Overlay structures
The present disclosure generally relates to semiconductor structures and, more particularly, to overlay structures and methods of manufacture. The method includes locating a first plurality of offset dummy features in a first layer; locating a second plurality of offset dummy features in a second layer; measuring a distance between the first plurality of offset dummy features and the second plurality of offset dummy features; and determining that the first layer or the second layer is shifted with respect to one another based on the measurement.
1. A method, comprising:
locating a first plurality of offset dummy features in a first layer;
locating a second plurality of offset dummy features in a second layer;
measuring a distance between each offset dummy feature of the first plurality of offset dummy features in the first layer with respect to one another and each offset dummy feature of the second plurality of offset dummy features in the second layer with respect to one another; and
determining that the first layer or the second layer is shifted with respect to one another by comparing the measurement from the first layer or the second layer to a known value.
2. The method of claim 1 , wherein the first plurality of offset dummy features and the second plurality of offset dummy features are dummy interconnect structures.
3. The method of claim 1 , wherein the first plurality of offset dummy features and the second plurality of offset dummy features are offset in an x-direction.
4. The method of claim 1 , wherein the first plurality of offset dummy features and the second plurality of offset dummy features are offset in a y-direction.
5. The method of claim 1 , wherein the measuring the distance comprises measuring across a surface of the second layer.
6. The method of claim 1 , wherein the first plurality of offset dummy features and the second plurality of offset dummy features are located in unused space in the first layer and the second layer.
7. The method of claim 6 , wherein the unused space in the first layer and the unused space in the second layer maintains the integrity of the first plurality of offset dummy features and the second plurality of offset dummy features during a dicing process.
8. The method of claim 7 , wherein the first plurality of offset dummy features are different structures than the second plurality of offset dummy features.
9. The method of claim 8 , wherein the first plurality of offset dummy features are interconnect structures.
10. The method of claim 9 , wherein the second plurality of offset dummy features are gate structures.
11. The method of claim 10 , wherein the first plurality of offset dummy features are negatively offset.
12. The method of claim 11 , wherein the second plurality of offset dummy features are positively offset.
13. The method of claim 12 , wherein the measuring the distance for the first layer comprises measuring across a surface of the first layer.
14. The method of claim 13 , wherein the measuring across the surface of the first layer is implemented by a scanning electron microscope overlay technique.