Oxide semiconductor film and semiconductor device
To provide an oxide semiconductor film having stable electric conductivity and a highly reliable semiconductor device having stable electric characteristics by using the oxide semiconductor film. The oxide semiconductor film contains indium (In), gallium (Ga), and zinc (Zn) and includes a c-axis-aligned crystalline region aligned in the direction parallel to a normal vector of a surface where the oxide semiconductor film is formed. Further, the composition of the c-axis-aligned crystalline region is represented by In 1+δ Ga 1−δ O 3 (ZnO) m (0<δ<1 and m=1 to 3 are satisfied), and the composition of the entire oxide semiconductor film including the c-axis-aligned crystalline region is represented by In x Ga y O 3 (ZnO) m (0<x<2, 0<y<2, and m=1 to 3 are satisfied).
1. A semiconductor device comprising:
a substrate;
a source electrode and a drain electrode over the substrate; and
a semiconductor film between the source electrode and the drain electrode, the semiconductor film comprising a first semiconductor film and a second semiconductor film over the first semiconductor film,
wherein a first material of the first semiconductor film has a different composition from a second material of the second semiconductor film,
wherein the second semiconductor film has a higher crystallinity than the first semiconductor film,
wherein each of the first material and the second material is an In—Ga—Zn—O-based metal oxide, and
wherein the first material has a different composition ratio of In to Ga and Zn from the second material.
2. The semiconductor device according to claim 1 , further comprising a gate electrode between the substrate and the semiconductor film.
3. The semiconductor device according to claim 1 , further comprising a gate electrode over the semiconductor film.
4. The semiconductor device according to claim 1 ,
wherein a composition of the first material is represented by In 1+δ Ga 1−δ O 3 (ZnO) m , and
wherein 0<δ<1 and m=1 to 3 are satisfied.
5. The semiconductor device according to claim 1 , wherein each of the first material and the second material is represented by In x Ga y O 3 (ZnO) m where 0<x<2, 0<y<2, and m=1 to 3 are satisfied.
6. An electronic appliance comprising the semiconductor device according to claim 1 , wherein the electronic appliance is any one of a television set, a monitor, a camera, a video camera, a digital photo frame, a mobile phone handset, a game machine, an information terminal, an audio reproducing device and a display device.
7. A semiconductor device comprising:
a substrate;
a source electrode and a drain electrode over the substrate; and
a semiconductor film between the source electrode and the drain electrode, the semiconductor film comprising a first semiconductor film and a second semiconductor film over the first semiconductor film,
wherein a first material of the first semiconductor film has a different composition from a second material of the second semiconductor film,
wherein each of the first semiconductor film and the second semiconductor film comprises crystals,
wherein an alignment of the crystals of the second semiconductor film is higher than an alignment of the crystals of the first semiconductor film,
wherein each of the first material and the second material is an In—Ga—Zn—O-based metal oxide, and
wherein the first material has a different composition ratio of In to Ga and Zn from the second material.
8. The semiconductor device according to claim 7 , further comprising a gate electrode between the substrate and the semiconductor film.
9. The semiconductor device according to claim 7 , further comprising a gate electrode over the semiconductor film.
10. The semiconductor device according to claim 7 ,
wherein a composition of the first material is represented by In 1+δ Ga 1−δ O 3 (ZnO) m , and
wherein 0<δ<1 and m=1 to 3 are satisfied.
11. The semiconductor device according to claim 7 , wherein an alignment of c-axes of the crystals of the second semiconductor film is higher than an alignment of each of a-axes and b-axes of the crystals of the second semiconductor film.
12. A semiconductor device comprising:
a substrate; and
a semiconductor film including a channel formation region over the substrate, the semiconductor film comprising a first semiconductor film and a second semiconductor film over the first semiconductor film,
wherein a first material of the first semiconductor film has a different composition from a second material of the second semiconductor film,
wherein the second semiconductor film has a higher crystallinity than the first semiconductor film,
wherein each of the first material and the second material is an In—Ga—Zn—O-based metal oxide, and
wherein the first material has a different composition ratio of In to Ga and Zn from the second material.
13. The semiconductor device according to claim 12 , further comprising a gate electrode between the substrate and the semiconductor film.
14. The semiconductor device according to claim 12 , further comprising a gate electrode over the semiconductor film.
15. The semiconductor device according to claim 12 ,
wherein a composition of the first material is represented by In 1+δ Ga 1−δ O 3 (ZnO) m , and
wherein 0<δ<1 and m=1 to 3 are satisfied.
16. The semiconductor device according to claim 12 ,
wherein each of the first semiconductor film and the second semiconductor film comprises crystals, and
wherein an alignment of the crystals of the second semiconductor film is higher than an alignment of the crystals of the first semiconductor film.
17. The semiconductor device according to claim 16 , wherein an alignment of c-axes of the crystals of the second semiconductor film is higher than an alignment of each of a-axes and b-axes of the crystals of the second semiconductor film.