Polyarylene resins

1. A cyclopentadienone compound of formula (1)

wherein each R 1 is independently chosen from H, C 1-20 -alkyl, optionally substituted C 5-30 -aryl; each R 2 is independently chosen from H, C 1-20 -alkyl, optionally substituted C 5-30 -aryl, and (PG-L) t -Ar 1 —; each PG is —C(═O)OR 5 ; R 5 is H; each Ar 1 is independently optionally substituted C 5-30 -aryl; L is a single chemical bond; and L 1 is chosen from —O—, —C 1-30 -ketoalkyl-, —C 1-30 -ketoalkyl-C 6-30 -aryl, —C 6 H 4 —, —C 10 H 6 —, —C 6 H 4 —C 6 H 4 —, —C 6 H 4 —O—C 6 H 4 —, —C 6 H 4 —O—C 6 H 4 —O—C 6 H 4 —, and groups of formula (1a); a is an integer from 0 to 3; t is an integer from 1 to 4; and w=1; provided that when a=0, L 1 has the formula (1a)

wherein Ar 2 is a C 5-30 -aryl; each R 3 is independently chosen from H, C 1-20 -alkyl, optionally substituted C 5-30 -aryl, and (PG-L) t -Ar 1 —; each of L 2 , L 3 and L 4 is chosen from a single chemical bond, —O—, —C 1-30 -alkyl-, —C 1-30 -ketoalkyl-, —C 1-30 -ketoalkyl-C 6-30 -aryl-, —C 6-30 -aryl-, —C 6-30 -aryl-O—C 6-30 -aryl-, —C 6-30 -aryl-O—C 6-30 -aryl-O—C 6-30 -aryl-, and combinations of the foregoing; t1 is an integer from 1 to 4; b is 0 or 1; and L 2 , L 3 and L 4 may be the same or different.

2. The cyclopentadienone compound of claim 1 wherein each Ar 1 and Ar 2 is independently chosen from pyridyl, phenyl, naphthyl, acenaphthyl, fluorenyl, carbazolyl, anthracenyl, phenanthryl, pyrenyl, coronenyl, tetracenyl, pentacenyl, tetraphenyl, benzotetracenyl, triphenylenyl, perylenyl, tolyl, xylyl, dibenzothiophenyl, thioxanthonyl, indolyl, and acridinyl.

3. A polyarylene resin comprising as polymerized units one or more first cyclopentadienone monomers of claim 1 , and one or more polyalkynyl-substituted second monomers.

4. The polyarylene resin of claim 3 wherein at least one polyalkynyl-substituted second monomer has the formula (2)

wherein each Ar 3 and Ar 4 is independently a C 5-30 aryl moiety; each R 11 is independently chosen from H, optionally substituted C 5-30 -aryl, and (PG-L 5 ) t2 -Ar 5 —; each R 12 is independently chosen from H, optionally substituted C 5-30 aryl, and -L 5 -PG; PG is a polar moiety; each Ar 5 is independently an optionally substituted C 5-30 -aryl; each L 5 is a single chemical bond or a divalent linking group; each Y is independently a single chemical bond or a divalent linking group chosen from —O—, —S—, —S(═O)—, —S(═O) 2 —, —C(═O)—, —(C(R 13 ) 2 ) z —, C 6-30 -aryl, and —(C(R 13 ) 2 ) z1 —(C 6-30 -aryl)-(C(R 13 ) 2 ) z2 —; each R 13 is independently chosen from H, hydroxy, halo, C 1-10 -alkyl, C 1-10 -haloalkyl, and optionally substituted C 6-30 -aryl; t2=1 to 4; b1=1 to 4; each b2=0 to 2; b1+ each b2=2 to 6; c=0 to 4; each c1=3 to 5; d=0 to 2; z=1 to 10; b1+c+d=6; z1=0 to 10; z2=0 to 10; and z1+z2=1 to 10.

5. The polyarylene resin of claim 4 wherein b1=2 or 3 and d=0.

6. The polyarylene resin of claim 4 wherein R 12 is H, or C 6-10-aryl .

7. A polyarylene resin composition comprising the polyarylene resin of claim 3 and one or more organic solvents.

8. A method of manufacturing an electronic device comprising providing a substrate; coating a layer of the polyarylene resin composition of claim 7 on a surface of the substrate; removing any organic solvent; and curing the polyarylene resin to form a dielectric material layer.

9. A method of forming a patterned layer comprising: (a) coating on a substrate a layer of a polyarylene resin composition of claim 7 ; (b) removing organic solvent to form a polyarylene resin layer; (c) coating a layer of a photoresist on the polyarylene resin layer; (d) exposing the photoresist layer to actinic radiation through a mask; (e) developing the exposed photoresist layer to form a resist pattern; and (f) transferring the pattern to the polyarylene resin layer to expose portions of the substrate.

10. The method of claim 9 wherein at least one polyalkynyl-substituted second monomer has the formula (2)

wherein each Ar 3 and Ar 4 is independently a C 5-30 aryl moiety; each R 11 is independently chosen from H, optionally substituted C 5-30 -aryl, and (PG-L 5 ) t2 -Ar 5 —; each R 2 is independently chosen from H, optionally substituted C 5-30 aryl, and -L 5 -PG; PG is a polar moiety; each Ar 5 is independently an optionally substituted C 5-30 -aryl; each L 5 is a single chemical bond or a divalent linking group; each Y is independently a single chemical bond or a divalent linking group chosen from —O—, —S—, —S(═O)—, —S(═O) 2 —, —C(═O)—, —(C(R 13 ) 2 ) z —, C 6-30 -aryl, and —(C(R 13 ) 2 ) z1 —(C 6-30 -aryl)-(C(R 13 ) 2 ) z2 —; each R 13 is independently chosen from H, hydroxy, halo, C 1-10 -alkyl, C 1-10 -haloalkyl, and optionally substituted C 6-30 -aryl; t2=1 to 4; b1=1 to 4; each b2=0 to 2; b1+ each b2=2 to 6; c=0 to 4; each c1=3 to 5; d=0 to 2; z=1 to 10; b1+c+d=6; z1=0 to 10; z2=0 to 10; and z1+z2=1 to 10.