IP Library › Granted Patent US 10,616,992
Granted Patent B2
US 10,616,992 · App. 15/849,624 · Granted Apr 7, 2020

Circuit board and method for manufacturing the same

Inventors: Yin-Ju Chen (Taoyuan, TW); Ming-Hao Wu (Taoyuan, TW); Cheng-Po Yu (Taoyuan, TW)
Assignee: UNIMICRON TECHNOLOGY CORP.
H05K1/0203G06F1/206H01L23/12H01L23/13H01L23/4275H01L23/49827H01L35/30H05K1/0206H05K1/113H05K1/181H05K1/185H05K1/187H05K3/4647H05K3/4697H01L2224/16225H01L2224/16227H01L2224/16235H01L2924/15153H01L2924/15313H05K2201/048H05K2201/10219H05K2201/10378H05K2201/10515H05K2201/10734
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,616,992
App. No.
15/849,624
Granted
Apr 7, 2020
Kind
B2
Abstract

A circuit board with a heat-recovery function includes a substrate, a heat-storing device, and a thermoelectric device. The heat-storing device is embedded in the substrate and connected to a processor for performing heat exchange with the processor. The thermoelectric device embedded in the substrate includes a first metal-junction surface and a second metal-junction surface. The first metal-junction surface is connected to the heat-storing device for performing heat exchange with the heat-storing device. The second metal-junction surface is joined with the first metal-junction surface, in which the thermoelectric device generates an electric potential by a temperature difference between the first metal-junction surface and the second metal-junction surface.

Claims (16)

1. A method for manufacturing a circuit board, comprising:

forming a first opening in a first buildup-dielectric layer and disposing a heat-storing device into the first opening for embedding the heat-storing device in the first buildup-dielectric layer;

disposing a first pattern-metal layer on the first buildup-dielectric layer and the heat-storing device;

disposing a second buildup-dielectric layer on the first buildup-dielectric layer and the first pattern-metal layer, wherein the second buildup-dielectric layer comprises a second opening communicating to the first opening;

disposing an interposer board on the heat-storing device and in the second opening, and disposing a second pattern-metal layer on the second buildup-dielectric layer and the interposer board; and

forming a third opening at the first buildup-dielectric layer or the second buildup-dielectric layer, and disposing a thermoelectric device into the third opening for embedding the thermoelectric device in the first buildup-dielectric layer or the second buildup-dielectric layer, wherein the thermoelectric device is connected to the heat-storing device through the first pattern-metal layer.

2. The method of claim 1 , wherein the second opening is formed after forming the first opening.

3. The method of claim 2 , wherein the second opening has a width greater than that of the first opening.

4. The method of claim 1 , wherein the first and second buildup-dielectric layers are arranged along a vertical direction, and the heat-storing device and the interposer board are arranged along the vertical direction.

5. The method of claim 1 , further comprising:

disposing a heat-conducting unit in contact with the first pattern-metal layer, wherein the heat-conducting unit is made of metal, graphene, or a combination thereof.

6. The method of claim 1 , further comprising:

disposing at least one solder ball between the heat-storing device and the interposer board, wherein the heat-storing device is in a portion lower than the solder ball, and the thermoelectric device is in a portion higher than the solder ball.

7. The method of claim 6 , wherein the interposer board is in a portion higher than the solder ball, and the interposer board and the thermoelectric device are separated from each other by a portion of the second buildup-dielectric layer.

8. The method of claim 7 , further comprising:

disposing a heat-conducting unit in contact with the first pattern-metal layer, wherein the heat-conducting unit is made of metal, graphene, or a combination thereof, and the portion of the second buildup-dielectric layer is above and in contact with the heat-conducting unit.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 21, 2017
From: CHEN, YIN-JU; WU, MING-HAO; YU, CHENG-PO
To: UNIMICRON TECHNOLOGY CORP.
Reel/Frame 044467/0137 →
Continuity (3)
Division 15289950 · Oct 10, 2016
Division 14695057 · Apr 24, 2015
Related Publication 20180116056A1 · Apr 26, 2018