IP Library Granted Patent US 10,164,187
Granted Patent B2
US 10,164,187 · App. 15/858,780 · Granted Dec 25, 2018

Methods, apparatuses, and circuits for programming a memory device

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Quick Facts
Patent No.
US 10,164,187
App. No.
15/858,780
Granted
Dec 25, 2018
Kind
B2
Abstract

Subject matter described pertains to methods, apparatuses, and circuits for programming a memory device.

Claims (43)

1. A device, comprising:

a memory material comprising a programmable portion, the memory material positioned in an arrangement of stacked materials;

a conductor positioned over the arrangement and offset from directly above the programmable portion, wherein the conductor has a width in a first direction and a length longer than the width in a second direction, and wherein the conductor comprises a first edge and a second edge that is offset from the first edge in the second direction; and

a separation material included in the arrangement and positioned below the conductor, wherein an edge of the separation material laterally extends farther than the second edge of the conductor in the second direction.

2. The device of claim 1 , further comprising:

a conductive plug positioned below the arrangement, wherein a conductive path from the conductor to the conductive plug is via the separation material of the arrangement, the conductor being offset from directly above the conductive plug.

3. The device of claim 1 , wherein the edge of the separation material laterally extends in the second direction at least to a location directly above the programmable portion.

4. The device of claim 1 ,

wherein an edge of the memory material laterally extends to the edge of the separation material in the second direction.

5. The device of claim 2 , wherein an edge of the memory material laterally extends in the second direction at least to a location directly above the conductive plug.

6. The device of claim 2 , further comprising:

a switching device in electronic communication with the conductive plug, wherein the conductive plug is above the switching device.

7. The device of claim 6 , wherein the conductive path from the conductor to the switching device is via the separation material of the arrangement.

8. The device of claim 2 , further comprising:

a device heater in electronic communication with the conductive plug, wherein the conductive plug is below the device heater.

9. A method, comprising:

applying a current to a conductor of a memory device, the conductor having a width in a first direction and a length longer than the width in a second direction and comprising a first edge and a second edge that is offset from the first edge in the second direction,

wherein a current path from the conductor to a switching device via a separation material and a programmable portion of a memory material is formed based at least in part on applying the current, wherein the conductor is offset from directly above the programmable portion, and wherein an edge of the separation material laterally extends farther than the second edge of the conductor in the second direction;

changing a phase of the programmable portion of the memory material from a first phase to a second phase based at least in part on applying the current; and

storing a state in the programmable portion of the memory material based at least in part on changing the phase of the memory material.

10. The method of claim 9 , wherein changing the phase of the programmable portion from the first phase to the second phase comprises:

increasing a temperature of the programmable portion, the programmable portion being below and in contact with the separation material.

11. The method of claim 10 , wherein the memory material comprises a chalcogenide material.

12. The method of claim 9 , further comprises:

determining a voltage drop associated with the conductor based at least in part on the current path; and

programming the programmable portion of the memory material based at least in part on determining the voltage drop.

13. The method of claim 12 , wherein the voltage drop associated with the conductor is less than a voltage drop associated with the separation material.

14. The method of claim 12 , wherein a voltage drop associated with a device heater is greater than a voltage drop associated with the separation material, the device heater being positioned below the separation material.

15. A memory apparatus, comprising:

a conductor having a width in a first direction and a length longer than the width in a second direction and comprising a first edge and a second edge that is offset from the first edge in the second direction;

a memory material located below the conductor and comprising a programmable portion, wherein the conductor is offset from directly above the programmable portion;

a separation material located above the memory material and below the conductor, wherein an edge of the separation material laterally extends farther than the second edge of the conductor in the second direction; and

a controller in electronic communication with the conductor and the memory material, the controller being operable to:

apply a current to the conductor of a memory device,

wherein a current path from the conductor to a switching device via the memory material is formed based at least in part on applying the current;

change a phase of the memory material from a first phase to a second phase based at least in part on applying the current; and

store a state in the memory material based at least in part on changing the phase of the memory material.

16. The memory apparatus of claim 15 , wherein the separation material is configured as a diffusion barrier between the conductor and the memory material.

17. The memory apparatus of claim 15 , wherein the controller is operable to:

program the programmable portion of the memory material based at least in part on applying the current to the conductor.

18. The memory apparatus of claim 15 , wherein the first phase comprises a crystalline phase, and wherein the second phase comprises an amorphous phase.

19. The memory apparatus of claim 15 , wherein the first phase comprises an amorphous phase, and wherein the second phase comprises a crystalline phase.

20. The memory apparatus of claim 15 , wherein a portion of the separation material has a resistance per unit length less than a resistance per unit length of the conductor.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050716/0678 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
SUPPLEMENT NO. 7 TO PATENT SECURITY AGREEMENT Recorded Feb 6, 2018
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 045267/0833 →