Substrate transfer chamber, substrate processing system, and method for replacing gas in substrate transfer chamber
A compartment variable device is provided with: a baffle plate which has a plurality of openings and which as a whole has a rectangular shape; a rectangular frame disposed around the baffle plate; a bellows connected to a bottom of the frame; and a bellows support portion to which the lower end of the bellows is fixed. When a transfer arm of an atmosphere-side transfer device is lifted, the frame of the compartment variable device which is engaged with the transfer arm is lifted, thereby extending the bellows. Accordingly, the volume of a gas flow space in an atmospheric pressure transfer chamber is decreased, allowing the atmosphere in the gas flow space in the atmospheric pressure transfer chamber to be replaced in a short time.
1. A substrate transfer chamber, comprising:
a transfer unit configured to transfer a substrate;
a gas supply unit configured to supply a gas into the substrate transfer chamber;
a gas exhaust unit configured to exhaust a gas in the substrate transfer chamber; and
a compartment variable device configured to vary compartment of a gas flow space in the substrate transfer chamber in cooperation with the transfer unit,
wherein the compartment variable device is connected to the transfer unit and configured to be moved by a movement of the transfer unit, and
wherein the compartment variable device varies the compartment of the gas flow space in the substrate transfer chamber by the movement of the transfer unit.
2. The substrate transfer chamber of claim 1 , wherein the transfer unit is vertically movable, and
the compartment variable device varies the compartment of the gas flow space in the substrate transfer chamber by the vertical movement of the transfer unit.
3. The substrate transfer chamber of claim 2 , wherein the compartment variable device includes:
a movable member which is movable vertically in the substrate transfer chamber; and
an extensible and contractible member which is extended and contracted by a movement of the movable member.
4. The substrate transfer chamber of claim 3 , wherein the movable member is a rectifying plate having a plurality of openings and configured to rectify gas flow.
5. The substrate transfer chamber of claim 2 , wherein a connecting mechanism for connecting the compartment variable device and the transfer unit is provided at one or both of the compartment variable device and the transfer unit.
6. The substrate transfer chamber of claim 5 , wherein the connecting mechanism is a mechanical mechanism.
7. The substrate transfer chamber of claim 5 , wherein the connecting mechanism is a suction mechanism.
8. The substrate transfer chamber of claim 5 , wherein the connecting mechanism is an electrical attracting mechanism.
9. A substrate processing system, comprising:
a mounting unit configured to mount a transfer container accommodating a plurality of substrates;
a processing unit configured to perform predetermined processing on the substrates; and
a substrate transfer chamber provided between the mounting unit and the processing unit,
wherein the substrate transfer chamber includes:
a transfer unit configured to transfer the substrates between the transfer container mounted on the mounting unit and the processing unit;
a gas supply unit configured to supply a gas into the substrate transfer chamber;
a gas exhaust unit configured to exhaust a gas in the substrate transfer chamber; and
a compartment variable device configured to vary compartment of a gas flow space in the substrate transfer chamber in cooperation with the transfer unit,
wherein the compartment variable device is connected to the transfer unit and configured to be moved by a movement of the transfer unit, and
wherein the compartment variable device varies the compartment of the gas flow space in the substrate transfer chamber by the movement of the transfer unit.
10. A method for replacing a gas in a substrate transfer chamber for transferring a substrate, the substrate transfer chamber including a transfer unit configured to transfer the substrate, a gas supply unit configured to supply a gas into the substrate transfer chamber, a gas exhaust unit configured to exhaust a gas in the substrate transfer chamber, and a compartment variable device configured to vary compartment of a gas flow space in the substrate transfer chamber in cooperation with the transfer unit, wherein the compartment variable device is connected to the transfer unit and configured to be moved by a movement of the transfer unit, and wherein the compartment variable device varies the compartment of the gas flow space in the substrate transfer chamber by the movement of the transfer unit, the method comprising:
a first step of decreasing a volume of the gas flow space by the compartment variable device in a first exhaust state in which a large amount of gas is exhausted through the gas exhaust unit; and
a second step of increasing a volume of the gas flow space by the compartment variable device in a second exhaust state in which a relatively small amount of gas is exhausted through the gas exhaust unit.
11. The method of claim 10 , wherein the first step is performed in a first supply state in which a small amount of gas is supplied from the gas supply unit, and the second step is performed in a second supply state in which a relatively large amount of gas is supplied from the gas supply unit.
12. The method of claim 10 , wherein the transfer unit is vertically movable, and
the compartment variable device is configured to vary the compartment of the gas flow space in the substrate transfer chamber by the vertical movement of the transfer unit to decrease the volume of the gas flow space in a state where the transfer unit is lifted and increase the volume of the gas flow space in a state where the transfer unit is lowered.