Image sensor including light shielding layer and patterned dielectric layer
An image sensor including a semiconductor substrate, a plurality of color filters, a plurality of first lenses and a second lens is provided. The semiconductor substrate includes a plurality of sensing pixels arranged in array, and each of the plurality of sensing pixels respectively includes a plurality of image sensing units and a plurality of phase detection units. The color filters at least cover the plurality of image sensing units. The first lenses are disposed on the plurality of color filters. Each of the plurality of first lenses respectively covers one of the plurality of image sensing units. The second lens is disposed on the plurality of color filters and the second lens covers the plurality of phase detection units.
1. An image sensor, comprising:
a semiconductor substrate comprising a plurality of sensing pixels arranged in array, each of the plurality of sensing pixels respectively comprising a plurality of image sensing units and a plurality of phase detection units;
a plurality of color filters at least covering the plurality of image sensing units;
a light shielding grid layer and a patterned dielectric layer stacked on the light shielding grid layer, wherein the light shielding grid layer and the patterned dielectric layer are located between two adjacent color filters;
a plurality of first lenses disposed on the plurality of color filters, and each of the plurality of first lenses respectively covering one of the plurality of image sensing units; and
a second lens covering the plurality of phase detection units.
2. The image sensor as claimed in claim 1 , wherein the semiconductor substrate further comprises an interconnection structure disposed on and electrically connected to the plurality of image sensing units and the plurality of phase detection units, and the semiconductor substrate is between the plurality of color filters and the interconnection structure.
3. The image sensor as claimed in claim 1 , wherein the plurality of color filters are between the plurality of image sensing units and the plurality of first lenses.
4. The image sensor as claimed in claim 1 , wherein the plurality of color filters further covers the plurality of phase detection units.
5. The image sensor as claimed in claim 1 , wherein the plurality of phase detection units are not covered by the plurality of color filters.
6. The image sensor as claimed in claim 1 , wherein a first coverage of each one of the plurality of first lenses is less than a second coverage of the second lens.
7. The image sensor as claimed in claim 1 , wherein the semiconductor substrate further comprises a trench isolation between the image sensing units, and the pattern dielectric layer and the light shielding grid layer are over the corresponding trench isolation.
8. An image sensor, comprising:
a semiconductor substrate comprising a plurality of sensing pixels arranged in array, each of the plurality of sensing pixels respectively comprising a plurality of image sensing units;
a plurality of color filters covering the plurality of image sensing units;
a light shielding grid layer and a patterned dielectric layer stacked on the light shielding grid layer, wherein the light shielding grid layer and the patterned dielectric layer are located between two adjacent color filters;
a plurality of first lenses disposed on the plurality of color filters, and each of the plurality of first lenses respectively covering one of the plurality of image sensing units; and
a plurality of second lenses, each of the plurality of second lenses respectively covering at least two of the plurality of image sensing units, wherein the plurality of second lenses and portions of the plurality of image sensing units covered by the plurality of second lenses provide phase detection function.
9. The image sensor as claimed in claim 8 , wherein the semiconductor substrate further comprises an interconnection structure disposed on and electrically connected to the plurality of image sensing units, and the semiconductor substrate is between the plurality of color filters and the interconnection structure.
10. The image sensor as claimed in claim 8 , wherein the portions of the plurality of image sensing units covered by the plurality of second lenses are not covered by the plurality of color filters.
11. The image sensor as claimed in claim 8 , wherein a first coverage of each one of the plurality of first lenses is less than a second coverage of each one of the second lenses.
12. The image sensor as claimed in claim 8 , wherein the semiconductor substrate further comprises a trench isolation between the image sensing units, and the pattern dielectric layer and the light shielding grid layer are over the corresponding trench isolation.
13. An image sensor, comprising:
a semiconductor substrate comprising a plurality of sensing pixels arranged in array, each of the plurality of sensing pixels respectively comprising a plurality of image sensing units and a plurality of phase detection units;
a light shielding layer comprising a plurality of openings located above the plurality of image sensing units and the plurality of phase detection units;
a patterned dielectric layer stacked on the light shielding layer, wherein the light shielding layer and the patterned dielectric layer are located between two adjacent color filters;
a plurality of color filters at least filling portions of the openings located above the plurality of image sensing units;
a plurality of first lenses disposed on the plurality of color filters, and each of the plurality of first lenses respectively covering one of the plurality of image sensing units; and
a second lens covering the plurality of phase detection units.
14. The image sensor as claimed in claim 13 , wherein the semiconductor substrate further comprises an interconnection structure disposed on and electrically connected to the plurality of image sensing units and the plurality of phase detection units, and the semiconductor substrate is between the plurality of color filters and the interconnection structure.
15. The image sensor as claimed in claim 13 , wherein the plurality of opening of the light shielding layer comprising a plurality of first openings and at least one second opening, the plurality of first openings correspond to the plurality of image sensing units, and the at least one second opening corresponds to the plurality of phase detection units.
16. The image sensor as claimed in claim 13 , wherein the plurality of color filters are between the plurality of image sensing units and the plurality of first lenses.
17. The image sensor as claimed in claim 13 , wherein the plurality of color filters further covers the plurality of phase detection units.
18. The image sensor as claimed in claim 13 , wherein the plurality of phase detection units are not covered by the plurality of color filters.
19. The image sensor as claimed in claim 13 , wherein a first coverage of each one of the plurality of first lenses is less than a second coverage of the second lens.
20. The image sensor as claimed in claim 13 , wherein the semiconductor substrate further comprising a trench isolation between the image sensing units, and the pattern dielectric layer and the light shielding grid layer are over the corresponding trench isolation.