Polishing composition
A polishing composition capable of suppressing surface defects and reducing haze is provided. The polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; a polyalcohol; and an alkali compound. Preferably, the polishing composition further includes a non-ionic surfactant.
1. A polishing composition comprising:
abrasives;
at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit expressed by Formula (1) provided below;
a polyalcohol; and
an alkali compound,
In the formula, each of R 1 , R 2 and R 3 independently indicates a hydrogen atom or an organic group; X indicates a single bond or a joining chain;
each of R 4 , R 5 and R 6 independently indicates a hydrogen atom or an organic group; and
each of R 7 and R 8 independently indicates a hydrogen atom, and
wherein the polyalcohol includes polyoxyethylene methyl glucoside and polyoxypropylene methyl glucoside.
2. The polishing composition according to claim 1 , further comprising: a non-ionic surfactant.
3. The polishing composition according to claim 1 , wherein the polyalcohol includes two or more types.
4. The polishing composition according to claim 1 , wherein the polyalcohol is an alkylene oxide derivative of methylglucoside.
5. The polishing composition according to claim 3 , wherein the polyalcohol is an alkylene oxide derivative of methylglucoside.
6. The polishing composition according to claim 2 , wherein the non-ionic surfactant is a diamine compound including an alkylenediamine structure with two nitrogen atoms expressed by General Formula (2) provided below and having at least one block polyether bonded to the two nitrogen atoms of the alkylenediamine structure, where the block polyether is made of an oxyethylene group and an oxypropylene group bonded together,
where n indicates an integer equal to or larger than 1.