Methods, apparatus and system for forming wrap-around contact with dual silicide

1. A method, comprising:

forming a PFET fin and an NFET fin on a semiconductor device;

forming an epitaxial silicon layer on the PFET fin;

forming a first epitaxial layer over the epitaxial silicon layer on the PFET fin;

adding an epitaxial material over the PFET fin and the NFET fin, to impart to the first epitaxial layer a first thickness and to yield a second epitaxial layer having a second thickness on the NFET fin, wherein the first thickness is greater than the second thickness;

depositing an interlayer dielectric (ILD) over the PFET fin and the NFET fin;

forming a first trench in the ILD to a top of the PFET fin and a second trench in the ILD to a top of the NFET fin;

removing the first epitaxial layer and the second epitaxial layer, to yield a first cavity around the PFET fin and a second cavity around the NFET fin, wherein the first cavity is wider than the second cavity;

partially filling the first cavity and filling the second cavity with a first metal;

removing the first metal from the first cavity; and

depositing a second metal in the first cavity.

2. The method of claim 1 , wherein:

partially filling the first cavity and filling the second cavity with a first metal comprises partially filling the first cavity and filling the second cavity with titanium;

forming the first epitaxial layer comprises forming a first epitaxial SiGe layer;

forming the second epitaxial layer comprises forming a second epitaxial SiGe layer; and

adding the epitaxial material over the PFET fin and an NFET fin comprises adding an epitaxial SiGe material over the PFET fin and the NFET fin.

3. The method of claim 1 , wherein depositing the second metal into the first cavity comprises depositing at least one of nickel or nickel-platinum.

4. The method of claim 1 , wherein the removing the first metal comprises isotropic removal of the first metal from the first cavity.

5. The method of claim 1 , wherein the removing the first metal comprises forming a mask above the second cavity prior to removing the first metal and removing the mask from above the second cavity after removing the first metal.

6. The method of claim 1 , wherein forming the PFET fin comprises forming a PFET fin that comprises an epitaxial SiGe over a body of the fin and on which the epitaxial silicon layer is formed, and forming the NFET fin comprises forming an NFET fin that comprises an epitaxial silicon over a body of the fin and on which the second epitaxial SiGe layer is formed.

7. The method of claim 6 , further comprising removing the epitaxial silicon layer and partially removing the epitaxial silicon from the NFET fin after removing the first epitaxial SiGe layer.

8. The method of claim 1 , further comprising filling the first cavity with a fill metal.

9. The method of claim 1 , further comprising annealing the semiconductor device, thereby transforming the first metal to a first metal silicide and transforming the second metal to a second metal silicide.

10. A system, comprising:

a semiconductor device processing system to manufacture a semiconductor device; and

a processing controller operatively coupled to said semiconductor device processing system, said processing controller configured to control an operation of the semiconductor device processing system;

wherein the semiconductor device processing system is adapted to:

form a PFET fin and an NFET fin on a semiconductor device;

form an epitaxial silicon layer on the PFET fin;

form a first epitaxial layer over the epitaxial silicon layer on the PFET fin;

add an epitaxial material over the PFET fin and the NFET fin, to impart to the first epitaxial layer a first thickness and to yield a second epitaxial layer having a second thickness on the NFET fin, wherein the first thickness is greater than the second thickness;

deposit an interlayer dielectric (ILD) over the PFET fin and the NFET fin;

form a first trench in the ILD to a top of the PFET fin, and a second trench in the ILD, to a top of the NFET fin;

remove the first epitaxial layer and the second epitaxial layer, to yield a first cavity around the PFET fin and a second cavity around the NFET fin, wherein the first cavity is wider than the second cavity;

partially fill the first cavity and fill the second cavity;

remove the first metal from the first cavity; and

deposit a second metal in the first cavity.

11. The system of claim 10 , wherein the semiconductor device processing system is adapted to deposit titanium as the first metal, to deposit nickel or nickel-platinum as the second metal, or both.

12. The system of claim 10 , wherein the semiconductor device processing system is adapted to remove the first metal by isotropic removal of the first metal from the first cavity.

13. The system of claim 10 , wherein the semiconductor device processing system is adapted to remove the first metal by forming a mask above the second cavity prior to removing the first metal and removing the mask from above the second cavity after removing the first metal.

14. The system of claim 10 , wherein the semiconductor device processing system is further adapted to fill the first trench, the second trench, and the first cavity with a fill metal.

15. The system of claim 10 , wherein the semiconductor device processing system is further adapted to anneal the semiconductor device, thereby transforming the first metal to a first metal silicide and transforming the second metal to a second metal silicide.