Ferroelectric memory and methods of forming the same

1. A memory cell, comprising:

a buried recessed access device (BRAD) formed in a substrate, wherein a gate of the BRAD is formed between a first source/drain region and a second source/drain region corresponding to the BRAD, and wherein the gate is formed below an upper surface of at least one of the first and the second source/drain region;

a ferroelectric capacitor formed on the BRAD, wherein a bottom electrode of the ferroelectric capacitor is coupled to the first source/drain region, and wherein a top electrode of the ferroelectric capacitor is coupled to the second source/drain region; and

a conductive contact coupled to the top electrode and to the second source/drain region, wherein the conductive contact is not positioned in alignment with the ferroelectric capacitor and an adjacent ferroelectric capacitor of an adjacent memory cell of a same row of memory cells and wherein the conductive contact is formed at least partially on the second source/drain region and at least partially on a dielectric material formed in a substrate corresponding to an isolation region between the same row of memory cells and an adjacent row.

2. The memory cell of claim 1 , wherein the memory cell achieves a 4F 2 architecture with F being a feature size corresponding to the memory cell.

3. The memory cell of claim 1 , wherein the ferroelectric capacitor is a container capacitor having a ferroelectric material formed therein.

4. The memory cell of claim 3 , wherein the ferroelectric material is formed on sidewalls of an electrode material in a container of the container capacitor.

5. The memory cell of claim 1 , wherein the ferroelectric capacitor is on pitch with the BRAD.

6. A ferroelectric random access memory (FeRAM), comprising:

a first plurality of ferroelectric capacitors coupled in series between a first conductive line and a second conductive line; and

a second plurality of ferroelectric capacitors coupled in series between the first conductive line and a third conductive line;

wherein each of the first and second plurality of ferroelectric capacitors are coupled to a respective buried recessed access device (BRAD) having a gate electrode formed beneath the corresponding ferroelectric capacitor;

wherein each of the first plurality of ferroelectric capacitors are formed in a container and include:

a bottom electrode formed on sidewalls of the container and on a bottom electrode contact;

a ferroelectric material formed in the container and on sidewalls of the bottom electrode;

a top electrode formed in the container and on sidewalls of the ferroelectric material, the top electrode coupled to a source/drain region of the corresponding BRAD via a conductive pillar, wherein a distance from the conductive pillar to a first side of a ferroelectric capacitor of the first plurality is different than a distance from the conductive pillar to a second side of the ferroelectric capacitor of the first plurality; and

wherein the conductive pillar is not positioned in alignment with the first plurality and second plurality of ferroelectric capacitors of a same row of ferroelectric capacitors and wherein at least a portion of the conductive pillar is formed at least partially on an isolation region formed in a substrate separating BRADs corresponding to the first plurality of ferroelectric capacitors and BRADs corresponding to the second plurality of ferroelectric capacitors.

7. The FeRAM of claim 6 , wherein the first side faces the second plurality of ferroelectric capacitors and the second side opposes the second plurality of ferroelectric capacitors.

8. The FeRAM of claim 6 , wherein the conductive pillar is located between the first plurality of ferroelectric capacitors and the second plurality of ferroelectric capacitors.

9. The FeRAM of claim 6 , wherein the first conductive line is a plate line, the second conductive line is a bit line, and the third conductive line is a different bit line.

10. The FeRAM of claim 6 , wherein at least one of the first plurality of ferroelectric capacitors comprises a ferroelectric storage material selected from the group including:

lead zirconate titanate (PZT); and

strontium bismuth tantalate (SBT);

a hafnium oxide based material; and

a zirconium oxide based material.

11. The FeRAM of claim 10 , wherein the hafnium oxide based material and the zirconium oxide based material are doped with at least one of: silicon (Si), aluminum (Al), germanium (Ge), magnesium (Mg), calcium (Ca), strontium (Sr), niobium (Nb), yttrium (Y), barium (Ba), titanium (Ti), and/or a combination thereof.

12. The FeRAM of claim 6 , further comprising:

a first select device configured to selectively couple the first plurality of ferroelectric capacitors to the first conductive line; and

a second select device configured to selectively couple the second plurality of ferroelectric capacitors to the first conductive line.