Semiconductor device with a layered protection mechanism and associated systems, devices, and methods

1. A semiconductor device, comprising:

a first die;

a second die attached over the first die;

a first metal enclosure directly contacting and vertically extending between the first die and the second die, wherein the first metal enclosure peripherally encircles a first inner space that includes a set of one or more internal interconnects;

a second metal enclosure directly contacting and vertically extending between the first die and the second die, wherein:

the second metal enclosure peripherally encircles the first metal enclosure without directly contacting the first metal enclosure, and

the second metal enclosure is an outer enclosure that encircles an overall enclosed space, wherein the first inner space is within the overall enclosed space;

a second inner enclosure directly contacting and vertically extending between the first die and the second die, wherein the second inner enclosure peripherally encircles a further set of interconnects and a second inner space that is within the overall enclosed space and mutually exclusive from the first inner space;

a first enclosure connector directly contacting the first metal enclosure, wherein the first enclosure connector is for electrically connecting the first metal enclosure to a first voltage level; and

a second enclosure connector directly contacting the second metal enclosure, wherein the second enclosure connector is for electrically connecting the second metal enclosure to a second voltage level;

wherein the first metal enclosure, the second metal enclosure, the first enclosure connector, and the second enclosure connector are configured to provide an enclosure capacitance.

2. The semiconductor device of claim 1 , wherein the first metal enclosure and the second metal enclosure are separated by an enclosure separation distance, wherein the enclosure separation distance correlates to the enclosure capacitance.

3. The semiconductor device of claim 2 , wherein the first metal enclosure and the second metal enclosure form an enclosure separation space between the first die and the second die, wherein the enclosure separation space is vacuum or filled with a gas.

4. The semiconductor device of claim 2 , wherein the first metal enclosure and the second metal enclosure form an enclosure separation space between the first die and the second die, wherein the enclosure separation space is filled with a dielectric material.

5. The semiconductor device of claim 4 , wherein the dielectric material correlates to the enclosure capacitance for further increasing the enclosure capacitance.

6. The semiconductor device of claim 2 , wherein the first metal enclosure and the second metal enclosure are concentrically arranged along a horizontal plane, wherein the enclosure separation distance is uniform between the first metal enclosure and the second metal enclosure.

7. The semiconductor device of claim 1 , further comprising:

a third die attached over the second die;

an upper-level inner enclosure directly contacting and vertically extending between the second die and the third die; and

an upper-level outer enclosure directly contacting and vertically extending between the second die and the third die, wherein the upper-level outer enclosure peripherally encircles the upper-level inner enclosure;

wherein:

the first metal enclosure is a lower-level inner enclosure;

the second metal enclosure is a lower-level outer enclosure;

the first enclosure connector includes one or more first through silicon vias (TSVs) extending through the second die and directly contacting the lower-level inner enclosure and the upper-level inner enclosure; and

the second enclosure connector includes one or more second TSVs extending through the second die and directly contacting the lower-level outer enclosure and the upper-level outer enclosure.

8. The semiconductor device of claim 1 , wherein:

one or more points, surfaces, or portions on each of the upper-level inner enclosure and the lower-level inner enclosure are coincident along a first vertical line; and

one or more points, surfaces, or portions on each of the upper-level outer enclosure and the lower-level outer enclosure are coincident along a second vertical line.

9. The semiconductor device of claim 1 , wherein;

the second metal enclosure is an outer-most enclosure along a horizontal direction; and

the second metal enclosure is electrically coupled to electrical ground.