Cleaning compositions for removing post etch residue
The disclosure relates to a cleaning composition that aids in the removal of post-etch residues in the production of semiconductors. There is provided a stock composition comprising: a tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base; a corrosion inhibitor; and a combination of at least two or more polyprotic acids or salts thereof, wherein at least one said polyprotic acid or salt thereof contains phosphorous.
1. A stock composition comprising:
a tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base;
a corrosion inhibitor; and
a combination of at least two or more polyprotic acids or salts thereof, wherein at least one said polyprotic acid or salt thereof contains phosphorous,
wherein the stock composition has a pH of greater than 10.
2. The composition of claim 1 , wherein said combination of at least two or more polyprotic acids or salts thereof comprises phosphoric acid, a phosphonic acid, or a salt thereof.
3. The composition of claim 1 , wherein said combination of at least two or more polyprotic acids or salts thereof comprises phosphoric acid, a diphosphonic acid or a combination thereof.
4. The composition of claim 1 , wherein said combination of at least two or more polyprotic acids or salts thereof comprises a polycarboxylic acid or salt thereof.
5. The composition of claim 4 , wherein the polycarboxylic acid or salt thereof comprises one or more of oxalic and an alkyldiaminetetraacetic acid.
6. The composition of claim 1 comprising an oxidizer comprising a heterocyclic amine N-oxide.
7. The composition of claim 6 , wherein the tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base and oxidizer comprising heterocyclic amine N-oxide together make up between 10 wt % and 35 wt % of the composition.
8. The composition of claim 6 , wherein the heterocyclic amine N-oxide is present in an amount of from 5 wt % to 15 wt %.
9. The composition of claim 6 , wherein the heterocyclic amine N-oxide comprises 4-ethylmorpholine-N-oxide, N-methyl piperidine-N-oxide, 3-methylpyridine N-oxide, NMMO, or a combination thereof.
10. The composition of claim 1 , wherein the amount of tetraalkylammonium hydroxide base or quaternary trialkylalkanolamine base in the composition is between 5 wt % and 20 wt %.
11. The composition of claim 1 , wherein the tetraalkylammonium hydroxide base has a formula [NR 1 R 2 R 3 R 4 ]OH, wherein R 1 , R 2 , R 3 and R 4 are the same as or different from one another and are selected from the group consisting of H, and C 1 -C 6 alkyls and the quaternary trialkylalkanolamine has a formula [R 1 R 2 R 3 NR 4 OH] + [OH] − , wherein R 1 , R 2 , R 3 , and R 4 is each a lower alkyl group such as methyl, ethyl, or propyl.
12. The composition of claim 1 , wherein the corrosion inhibitor comprises 5-methylbenzotriazole, tolyltriazole, benzotriazole, dimethylbenzotriazole, or a combination thereof.
13. The composition of claim 12 , wherein the amount of corrosion inhibitor is between 0.1 wt % to 5 wt %.
14. The composition of claim 1 , comprising an organic solvent.
15. The composition of claim 14 , wherein the solvent comprises a glycol ether and the amount of said solvent in the composition is in the range of from 10 wt % to 30 wt %.
16. The composition of claim 1 , comprising a balancing amount of water.
17. A diluted composition comprising one part by weight of claim 1 diluted with between 3 parts and 12 parts of a diluting oxidizer.
18. The diluted composition of claim 17 , wherein the diluting oxidizer comprises 30 wt % hydrogen peroxide.
19. A method of removing post-etch residue and/or titanium-containing hardmask material from a microelectronic device, the method comprising contacting a composition according to claim 1 with the device, the device optionally comprising titanium-containing hardmask material and one or more of AlN, Cu, and Co.