IP Library Granted Patent US 10,804,084
Granted Patent B2
US 10,804,084 · App. 15/760,498 · Granted Oct 13, 2020

Vacuum apparatus

Inventors: Souichi Katagiri (Tokyo, JP); Keigo Kasuya (Tokyo, JP)
Assignee: HITACHI HIGH-TECH CORPORATION
H01J41/20F04B37/02H01J37/073H01J37/28H01J41/16H01J2237/1825H01J2237/28
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Quick Facts
Patent No.
US 10,804,084
App. No.
15/760,498
Granted
Oct 13, 2020
Kind
B2
Abstract

In a vacuum apparatus including an ultrahigh vacuum evacuation pump, the ultrahigh vacuum evacuation pump is provided with a rod-shaped cathode including a non-evaporable getter alloy, a cylindrical anode disposed so as to surround the cathode, and a coil or a ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode. As a result, it is possible to reduce the size and weight of the ultrahigh vacuum evacuation pump and to dispose the vacuum evacuation pump at a desired location in the vacuum apparatus.

Claims (45)

1. A vacuum apparatus, comprising at least one ultrahigh vacuum evacuation pump,

wherein the ultrahigh vacuum evacuation pump comprises:

a rod-shaped cathode including a non-evaporable getter alloy;

a cylindrical anode disposed so as to surround the cathode; and

a coil or ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode, wherein

an ionization vacuum gauge is disposed in the vicinity of the ultrahigh vacuum evacuation pump, and

the ionization vacuum gauge is an electron source for the ultrahigh vacuum evacuation pump.

2. The vacuum apparatus according to claim 1 , wherein

a second electron source is disposed between the rod-shaped cathode and the cylindrical anode.

3. The vacuum apparatus according to claim 2 , wherein

the second electron source is a cold cathode type electron source, and

the vacuum apparatus further comprises a unit for heating the electron source to clean a surface of the second electron source.

4. The vacuum apparatus according to claim 2 , wherein

the second electron source is a thermionic electron source.

5. The vacuum apparatus according to claim 2 , wherein

the rod-shaped cathode has a structure in which the nonevaporable getter alloy is formed on a metal sheet and folded into a bellows, and

a protrusion formed at the tip of a film of the nonevaporable getter alloy folded on the anode side serves as a third electron source.

6. The vacuum apparatus according to claim 1 , wherein

the coil disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode is a Helmholtz coil.

7. The vacuum apparatus according to claim 1 , wherein

the vacuum apparatus is a charged particle beam apparatus, and

the ultrahigh vacuum evacuation pump evacuates a region where a charged particle source of the charged particle beam apparatus is disposed.

8. The vacuum apparatus according to claim 7 , wherein

the charged particle source is a field emission cold cathode charged particle source.

9. A vacuum apparatus, comprising at least one ultrahigh vacuum evacuation pump,

wherein the ultrahigh vacuum evacuation pump comprises:

a rod-shaped cathode including a non-evaporable getter alloy;

a cylindrical anode disposed so as to surround the cathode;

a coil or ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode; and

an electron source is disposed between the rod-shaped cathode and the cylindrical anode.

10. The vacuum apparatus according to claim 9 , wherein

the electron source is a cold cathode type electron source, and

the vacuum apparatus further comprises a unit for heating the electron source to clean a surface of the electron source.

11. The vacuum apparatus according to claim 9 , wherein

the electron source is a thermionic electron source.

12. The vacuum apparatus according to claim 9 , wherein

the rod-shaped cathode has a structure in which the nonevaporable getter alloy is formed on a metal sheet and folded into a bellows, and

a protrusion formed at the tip of a film of the nonevaporable getter alloy folded on the anode side serves as an electron source.

13. The vacuum apparatus according to claim 9 , wherein

the coil disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode is a Helmholtz coil.

14. The vacuum apparatus according to claim 9 , wherein

the vacuum apparatus is a charged particle beam apparatus, and

the ultrahigh vacuum evacuation pump evacuates a region where a charged particle source of the charged particle beam apparatus is disposed.

15. The vacuum apparatus according to claim 14 , wherein

the charged particle source is a field emission cold cathode charged particle source.

Assignments (2)
CHANGE OF NAME Recorded May 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052662/0726 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 3, 2018
From: KATAGIRI, SOUICHI; KASUYA, KEIGO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 045705/0038 →
Continuity (1)
Related Publication 20180254173A1 · Sep 6, 2018