Method of forming fin-shaped structure having ladder-shaped cross-sectional profile
A fin-shaped structure includes a substrate having a first fin-shaped structure located in a first area and a second fin-shaped structure located in a second area, wherein the second fin-shaped structure includes a ladder-shaped cross-sectional profile part. The present invention also provides two methods of forming this fin-shaped structure. In one case, a substrate having a first fin-shaped structure and a second fin-shaped structure is provided. A treatment process is performed to modify an external surface of the top of the second fin-shaped structure, thereby forming a modified part. A removing process is performed to remove the modified part through a high removing selectivity to the first fin-shaped structure and the second fin-shaped structure, and the modified part, thereby the second fin-shaped structure having a ladder-shaped cross-sectional profile part is formed.
1. A method of forming a fin-shaped structure, comprising:
providing a substrate having a first fin-shaped structure located in a first area and a second fin-shaped structure located in a second area;
filling an isolation structure beside the first fin-shaped structure of the first area and beside the second fin-shaped structure of the second area respectively;
forming a patterned mask covering the first area but exposing the second area;
removing a top part of the isolation structure of the second area, thereby exposing a first top part of the second fin-shaped structure;
performing a treatment process to modify an external surface of the first top part of the second fin-shaped structure, thereby forming a modified part only covering the first top part of the second fin-shaped structure;
removing the patterned mask; and
performing a removing process to remove a part of the isolation structure and the modified part by a high removing selectivity to the first fin-shaped structure and the second fin-shaped structure, and the modified part and the isolation structure, thereby exposing a top part of the first fin-shaped structure and a second top part of the second fin-shaped structure, wherein a height of the first top part and the second top part of the second fin-shaped structure protruding from the isolation structure is larger than a height of the top part of the first fin-shaped structure protruding from the isolation structure.
2. The method of forming a fin-shaped structure according to claim 1 , wherein the isolation structure comprises oxide and the modified part comprises oxide.
3. The method of forming a fin-shaped structure according to claim 1 , wherein the treatment process comprises an oxidation process.
4. The method of forming a fin-shaped structure according to claim 3 , wherein the treatment process comprises an oxygen gas-containing process or an in-situ steam generated (ISSG) process.
5. The method of forming a fin-shaped structure according to claim 1 , wherein the removing process comprises an ammonia and nitrogen trifluoride containing etching process.