Metal insulator metal capacitor devices

1. A method comprising:

depositing a bottom plate;

depositing a dielectric film directly on the bottom plate;

modifying a surface of the dielectric film to increase a dielectric constant of its surface;

depositing a second dielectric film on the modified dielectric film and which is comprised of a same material as the dielectric film and with a lower dielectric constant than the modified dielectric film; and

depositing a top plate over the second dielectric film, wherein:

the bottom plate and the top plate are composed of TiN,

the modifying the surface of the dielectric film comprises exposing the dielectric film to a gas and curing the dielectric film, the modified dielectric film and the second dielectric film are comprised of a high-k dielectric film,

the high-k dielectric film is a zirconium based dielectric, and

the dielectric film comprises laminated high-k dielectric layers, when after each layer of the laminated high-k dielectric layers is deposited it is subjected individually to the exposing and curing, prior to the deposition of the second film.

2. The method of claim 1 , wherein the zirconium based dielectric is ZrO 2.

3. The method of claim 1 , wherein the modified dielectric film and the second dielectric film are a stack of high-k dielectric layers, the modified dielectric film has a different dielectric constant than the second dielectric film.

4. The method of claim 1 , wherein the-dielectric film comprises stacked high-k dielectric layers, and is subjected to the exposing and the curing after each layer of the stacked high-k dielectric layers is deposited, prior to the deposition of the second film.

5. The method of claim 1 , wherein the the second dielectric film and the dielectric are deposited in different deposition cycles and result in an asymmetrical stack of dielectric materials.

6. The method of claim 5 , wherein the gas is comprised of NH 3 or O 3 .

7. The method of claim 5 , wherein the curing is by UV radiation at a temperature range of about 150° C.-400° C.

8. The method of claim 7 , wherein the UV radiation has a wavelength less than 400 nm.

9. The method of claim 8 , wherein the UV radiation is for a time period in a range of 30 seconds to 90 seconds.

10. A method comprising:

depositing a first high-k dielectric layer directly on a bottom plate;

modifying a surface of the first high-k dielectric layer to increase a dielectric constant of the first high-k dielectric layer by:

exposing the first high-k dielectric layer to a NH 3 or O 3 gas; and

curing the first high-k dielectric layer with UV radiation;

depositing at least one additional high-k dielectric layer having a dielectric constant lower than the first high-k dielectric layer over the first high-k dielectric layer in either a stacked or laminate structure, the at least one additional high-k dielectric layer being comprised of a same material as the first high-k dielectric layer;

depositing a top plate over the least one additional high-k dielectric layer, wherein the at least one additional high-k dielectric layer is comprised of a material having a greater amount of cycles than the first high-k dielectric layer, wherein:

the bottom plate and the top plate are composed of TiN,

the first high-k dielectric layer is a zirconium based dielectric, and

the at least one additional high-k dielectric layer comprises laminated high-k dielectric layers, when after each layer of the laminated high-k dielectric layers is deposited it is subjected individually to the exposing and curing.

11. The method of claim 10 , further comprising exposing the at least one additional high-k dielectric layer to NH 3 or O 3 gas and UV radiation to modify a surface of the at least one additional high-k dielectric layer to increase a dielectric constant of the at least one additional high-k dielectric layer.

12. The method of claim 10 , wherein a temperature of the UV radiation is below a melting point of the top plate.

13. A structure comprising:

a bottom plate;

an asymmetrical nitrogen infused dielectric film comprising a plurality of different species over the bottom plate, the asymmetrical nitrogen infused dielectric film comprises a treated dielectric layer between untreated dielectric layers, the treated dielectric layer and the untreated dielectric layers being comprised of a same material, the treated dielectric layer having a modified upper surface annealed with a thermal budget compatible with back end of line (BEOL) temperatures to reduce leakage and a higher dielectric constant than the untreated dielectric layers; and

a top plate over the nitrogen infused dielectric film, wherein:

the bottom plate and the top plate are composed of TiN,

the treated dielectric layer is a zirconium based dielectric, and

the treated dielectric layer comprises laminated high-k dielectric layers which are below and above the untreated dielectric layers.

14. The structure of claim 13 , wherein the treated dielectric layer and the untreated dielectric layers are configured as laminated high-k dielectric layers.