inspection apparatus.
11. The inspection apparatus of claim 1 , wherein all of the pump radiation is spatially modulated by the compensatory optical device.
12. A method of measuring a target structure on a substrate comprising:
spatially modulating a wavefront of measurement radiation to compensate for a non-uniform manufacturing defect in one or more optical elements;
focusing the measurement radiation onto the target structure using the one or more optical elements such that at least one optical element receives the measurement radiation at a grazing incidence, thereby illuminating the target structure with the measurement radiation;
detecting scattered radiation resulting from illumination of the target with the measurement radiation;
processing the detected scattered radiation to determine a measurement value relating to the target structure; and
obtaining a performance parameter of a lithographic process used to form the target structure based on the measurement value,
wherein spatially modulating the wavefront of the measurement radiation comprises spatially modulating a wavefront of pump radiation prior to exciting a high harmonic generation medium, such that the spatial modulation of the wavefront of the pump radiation causes the spatial modulation of the wavefront of the measurement radiation.