IP Library Granted Patent US 10,515,996
Granted Patent B2
US 10,515,996 · App. 15/877,064 · Granted Dec 24, 2019

Semiconductor devices with seed and magnetic regions and methods of fabrication

Inventors: Witold Kula (Gilroy, CA); Wayne I. Kinney (Emmett, ID); Gurtej S. Sandhu (Boise, ID)
Assignee: Micron Technology, Inc.
H01L27/222G11C11/161H01L43/02H01L43/08H01L43/10H01L43/12H01L27/228
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,515,996
App. No.
15/877,064
Granted
Dec 24, 2019
Kind
B2
Abstract

A magnetic cell core includes a seed region with a plurality of magnetic regions and a plurality of nonmagnetic regions thereover. The seed region provides a template that enables formation of an overlying nonmagnetic region with a microstructure that enables formation of an overlying free region with a desired crystal structure. The free region is disposed between two nonmagnetic regions, which may both be configured to induce surface/interface magnetic anisotropy. The structure is therefore configured to have a high magnetic anisotropy strength, a high energy barrier ratio, high tunnel magnetoresistance, a low programming current, low cell-to-cell electrical resistance variation, and low cell-to-cell variation in magnetic properties. Methods of fabrication, memory arrays, memory systems, and electronic systems are also disclosed.

Claims (44)

1. An electronic system, comprising:

a magnetic structure between a lower electrode and an upper electrode, the magnetic structure comprising:

a free region between a lower nonmagnetic region and an intermediate nonmagnetic region, the free region comprising a magnetic material;

a fixed region above the intermediate nonmagnetic region; and

a seed region directly below the lower nonmagnetic region, the seed region comprising the same chemical elements as the magnetic material of the free region.

2. The electronic system of claim 1 , wherein the chemical elements comprise at least one of cobalt (Co) or iron (Fe).

3. The electronic system of claim 1 , wherein at least a portion of the fixed region also comprises the same chemical elements as the magnetic material of the free region.

4. The electronic system of claim 1 , wherein the lower nonmagnetic region and the intermediate nonmagnetic region comprise the same oxide material.

5. The electronic system of claim 1 , wherein:

the fixed region exhibits a fixed vertical magnetic orientation; and

the seed region exhibits another fixed vertical magnetic orientation oppositely directed to the fixed vertical magnetic orientation of the fixed region.

6. The electronic system of claim 1 , wherein:

the fixed region exhibits a fixed vertical magnetic orientation; and

the seed region exhibits a fixed horizontal magnetic orientation.

7. The electronic system of claim 1 , wherein:

the free region and the fixed region exhibit vertical magnetic orientations; and

the seed region does not exhibit magnetism.

8. The electronic system of claim 1 , wherein the seed region, the free region, and at least a lower portion of the fixed region each exhibit a crystalline structure.

9. The electronic system of claim 8 , wherein the lower nonmagnetic region and the intermediate nonmagnetic region exhibit the crystalline structure.

10. The electronic system of claim 8 , wherein an upper portion of the fixed region exhibits a different crystalline structure than the crystalline structure exhibited by the lower portion of the fixed region.

11. An electronic system, comprising:

at least one magnetic structure over an electrode, the at least one magnetic structure comprising:

a nonmagnetic oxide region between a seed region and a free region, the seed region and the free region each comprising cobalt (Co) and iron (Fe); and

another nonmagnetic oxide region between the free region and a fixed region,

wherein no oxide material is between the seed region and the electrode.

12. The electronic system of claim 11 , wherein:

the seed region defines a thickness of about 6 Å; and

the free region defines a thickness of at least about 14 Å.

13. The electronic system of claim 12 , wherein the free region defines a thickness of at least about 50 Å.

14. The electronic system of claim 11 , wherein the nonmagnetic oxide region is thinner than the another nonmagnetic oxide region.

15. The electronic system of claim 11 , wherein the nonmagnetic oxide region comprises ruthenium.

16. A method of forming an electronic system comprising a magnetic structure, the method comprising:

forming a precursor magnetic structure, comprising:

forming a seed material over a conductive material of a lower electrode, the seed material exhibiting an amorphous state;

forming a lower nonmagnetic material directly over the seed material while the seed material exhibits the amorphous state;

forming a free region comprising a magnetic material exhibiting a switchable vertical magnetic orientation over the lower nonmagnetic material, the magnetic material of the free region comprising the same chemical elements as the seed material; and

forming an intermediate nonmagnetic material over the magnetic material, the free region between the lower nonmagnetic region and the intermediate nonmagnetic material;

annealing the precursor structure to crystallize at least the magnetic material;

after the annealing and before patterning the precursor structure to form the magnetic structure of the electronic system, forming a fixed region comprising another magnetic material over the intermediate nonmagnetic material, the another magnetic material exhibiting a fixed vertical magnetic orientation; and

forming an upper electrode over the another magnetic material, the magnetic structure between the lower electrode and the upper electrode.

17. The method of claim 16 , wherein forming the seed material comprises forming a CoFeB material over the conductive material.

18. The method of claim 16 , wherein forming the lower nonmagnetic material directly over the seed material comprises forming an oxide material exhibiting a bcc (001) crystalline structure over the seed material while the seed material exhibits the amorphous state.

19. The method of claim 16 , further comprising another annealing after forming the another magnetic material, the another annealing conducted at a lower temperature than the annealing before forming the another magnetic material.

20. The method of claim 16 , wherein forming the seed material is not preceded by forming an oxide material over the lower electrode.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050716/0678 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
SUPPLEMENT NO. 7 TO PATENT SECURITY AGREEMENT Recorded Feb 6, 2018
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 045267/0833 →