Magnetic material sputtering target and manufacturing method thereof
Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object is to provide a magnetic material target, in particular, a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.
1. A method of producing a magnetic material sintered sputtering target containing a dispersion of nonmagnetic oxide particles, comprising the steps of:
depositing an oxide-containing magnetic material on a substrate by Physical Vapor Deposition (PVD) or Chemical Vapor Deposition (CVD) using a magnetic material and an oxide material as source raw materials,
separating a deposit of the oxide containing magnetic material from the substrate,
pulverizing the separated deposit of the oxide-containing magnetic material to obtain a powder thereof as a raw material for the sputtering target, and
sintering the powder to form a sintered body of the oxide-containing magnetic material which is further machined and finished to form the sputtering target.
2. A method according to claim 1 , further comprising the step of mixing the powder with added components to produce a mixture before said sintering step, wherein said step of sintering the powder includes sintering the mixture.
3. A method of producing a magnetic material sintered sputtering target containing a dispersion of nonmagnetic oxide particles, comprising the steps of:
depositing an oxide-containing magnetic material on a substrate by Physical Vapor Deposition (PVD) or Chemical Vapor Deposition (CVD) using a magnetic material and an oxide material as source raw materials,
separating a sheet of the oxide containing magnetic material from the substrate, and
sintering the separated sheet of the deposit of the oxide-containing magnetic material to form a sintered body which is further machined and finished to form the sputtering target.
4. The method according to claim 3 , wherein the depositing and separating steps are repeated to obtain a plurality of deposited and separated sheets which are laminated and subjected to the sintering step.
5. The method according to claim 4 , wherein the sintering step includes hot pressing (HP) and hot isostatic pressing (HIP).
6. The method according to claim 3 , wherein the sintering step includes hot isostatic pressing (HIP).
7. The method according to claim 3 , wherein the sintering step includes hot pressing (HP) and hot isostatic pressing (HIP).
8. The method according to claim 3 , wherein the nonmagnetic oxide particles dispersed within the sputtering target have an average diameter of 400 nm or less and a shape characterized in an aspect ratio of 2 or less.
9. The method according to claim 1 , wherein the sintering step includes hot pressing (HP) and hot isostatic pressing (HIP).
10. The method according to claim 1 , wherein the nonmagnetic oxide particles dispersed within the sputtering target have an average diameter of 400 nm or less and a shape characterized in an aspect ratio of 2 or less.